JP4594305B2 - インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム - Google Patents
インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム Download PDFInfo
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- JP4594305B2 JP4594305B2 JP2006518977A JP2006518977A JP4594305B2 JP 4594305 B2 JP4594305 B2 JP 4594305B2 JP 2006518977 A JP2006518977 A JP 2006518977A JP 2006518977 A JP2006518977 A JP 2006518977A JP 4594305 B2 JP4594305 B2 JP 4594305B2
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/616,294 US7150622B2 (en) | 2003-07-09 | 2003-07-09 | Systems for magnification and distortion correction for imprint lithography processes |
| PCT/US2004/022454 WO2005006076A2 (en) | 2003-07-09 | 2004-07-08 | Systems for magnification and distortion correction for imprint lithography processes |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007535121A JP2007535121A (ja) | 2007-11-29 |
| JP2007535121A5 JP2007535121A5 (enExample) | 2010-04-22 |
| JP4594305B2 true JP4594305B2 (ja) | 2010-12-08 |
Family
ID=33564732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006518977A Expired - Lifetime JP4594305B2 (ja) | 2003-07-09 | 2004-07-08 | インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7150622B2 (enExample) |
| EP (1) | EP1642170A4 (enExample) |
| JP (1) | JP4594305B2 (enExample) |
| KR (1) | KR20060034694A (enExample) |
| CN (1) | CN1871103A (enExample) |
| MY (1) | MY137556A (enExample) |
| TW (1) | TW200522155A (enExample) |
| WO (1) | WO2005006076A2 (enExample) |
Families Citing this family (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050064344A1 (en) * | 2003-09-18 | 2005-03-24 | University Of Texas System Board Of Regents | Imprint lithography templates having alignment marks |
| US20080160129A1 (en) | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
| US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| US8349241B2 (en) * | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| US7641840B2 (en) | 2002-11-13 | 2010-01-05 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
| JP4455093B2 (ja) * | 2004-02-20 | 2010-04-21 | キヤノン株式会社 | モールド、モールドを用いた加工装置及びモールドを用いた加工方法 |
| US8334967B2 (en) * | 2004-05-28 | 2012-12-18 | Board Of Regents, The University Of Texas System | Substrate support system having a plurality of contact lands |
| US7768624B2 (en) * | 2004-06-03 | 2010-08-03 | Board Of Regents, The University Of Texas System | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
| US20050270516A1 (en) * | 2004-06-03 | 2005-12-08 | Molecular Imprints, Inc. | System for magnification and distortion correction during nano-scale manufacturing |
| US7785526B2 (en) | 2004-07-20 | 2010-08-31 | Molecular Imprints, Inc. | Imprint alignment method, system, and template |
| US7292326B2 (en) * | 2004-11-30 | 2007-11-06 | Molecular Imprints, Inc. | Interferometric analysis for the manufacture of nano-scale devices |
| US7630067B2 (en) | 2004-11-30 | 2009-12-08 | Molecular Imprints, Inc. | Interferometric analysis method for the manufacture of nano-scale devices |
| US7635263B2 (en) | 2005-01-31 | 2009-12-22 | Molecular Imprints, Inc. | Chucking system comprising an array of fluid chambers |
| US7636999B2 (en) | 2005-01-31 | 2009-12-29 | Molecular Imprints, Inc. | Method of retaining a substrate to a wafer chuck |
| JP4773729B2 (ja) | 2005-02-28 | 2011-09-14 | キヤノン株式会社 | 転写装置およびデバイス製造方法 |
| US7611348B2 (en) * | 2005-04-19 | 2009-11-03 | Asml Netherlands B.V. | Imprint lithography |
| JP4700996B2 (ja) * | 2005-04-19 | 2011-06-15 | 東芝機械株式会社 | 転写装置 |
| US7648354B2 (en) * | 2005-04-28 | 2010-01-19 | Toshiba Kikai Kabushiki Kaisha | Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus |
| JP4729338B2 (ja) * | 2005-05-10 | 2011-07-20 | 東芝機械株式会社 | 転写装置 |
| JP4701008B2 (ja) * | 2005-05-25 | 2011-06-15 | 東芝機械株式会社 | ジンバル機構を備えた転写装置 |
| JP4533358B2 (ja) * | 2005-10-18 | 2010-09-01 | キヤノン株式会社 | インプリント方法、インプリント装置およびチップの製造方法 |
| US7803308B2 (en) | 2005-12-01 | 2010-09-28 | Molecular Imprints, Inc. | Technique for separating a mold from solidified imprinting material |
| US7906058B2 (en) * | 2005-12-01 | 2011-03-15 | Molecular Imprints, Inc. | Bifurcated contact printing technique |
| US7670530B2 (en) | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
| CN104317161A (zh) | 2005-12-08 | 2015-01-28 | 分子制模股份有限公司 | 用于衬底双面图案形成的方法和系统 |
| US7802978B2 (en) * | 2006-04-03 | 2010-09-28 | Molecular Imprints, Inc. | Imprinting of partial fields at the edge of the wafer |
| US8215946B2 (en) * | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
| US7946837B2 (en) * | 2006-10-06 | 2011-05-24 | Asml Netherlands B.V. | Imprint lithography |
| US7632088B2 (en) * | 2006-10-20 | 2009-12-15 | Provost Fellows And Scholars Of The College Of The Holy And Undivided Trinity Of Queen Elizabeth Near Dublin | Cyclic loading system and methods for forming nanostructures |
| US7837907B2 (en) * | 2007-07-20 | 2010-11-23 | Molecular Imprints, Inc. | Alignment system and method for a substrate in a nano-imprint process |
| NL1036034A1 (nl) | 2007-10-11 | 2009-04-15 | Asml Netherlands Bv | Imprint lithography. |
| US8945444B2 (en) * | 2007-12-04 | 2015-02-03 | Canon Nanotechnologies, Inc. | High throughput imprint based on contact line motion tracking control |
| JP5065121B2 (ja) * | 2008-03-28 | 2012-10-31 | 東京エレクトロン株式会社 | レジスト液供給装置、レジスト液供給方法、プログラム及びコンピュータ記憶媒体 |
| US8043085B2 (en) * | 2008-08-19 | 2011-10-25 | Asml Netherlands B.V. | Imprint lithography |
| US8652393B2 (en) * | 2008-10-24 | 2014-02-18 | Molecular Imprints, Inc. | Strain and kinetics control during separation phase of imprint process |
| US8309008B2 (en) * | 2008-10-30 | 2012-11-13 | Molecular Imprints, Inc. | Separation in an imprint lithography process |
| KR20120001768A (ko) | 2009-03-23 | 2012-01-04 | 인테벡, 인코포레이티드 | 패턴드 미디어에서의 아일랜드 대 트랜치 비의 최적화를 위한 공정 |
| NL2004266A (en) | 2009-04-27 | 2010-10-28 | Asml Netherlands Bv | An actuator. |
| NL2004409A (en) * | 2009-05-19 | 2010-11-22 | Asml Netherlands Bv | Imprint lithography apparatus. |
| US9164375B2 (en) * | 2009-06-19 | 2015-10-20 | Canon Nanotechnologies, Inc. | Dual zone template chuck |
| US8913230B2 (en) * | 2009-07-02 | 2014-12-16 | Canon Nanotechnologies, Inc. | Chucking system with recessed support feature |
| NL2004735A (en) * | 2009-07-06 | 2011-01-10 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| US20110084417A1 (en) * | 2009-10-08 | 2011-04-14 | Molecular Imprints, Inc. | Large area linear array nanoimprinting |
| JP5669466B2 (ja) * | 2010-07-12 | 2015-02-12 | キヤノン株式会社 | 保持装置、インプリント装置及び物品の製造方法 |
| JP5337114B2 (ja) * | 2010-07-30 | 2013-11-06 | 株式会社東芝 | パタン形成方法 |
| JP5637785B2 (ja) | 2010-09-06 | 2014-12-10 | キヤノン株式会社 | 原版、及びそれを用いた物品の製造方法 |
| JP4774125B2 (ja) * | 2010-10-04 | 2011-09-14 | キヤノン株式会社 | 転写装置、型、および、デバイス製造方法 |
| JP5744548B2 (ja) * | 2011-02-02 | 2015-07-08 | キヤノン株式会社 | 保持装置、それを用いたインプリント装置および物品の製造方法 |
| JP6061524B2 (ja) | 2011-08-11 | 2017-01-18 | キヤノン株式会社 | インプリント装置および物品の製造方法 |
| JP5759303B2 (ja) | 2011-08-11 | 2015-08-05 | キヤノン株式会社 | インプリント装置、それを用いた物品の製造方法 |
| JP6021606B2 (ja) * | 2011-11-28 | 2016-11-09 | キヤノン株式会社 | インプリント装置、それを用いた物品の製造方法、およびインプリント方法 |
| KR102056902B1 (ko) | 2013-05-29 | 2019-12-18 | 삼성전자주식회사 | 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치 |
| KR102089661B1 (ko) | 2013-08-27 | 2020-03-17 | 삼성전자주식회사 | 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치 |
| US11220737B2 (en) | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| EP2960059B1 (en) | 2014-06-25 | 2018-10-24 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US11267012B2 (en) * | 2014-06-25 | 2022-03-08 | Universal Display Corporation | Spatial control of vapor condensation using convection |
| JP6552329B2 (ja) * | 2014-09-12 | 2019-07-31 | キヤノン株式会社 | インプリント装置、インプリントシステム及び物品の製造方法 |
| US10331027B2 (en) | 2014-09-12 | 2019-06-25 | Canon Kabushiki Kaisha | Imprint apparatus, imprint system, and method of manufacturing article |
| JP6552185B2 (ja) * | 2014-11-20 | 2019-07-31 | キヤノン株式会社 | インプリント装置、補正機構の校正方法、および物品の製造方法 |
| US10566534B2 (en) | 2015-10-12 | 2020-02-18 | Universal Display Corporation | Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP) |
| US11454883B2 (en) | 2016-11-14 | 2022-09-27 | Canon Kabushiki Kaisha | Template replication |
| US10606170B2 (en) | 2017-09-14 | 2020-03-31 | Canon Kabushiki Kaisha | Template for imprint lithography and methods of making and using the same |
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-
2003
- 2003-07-09 US US10/616,294 patent/US7150622B2/en not_active Expired - Lifetime
-
2004
- 2004-07-08 CN CNA2004800230671A patent/CN1871103A/zh active Pending
- 2004-07-08 WO PCT/US2004/022454 patent/WO2005006076A2/en not_active Ceased
- 2004-07-08 KR KR1020067000555A patent/KR20060034694A/ko not_active Abandoned
- 2004-07-08 EP EP04778126A patent/EP1642170A4/en not_active Withdrawn
- 2004-07-08 JP JP2006518977A patent/JP4594305B2/ja not_active Expired - Lifetime
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- 2004-07-09 MY MYPI20042743A patent/MY137556A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060034694A (ko) | 2006-04-24 |
| CN1871103A (zh) | 2006-11-29 |
| US7150622B2 (en) | 2006-12-19 |
| WO2005006076A3 (en) | 2006-07-06 |
| JP2007535121A (ja) | 2007-11-29 |
| MY137556A (en) | 2009-02-27 |
| EP1642170A2 (en) | 2006-04-05 |
| EP1642170A4 (en) | 2009-04-15 |
| TW200522155A (en) | 2005-07-01 |
| US20050006343A1 (en) | 2005-01-13 |
| WO2005006076A2 (en) | 2005-01-20 |
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