JP2007535121A5 - - Google Patents

Download PDF

Info

Publication number
JP2007535121A5
JP2007535121A5 JP2006518977A JP2006518977A JP2007535121A5 JP 2007535121 A5 JP2007535121 A5 JP 2007535121A5 JP 2006518977 A JP2006518977 A JP 2006518977A JP 2006518977 A JP2006518977 A JP 2006518977A JP 2007535121 A5 JP2007535121 A5 JP 2007535121A5
Authority
JP
Japan
Prior art keywords
additional
actuator arm
bladder
distance
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006518977A
Other languages
English (en)
Japanese (ja)
Other versions
JP4594305B2 (ja
JP2007535121A (ja
Filing date
Publication date
Priority claimed from US10/616,294 external-priority patent/US7150622B2/en
Application filed filed Critical
Publication of JP2007535121A publication Critical patent/JP2007535121A/ja
Publication of JP2007535121A5 publication Critical patent/JP2007535121A5/ja
Application granted granted Critical
Publication of JP4594305B2 publication Critical patent/JP4594305B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2006518977A 2003-07-09 2004-07-08 インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム Expired - Lifetime JP4594305B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/616,294 US7150622B2 (en) 2003-07-09 2003-07-09 Systems for magnification and distortion correction for imprint lithography processes
PCT/US2004/022454 WO2005006076A2 (en) 2003-07-09 2004-07-08 Systems for magnification and distortion correction for imprint lithography processes

Publications (3)

Publication Number Publication Date
JP2007535121A JP2007535121A (ja) 2007-11-29
JP2007535121A5 true JP2007535121A5 (enExample) 2010-04-22
JP4594305B2 JP4594305B2 (ja) 2010-12-08

Family

ID=33564732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006518977A Expired - Lifetime JP4594305B2 (ja) 2003-07-09 2004-07-08 インプリント・リソグラフィ・プロセスにおける倍率拡大及びゆがみを補正するためのシステム

Country Status (8)

Country Link
US (1) US7150622B2 (enExample)
EP (1) EP1642170A4 (enExample)
JP (1) JP4594305B2 (enExample)
KR (1) KR20060034694A (enExample)
CN (1) CN1871103A (enExample)
MY (1) MY137556A (enExample)
TW (1) TW200522155A (enExample)
WO (1) WO2005006076A2 (enExample)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050064344A1 (en) * 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
JP4455093B2 (ja) 2004-02-20 2010-04-21 キヤノン株式会社 モールド、モールドを用いた加工装置及びモールドを用いた加工方法
US8334967B2 (en) * 2004-05-28 2012-12-18 Board Of Regents, The University Of Texas System Substrate support system having a plurality of contact lands
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7292326B2 (en) * 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7636999B2 (en) 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
JP4773729B2 (ja) * 2005-02-28 2011-09-14 キヤノン株式会社 転写装置およびデバイス製造方法
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
JP4700996B2 (ja) * 2005-04-19 2011-06-15 東芝機械株式会社 転写装置
US7648354B2 (en) * 2005-04-28 2010-01-19 Toshiba Kikai Kabushiki Kaisha Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
JP4729338B2 (ja) * 2005-05-10 2011-07-20 東芝機械株式会社 転写装置
JP4701008B2 (ja) * 2005-05-25 2011-06-15 東芝機械株式会社 ジンバル機構を備えた転写装置
JP4533358B2 (ja) * 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
CN101535021A (zh) 2005-12-08 2009-09-16 分子制模股份有限公司 用于衬底双面图案形成的方法和系统
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US7802978B2 (en) * 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US7946837B2 (en) * 2006-10-06 2011-05-24 Asml Netherlands B.V. Imprint lithography
US7632088B2 (en) * 2006-10-20 2009-12-15 Provost Fellows And Scholars Of The College Of The Holy And Undivided Trinity Of Queen Elizabeth Near Dublin Cyclic loading system and methods for forming nanostructures
US7837907B2 (en) * 2007-07-20 2010-11-23 Molecular Imprints, Inc. Alignment system and method for a substrate in a nano-imprint process
NL1036034A1 (nl) * 2007-10-11 2009-04-15 Asml Netherlands Bv Imprint lithography.
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
JP5065121B2 (ja) * 2008-03-28 2012-10-31 東京エレクトロン株式会社 レジスト液供給装置、レジスト液供給方法、プログラム及びコンピュータ記憶媒体
US8043085B2 (en) * 2008-08-19 2011-10-25 Asml Netherlands B.V. Imprint lithography
US8652393B2 (en) * 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8309008B2 (en) * 2008-10-30 2012-11-13 Molecular Imprints, Inc. Separation in an imprint lithography process
JP2012522327A (ja) 2009-03-23 2012-09-20 インテバック・インコーポレイテッド パターニングされた媒体の溝と島の比率の最適化のための方法
NL2004266A (en) 2009-04-27 2010-10-28 Asml Netherlands Bv An actuator.
NL2004409A (en) * 2009-05-19 2010-11-22 Asml Netherlands Bv Imprint lithography apparatus.
US9164375B2 (en) * 2009-06-19 2015-10-20 Canon Nanotechnologies, Inc. Dual zone template chuck
US8913230B2 (en) * 2009-07-02 2014-12-16 Canon Nanotechnologies, Inc. Chucking system with recessed support feature
NL2004735A (en) * 2009-07-06 2011-01-10 Asml Netherlands Bv Imprint lithography apparatus and method.
US20110084417A1 (en) * 2009-10-08 2011-04-14 Molecular Imprints, Inc. Large area linear array nanoimprinting
JP5669466B2 (ja) * 2010-07-12 2015-02-12 キヤノン株式会社 保持装置、インプリント装置及び物品の製造方法
JP5337114B2 (ja) * 2010-07-30 2013-11-06 株式会社東芝 パタン形成方法
JP5637785B2 (ja) 2010-09-06 2014-12-10 キヤノン株式会社 原版、及びそれを用いた物品の製造方法
JP4774125B2 (ja) * 2010-10-04 2011-09-14 キヤノン株式会社 転写装置、型、および、デバイス製造方法
JP5744548B2 (ja) * 2011-02-02 2015-07-08 キヤノン株式会社 保持装置、それを用いたインプリント装置および物品の製造方法
JP6061524B2 (ja) 2011-08-11 2017-01-18 キヤノン株式会社 インプリント装置および物品の製造方法
JP5759303B2 (ja) * 2011-08-11 2015-08-05 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6021606B2 (ja) * 2011-11-28 2016-11-09 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法、およびインプリント方法
KR102056902B1 (ko) 2013-05-29 2019-12-18 삼성전자주식회사 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
KR102089661B1 (ko) 2013-08-27 2020-03-17 삼성전자주식회사 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
US11220737B2 (en) 2014-06-25 2022-01-11 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US11267012B2 (en) * 2014-06-25 2022-03-08 Universal Display Corporation Spatial control of vapor condensation using convection
EP2960059B1 (en) 2014-06-25 2018-10-24 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US10331027B2 (en) 2014-09-12 2019-06-25 Canon Kabushiki Kaisha Imprint apparatus, imprint system, and method of manufacturing article
JP6552329B2 (ja) * 2014-09-12 2019-07-31 キヤノン株式会社 インプリント装置、インプリントシステム及び物品の製造方法
JP6552185B2 (ja) * 2014-11-20 2019-07-31 キヤノン株式会社 インプリント装置、補正機構の校正方法、および物品の製造方法
US10566534B2 (en) 2015-10-12 2020-02-18 Universal Display Corporation Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP)
US11454883B2 (en) 2016-11-14 2022-09-27 Canon Kabushiki Kaisha Template replication
US10606170B2 (en) 2017-09-14 2020-03-31 Canon Kabushiki Kaisha Template for imprint lithography and methods of making and using the same

Family Cites Families (112)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US81193A (en) * 1868-08-18 Improved stump-joint for carriages
US3783520A (en) 1970-09-28 1974-01-08 Bell Telephone Labor Inc High accuracy alignment procedure utilizing moire patterns
DE2800476A1 (de) 1977-01-07 1978-07-13 Instruments Sa Verfahren zur duplizierung einer optischen flaeche sowie so hergestelltes beugungsgitter
GB1578259A (en) 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
US4326805A (en) 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4492554A (en) * 1980-08-26 1985-01-08 Corn States Metal Fabricators, Inc. Valve unit for a mold vent
JPS5884808A (ja) 1981-11-13 1983-05-21 Nippon Synthetic Chem Ind Co Ltd:The 樹脂状物質の製造法
FR2538923A1 (fr) 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
US4512848A (en) 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4724222A (en) 1986-04-28 1988-02-09 American Telephone And Telegraph Company, At&T Bell Laboratories Wafer chuck comprising a curved reference surface
KR900004269B1 (ko) 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
US4929083A (en) 1986-06-19 1990-05-29 Xerox Corporation Focus and overlay characterization and optimization for photolithographic exposure
US4731155A (en) 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5066351A (en) * 1987-05-20 1991-11-19 The Boeing Company Hot/cold press forming methods for shaping thermoformable materials
US5096368A (en) * 1987-11-20 1992-03-17 Butterfield Floyd S Method for storing and transporting stacks of flexible sheets
US5028366A (en) 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
JPH01196749A (ja) 1988-01-30 1989-08-08 Hoya Corp 光情報記録媒体用基板の製造方法
EP0355496A3 (en) 1988-08-15 1990-10-10 Sumitomo Heavy Industries Co., Ltd. Position detector employing a sector fresnel zone plate
JP2546350B2 (ja) 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
JPH0292603A (ja) 1988-09-30 1990-04-03 Hoya Corp 案内溝付き情報記録用基板の製造方法
US5151242A (en) * 1988-12-08 1992-09-29 Sumitomo Rubber Industries, Ltd. Method for vulcanizing elastomer products and apparatus therefor
JP2704001B2 (ja) 1989-07-18 1998-01-26 キヤノン株式会社 位置検出装置
US5072126A (en) 1990-10-31 1991-12-10 International Business Machines Corporation Promixity alignment using polarized illumination and double conjugate projection lens
US5152949A (en) * 1990-12-19 1992-10-06 United Technologies Corporation Tooling method for resin transfer molding
US5206983A (en) 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
US5204739A (en) 1992-02-07 1993-04-20 Karl Suss America, Inc. Proximity mask alignment using a stored video image
US5601641A (en) 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
DE69405451T2 (de) 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche
US5414514A (en) 1993-06-01 1995-05-09 Massachusetts Institute Of Technology On-axis interferometric alignment of plates using the spatial phase of interference patterns
US6776094B1 (en) 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US6180239B1 (en) 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US5776748A (en) 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US5900160A (en) 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
KR0157279B1 (ko) 1994-03-15 1999-05-01 모리시타 요이찌 노광방법
US5563684A (en) 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US5808742A (en) 1995-05-31 1998-09-15 Massachusetts Institute Of Technology Optical alignment apparatus having multiple parallel alignment marks
WO1997007429A1 (en) 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US5545570A (en) 1995-09-29 1996-08-13 Taiwan Semiconductor Manufacturing Company Method of inspecting first layer overlay shift in global alignment process
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US5820894A (en) * 1995-10-06 1998-10-13 Mcdonnell Douglas Corporation Method and apparatus for consolidating a workpiece at elevated temperature
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US20030080471A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US7758794B2 (en) 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
JP2842362B2 (ja) 1996-02-29 1999-01-06 日本電気株式会社 重ね合わせ測定方法
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
US20030179354A1 (en) 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
US5802914A (en) 1996-05-30 1998-09-08 Eastman Kodak Company Alignment mechanism using flexures
US6039897A (en) 1996-08-28 2000-03-21 University Of Washington Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
JPH10172897A (ja) 1996-12-05 1998-06-26 Nikon Corp 基板アダプタ，基板保持装置及び基板保持方法
US6049373A (en) 1997-02-28 2000-04-11 Sumitomo Heavy Industries, Ltd. Position detection technique applied to proximity exposure
JP3296239B2 (ja) 1997-03-27 2002-06-24 ウシオ電機株式会社 間隙設定機構を備えたプロキシミティ露光装置
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
JP3031301B2 (ja) * 1997-06-25 2000-04-10 日本電気株式会社 銅配線構造およびその製造方法
WO1999005724A1 (en) 1997-07-25 1999-02-04 Regents Of The University Of Minnesota Single-electron floating-gate mos memory
US5877861A (en) 1997-11-14 1999-03-02 International Business Machines Corporation Method for overlay control system
US5991022A (en) 1997-12-09 1999-11-23 N&K Technology, Inc. Reflectance spectrophotometric apparatus with toroidal mirrors
US6019166A (en) 1997-12-30 2000-02-01 Intel Corporation Pickup chuck with an integral heatsink
JP3780700B2 (ja) 1998-05-26 2006-05-31 セイコーエプソン株式会社 パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法
US6150231A (en) 1998-06-15 2000-11-21 Siemens Aktiengesellschaft Overlay measurement technique using moire patterns
WO2000021689A1 (en) 1998-10-09 2000-04-20 The Trustees Of Princeton University Microscale patterning and articles formed thereby
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
JP4846888B2 (ja) 1998-12-01 2011-12-28 キヤノン株式会社 位置合わせ方法
US6388755B1 (en) 1998-12-03 2002-05-14 Advanced Optical Technologies, Inc. Wireless position and orientation detecting system
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
FR2792246B1 (fr) 1999-04-16 2001-06-22 Aerospatiale Outillage de mise en forme pour la polymerisation de pieces profilees en materiau composite
WO2000072093A1 (en) 1999-05-25 2000-11-30 Massachusetts Institute Of Technology Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
ATE294648T1 (de) 1999-12-23 2005-05-15 Univ Massachusetts Verfahren zur herstellung von submikron mustern auf filmen
SE516194C2 (sv) 2000-04-18 2001-12-03 Obducat Ab Substrat för samt process vid tillverkning av strukturer
SE516414C2 (sv) 2000-05-24 2002-01-15 Obducat Ab Metod vid tillverkning av en mall, samt mallen tillverkad därav
JP2001358056A (ja) 2000-06-15 2001-12-26 Canon Inc 露光装置
WO2002008835A2 (en) 2000-07-16 2002-01-31 Board Of Regents, The University Of Texas System High-resolution overlay alignment methods and systems for imprint lithography
US20050037143A1 (en) 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US8016277B2 (en) 2000-08-21 2011-09-13 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
US6451705B1 (en) 2000-08-31 2002-09-17 Micron Technology, Inc. Self-aligned PECVD etch mask
EP2306242A3 (en) * 2000-10-12 2011-11-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
TW525221B (en) 2000-12-04 2003-03-21 Ebara Corp Substrate processing method
US6489068B1 (en) 2001-02-21 2002-12-03 Advanced Micro Devices, Inc. Process for observing overlay errors on lithographic masks
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6791669B2 (en) 2001-04-12 2004-09-14 Nikon Corporation Positioning device and exposure apparatus including the same
US6383888B1 (en) 2001-04-18 2002-05-07 Advanced Micro Devices, Inc. Method and apparatus for selecting wafer alignment marks based on film thickness variation
US6847433B2 (en) 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
CA2454570C (en) 2001-07-25 2016-12-20 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
WO2003035932A1 (en) 2001-09-25 2003-05-01 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate by using capillary force
CN100373528C (zh) 2002-03-15 2008-03-05 普林斯顿大学 激光辅助直接压印平板印刷术
US7217562B2 (en) 2002-04-16 2007-05-15 Princeton University Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
KR20050036912A (ko) 2002-05-24 2005-04-20 스티븐 와이. 추 필드-유도 압력 각인 리소그라피 방법 및 장치
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US6665119B1 (en) 2002-10-15 2003-12-16 Eastman Kodak Company Wire grid polarizer
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US6770852B1 (en) 2003-02-27 2004-08-03 Lam Research Corporation Critical dimension variation compensation across a wafer by means of local wafer temperature control
WO2004086471A1 (en) 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
CN100526052C (zh) 2003-06-09 2009-08-12 普林斯顿大学知识产权和技术许可办公室 具有改进的监测和控制的压印光刻术及其设备
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means

Similar Documents

Publication Publication Date Title
JP2007535121A5 (enExample)
WO2005006076A3 (en) Systems for magnification and distortion correction for imprint lithography processes
JP2005193374A5 (enExample)
JP3154862U (ja) クッションロッド
CN108138885B (zh) 具有向外弯曲表面的空单元
JP2006511970A5 (enExample)
WO2019068708A3 (en) Piezoelectric drive unit
SA523442382B1 (ar) تجميع طاقة كهرباء الاحتكاك باستخدام هيكل مكون من أنبوب داخل أنبوب
RU2015123463A (ru) Аккомодационная интраокулярная линза с изменяемой кривизной
WO2007145712A3 (en) Slider bearing for use with an apparatus comprising a vacuum chamber
EP2493065A3 (en) Piezoelectric actuator and piezoelectric actuator array
CN103016292A (zh) 一种电磁弹簧式磁力驱动活塞泵
SA523442379B1 (ar) تجميع الطاقة الكهربية الناتجة عن الإجهاد والطاقة الكهربية ذات التقبُّض المغناطيسي باستخدام هيكل مكون من "أنبوب في أنبوب"
JP2011239571A5 (enExample)
WO2019048909A1 (en) BUTTON SET
DE50206467D1 (de) Unterdruckdose
CN110168249A (zh) 可调节负刚度系统
US20170129102A1 (en) Apparatus for controlling stiffness of output link in moving mechanism
CN207368906U (zh) 粘滑式压电马达
JP2013021777A5 (enExample)
KR20150055713A (ko) 전기 활성 고분자를 이용한 능동형 충격 흡수 부재
KR20150052570A (ko) 전기 활성 고분자를 이용한 유연 주머니
RU2015105737A (ru) Опорный скользун
CN209301695U (zh) 一种三自由度按摩机构
KR100683930B1 (ko) 초소형 압전 리니어 모터