KR20060034694A - 임프린트 리소그래피 공정을 위한 확대 및 뒤틀림 보정용시스템 - Google Patents

임프린트 리소그래피 공정을 위한 확대 및 뒤틀림 보정용시스템 Download PDF

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Publication number
KR20060034694A
KR20060034694A KR1020067000555A KR20067000555A KR20060034694A KR 20060034694 A KR20060034694 A KR 20060034694A KR 1020067000555 A KR1020067000555 A KR 1020067000555A KR 20067000555 A KR20067000555 A KR 20067000555A KR 20060034694 A KR20060034694 A KR 20060034694A
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KR
South Korea
Prior art keywords
additional
actuating arm
mold
bladder
pair
Prior art date
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Abandoned
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KR1020067000555A
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English (en)
Korean (ko)
Inventor
최병진
시들가타 브이 스리니바산
마리오 제이 메이슬
Original Assignee
몰레큘러 임프린츠 인코퍼레이티드
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Application filed by 몰레큘러 임프린츠 인코퍼레이티드 filed Critical 몰레큘러 임프린츠 인코퍼레이티드
Publication of KR20060034694A publication Critical patent/KR20060034694A/ko
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020067000555A 2003-07-09 2004-07-08 임프린트 리소그래피 공정을 위한 확대 및 뒤틀림 보정용시스템 Abandoned KR20060034694A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/616,294 2003-07-09
US10/616,294 US7150622B2 (en) 2003-07-09 2003-07-09 Systems for magnification and distortion correction for imprint lithography processes

Publications (1)

Publication Number Publication Date
KR20060034694A true KR20060034694A (ko) 2006-04-24

Family

ID=33564732

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067000555A Abandoned KR20060034694A (ko) 2003-07-09 2004-07-08 임프린트 리소그래피 공정을 위한 확대 및 뒤틀림 보정용시스템

Country Status (8)

Country Link
US (1) US7150622B2 (enExample)
EP (1) EP1642170A4 (enExample)
JP (1) JP4594305B2 (enExample)
KR (1) KR20060034694A (enExample)
CN (1) CN1871103A (enExample)
MY (1) MY137556A (enExample)
TW (1) TW200522155A (enExample)
WO (1) WO2005006076A2 (enExample)

Cited By (2)

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KR20160031436A (ko) * 2014-09-12 2016-03-22 캐논 가부시끼가이샤 임프린트 장치, 임프린트 시스템 및 물품의 제조 방법
US10331027B2 (en) 2014-09-12 2019-06-25 Canon Kabushiki Kaisha Imprint apparatus, imprint system, and method of manufacturing article

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US8334967B2 (en) * 2004-05-28 2012-12-18 Board Of Regents, The University Of Texas System Substrate support system having a plurality of contact lands
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7785526B2 (en) 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
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JP5744548B2 (ja) * 2011-02-02 2015-07-08 キヤノン株式会社 保持装置、それを用いたインプリント装置および物品の製造方法
JP6061524B2 (ja) 2011-08-11 2017-01-18 キヤノン株式会社 インプリント装置および物品の製造方法
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KR102089661B1 (ko) 2013-08-27 2020-03-17 삼성전자주식회사 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
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* Cited by examiner, † Cited by third party
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KR20160031436A (ko) * 2014-09-12 2016-03-22 캐논 가부시끼가이샤 임프린트 장치, 임프린트 시스템 및 물품의 제조 방법
US10331027B2 (en) 2014-09-12 2019-06-25 Canon Kabushiki Kaisha Imprint apparatus, imprint system, and method of manufacturing article

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US7150622B2 (en) 2006-12-19
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MY137556A (en) 2009-02-27
EP1642170A2 (en) 2006-04-05
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