TW200706674A - Optical disk, and sputtering target for cu alloy recording layer - Google Patents
Optical disk, and sputtering target for cu alloy recording layerInfo
- Publication number
- TW200706674A TW200706674A TW095113343A TW95113343A TW200706674A TW 200706674 A TW200706674 A TW 200706674A TW 095113343 A TW095113343 A TW 095113343A TW 95113343 A TW95113343 A TW 95113343A TW 200706674 A TW200706674 A TW 200706674A
- Authority
- TW
- Taiwan
- Prior art keywords
- recording layer
- optical disk
- sputtering target
- alloy
- alloy recording
- Prior art date
Links
- 229910000881 Cu alloy Inorganic materials 0.000 title abstract 4
- 230000003287 optical effect Effects 0.000 title abstract 4
- 238000005477 sputtering target Methods 0.000 title abstract 3
- 239000010410 layer Substances 0.000 abstract 6
- 239000011241 protective layer Substances 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005195318 | 2005-07-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200706674A true TW200706674A (en) | 2007-02-16 |
| TWI312814B TWI312814B (enExample) | 2009-08-01 |
Family
ID=37604220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095113343A TW200706674A (en) | 2005-07-04 | 2006-04-14 | Optical disk, and sputtering target for cu alloy recording layer |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1900540B1 (enExample) |
| JP (1) | JP4603044B2 (enExample) |
| CN (1) | CN101218106B (enExample) |
| TW (1) | TW200706674A (enExample) |
| WO (1) | WO2007004344A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012117853A1 (ja) * | 2011-03-01 | 2012-09-07 | Jx日鉱日石金属株式会社 | 銅チタン合金製スパッタリングターゲット、同スパッタリングターゲットを用いて形成した半導体配線並びに同半導体配線を備えた半導体素子及びデバイス |
| CN103774100A (zh) * | 2012-10-22 | 2014-05-07 | 中环股份有限公司 | 溅镀靶材及可写录光记录媒体 |
| JP5594618B1 (ja) * | 2013-02-25 | 2014-09-24 | 三菱マテリアル株式会社 | スパッタリングターゲット及びその製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2475270A1 (fr) * | 1980-02-01 | 1981-08-07 | Thomson Csf | Structure de memoire reversible, a inscription thermo-optique et lecture optique, et procede d'inscription et d'effacement de cette structure |
| JPS5938291B2 (ja) * | 1981-02-25 | 1984-09-14 | 株式会社東芝 | 色調記憶素子用合金 |
| JPH066393B2 (ja) * | 1984-03-07 | 1994-01-26 | 株式会社日立製作所 | 情報の記録・消去方法 |
| JPS61194658A (ja) * | 1985-02-22 | 1986-08-29 | Hitachi Ltd | 情報記録媒体 |
| JPS62247060A (ja) * | 1986-04-17 | 1987-10-28 | Mitsubishi Electric Corp | 光情報記録媒体 |
| JPH0256746A (ja) * | 1988-08-19 | 1990-02-26 | Matsushita Electric Ind Co Ltd | 情報担体ディスク |
| JPH0569671A (ja) * | 1991-09-13 | 1993-03-23 | Nec Corp | 多値光記録媒体およびその読み出し装置 |
| TW468179B (en) * | 1998-08-05 | 2001-12-11 | Matsushita Electric Industrial Co Ltd | Optical recording medium |
| JP2002172861A (ja) * | 2000-12-06 | 2002-06-18 | Ricoh Co Ltd | 光情報記録媒体 |
| JP2004079022A (ja) * | 2002-08-12 | 2004-03-11 | Tdk Corp | 光記録媒体及び光記録方法 |
-
2006
- 2006-04-07 JP JP2007523348A patent/JP4603044B2/ja not_active Expired - Fee Related
- 2006-04-07 WO PCT/JP2006/307434 patent/WO2007004344A1/ja not_active Ceased
- 2006-04-07 CN CN2006800244989A patent/CN101218106B/zh not_active Expired - Fee Related
- 2006-04-07 EP EP06731381A patent/EP1900540B1/en not_active Ceased
- 2006-04-14 TW TW095113343A patent/TW200706674A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN101218106A (zh) | 2008-07-09 |
| TWI312814B (enExample) | 2009-08-01 |
| EP1900540A4 (en) | 2009-02-18 |
| JP4603044B2 (ja) | 2010-12-22 |
| EP1900540A1 (en) | 2008-03-19 |
| WO2007004344A1 (ja) | 2007-01-11 |
| JPWO2007004344A1 (ja) | 2009-01-22 |
| EP1900540B1 (en) | 2010-03-03 |
| CN101218106B (zh) | 2010-05-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |