JP4566667B2 - めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置 - Google Patents

めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置 Download PDF

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Publication number
JP4566667B2
JP4566667B2 JP2004271466A JP2004271466A JP4566667B2 JP 4566667 B2 JP4566667 B2 JP 4566667B2 JP 2004271466 A JP2004271466 A JP 2004271466A JP 2004271466 A JP2004271466 A JP 2004271466A JP 4566667 B2 JP4566667 B2 JP 4566667B2
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JP
Japan
Prior art keywords
plating solution
plating
fept
mol
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004271466A
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English (en)
Japanese (ja)
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JP2005226156A5 (enExample
JP2005226156A (ja
Inventor
滋 市原
透 田
伸浩 安居
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Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004271466A priority Critical patent/JP4566667B2/ja
Priority to US10/566,949 priority patent/US7641783B2/en
Priority to PCT/JP2005/000732 priority patent/WO2005068688A2/en
Publication of JP2005226156A publication Critical patent/JP2005226156A/ja
Publication of JP2005226156A5 publication Critical patent/JP2005226156A5/ja
Application granted granted Critical
Publication of JP4566667B2 publication Critical patent/JP4566667B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/001—Magnets
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/858—Producing a magnetic layer by electro-plating or electroless plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/123—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys having a L10 crystallographic structure, e.g. [Co,Fe][Pt,Pd] thin films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H01F10/147—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel with lattice under strain, e.g. expanded by interstitial nitrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2004271466A 2004-01-16 2004-09-17 めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置 Expired - Fee Related JP4566667B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004271466A JP4566667B2 (ja) 2004-01-16 2004-09-17 めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置
US10/566,949 US7641783B2 (en) 2004-01-16 2005-01-14 Plating solution, process for producing a structure with the plating solution, and apparatus employing the plating solution
PCT/JP2005/000732 WO2005068688A2 (en) 2004-01-16 2005-01-14 Plating solution, process for producing a structure with the plating solution, and apparatus employing the plating solution

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004009238 2004-01-16
JP2004271466A JP4566667B2 (ja) 2004-01-16 2004-09-17 めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置

Publications (3)

Publication Number Publication Date
JP2005226156A JP2005226156A (ja) 2005-08-25
JP2005226156A5 JP2005226156A5 (enExample) 2007-11-01
JP4566667B2 true JP4566667B2 (ja) 2010-10-20

Family

ID=34797752

Family Applications (1)

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JP2004271466A Expired - Fee Related JP4566667B2 (ja) 2004-01-16 2004-09-17 めっき液、めっき液を用いた構造体の製造方法、めっき液を用いた装置

Country Status (3)

Country Link
US (1) US7641783B2 (enExample)
JP (1) JP4566667B2 (enExample)
WO (1) WO2005068688A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7327540B2 (en) * 2004-06-01 2008-02-05 Headway Technologies, Inc. Hard biased materials for recording head applications
JP2007154285A (ja) * 2005-12-07 2007-06-21 Electroplating Eng Of Japan Co コバルト−白金合金磁性膜の製造方法
JP4673735B2 (ja) * 2005-12-09 2011-04-20 日立マクセル株式会社 磁気記録媒体及びその製造方法
CH714243B1 (fr) * 2006-10-03 2019-04-15 Swatch Group Res & Dev Ltd Procédé d'électroformage et pièce ou couche obtenue par ce procédé.
CH710184B1 (fr) 2007-09-21 2016-03-31 Aliprandini Laboratoires G Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux ou métalloïdes toxiques.
KR100947645B1 (ko) * 2008-02-28 2010-03-12 창원대학교 산학협력단 ＦｅＰｔ 자성박막의 제조방법
US9011706B2 (en) * 2008-12-16 2015-04-21 City University Of Hong Kong Method of making foraminous microstructures
JP5334118B2 (ja) * 2009-09-16 2013-11-06 国立大学法人信州大学 Ｆｅ‐Ｐｔ合金めっき方法およびＦｅ‐Ｐｔ合金めっき液
EP2312021B1 (fr) * 2009-10-15 2020-03-18 The Swatch Group Research and Development Ltd. Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux toxiques

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL243931A (enExample) 1958-10-01
JPS52108341A (en) * 1976-03-09 1977-09-10 Kosaku Kk Noble metal plating bath
GB8821005D0 (en) * 1988-09-07 1988-10-05 Johnson Matthey Plc Improvements in plating
BR8805772A (pt) * 1988-11-01 1990-06-12 Metal Leve Sa Processo de formacao de camada de deslizamento de mancal
JP3423440B2 (ja) * 1994-09-17 2003-07-07 田中貴金属工業株式会社 白金−タングステン合金めっき浴
US5435898A (en) * 1994-10-25 1995-07-25 Enthone-Omi Inc. Alkaline zinc and zinc alloy electroplating baths and processes
JPH10212592A (ja) 1997-01-28 1998-08-11 Tanaka Kikinzoku Kogyo Kk 白金合金メッキ浴
JP3886082B2 (ja) 1997-11-12 2007-02-28 キヤノン株式会社 ナノ構造体及びその製造方法
JP2002180259A (ja) 2000-12-12 2002-06-26 Shipley Co Llc めっき液における金属析出促進化合物および該化合物を含むめっき液
JP3730518B2 (ja) * 2001-01-19 2006-01-05 株式会社東芝 磁気記録媒体
JP3693647B2 (ja) * 2001-02-08 2005-09-07 日立マクセル株式会社 金属合金微粒子及びその製造方法
JP3749845B2 (ja) * 2001-09-14 2006-03-01 株式会社東芝 磁気記録媒体および磁気記録装置
AU2003213353A1 (en) 2002-03-15 2003-09-29 Canon Kabushiki Kaisha Porous material and process for producing the same
WO2003078685A1 (en) 2002-03-15 2003-09-25 Canon Kabushiki Kaisha Functional device and method of manufacturing the device, vertical magnetic recording medium, magnetic recording and reproducing device, and information processing device
AU2003221365A1 (en) 2002-03-15 2003-09-29 Canon Kabushiki Kaisha Porous material and process for producing the same
JP4035459B2 (ja) 2002-03-15 2008-01-23 キヤノン株式会社 酸化物多孔質体の製造方法
JP2004323948A (ja) 2003-04-28 2004-11-18 Electroplating Eng Of Japan Co 磁性膜形成用電析めっき浴及びそれを用いた電析めっき方法
JP4865240B2 (ja) 2004-03-23 2012-02-01 キヤノン株式会社 構造体の製造方法、磁気記録媒体の製造方法、成型体の製造方法

Also Published As

Publication number Publication date
WO2005068688A2 (en) 2005-07-28
JP2005226156A (ja) 2005-08-25
WO2005068688A3 (en) 2006-03-02
US20060254924A1 (en) 2006-11-16
US7641783B2 (en) 2010-01-05

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