JP4562688B2 - 導電性インク、その製造方法および導電性基板 - Google Patents
導電性インク、その製造方法および導電性基板 Download PDFInfo
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- JP4562688B2 JP4562688B2 JP2006139449A JP2006139449A JP4562688B2 JP 4562688 B2 JP4562688 B2 JP 4562688B2 JP 2006139449 A JP2006139449 A JP 2006139449A JP 2006139449 A JP2006139449 A JP 2006139449A JP 4562688 B2 JP4562688 B2 JP 4562688B2
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- 239000000758 substrate Substances 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000002082 metal nanoparticle Substances 0.000 claims description 42
- 239000000203 mixture Substances 0.000 claims description 24
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 12
- 238000010304 firing Methods 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 8
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 claims description 8
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 6
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 6
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims description 4
- BGHCVCJVXZWKCC-NJFSPNSNSA-N tetradecane Chemical group CCCCCCCCCCCCC[14CH3] BGHCVCJVXZWKCC-NJFSPNSNSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 57
- 239000002184 metal Substances 0.000 description 57
- 239000002243 precursor Substances 0.000 description 24
- -1 amine compound Chemical class 0.000 description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 239000010949 copper Substances 0.000 description 8
- 239000002270 dispersing agent Substances 0.000 description 7
- 239000010931 gold Substances 0.000 description 6
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- 239000010944 silver (metal) Substances 0.000 description 5
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- 239000000654 additive Substances 0.000 description 4
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- 125000000524 functional group Chemical group 0.000 description 4
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- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 4
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- 229910001111 Fine metal Inorganic materials 0.000 description 3
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- 229910052802 copper Inorganic materials 0.000 description 3
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- 238000002844 melting Methods 0.000 description 3
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- 229920001721 polyimide Polymers 0.000 description 3
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- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
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- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
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- QFKMMXYLAPZKIB-UHFFFAOYSA-N undecan-1-amine Chemical compound CCCCCCCCCCCN QFKMMXYLAPZKIB-UHFFFAOYSA-N 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000012691 Cu precursor Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical group S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 239000010946 fine silver Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229940105132 myristate Drugs 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- IYDNQWWOZQLMRH-UHFFFAOYSA-N octadec-1-yne Chemical compound CCCCCCCCCCCCCCCCC#C IYDNQWWOZQLMRH-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadecene Natural products CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000010019 resist printing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229940095068 tetradecene Drugs 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/121—Metallo-organic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/125—Inorganic compounds, e.g. silver salt
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Conductive Materials (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
1)金属混合物
(1)金属前駆体
(2)アミン系化合物
2)金属ナノ粒子
金属ナノ粒子間にくっつくことなく分散安定性を維持するように金属ナノ粒子は分散剤によってキャッピングされている。このキャッピング膜を形成させる分散剤(cappingmolecular)として金属ナノ粒子との配位結合が可能な酸素、窒素、硫黄の原子の孤立電子対を有する化合物の中の一つ以上を選択することができる。例えば、窒素原子を有する官能基としてアミノ基があげられるし、このアミノ基を有する化合物としてアルキルアミンがあげられる。また、硫黄原子を有する官能基としてスルファニル基、スルフィド型のスルファン基があげられるし、このような官能基を有する化合物の例としてアルカンチオールがあげられる。酸素原子を有する官能基としては、カルボキシル基、ヒドロキシ基、エーテル型のオキシ基があげられるが、このヒドロキシ基を有する化合物の例としてアルカンジオールがあげあれる。
金属ナノ粒子を成す金属成分は、銀(Ag)、銅(Cu)、ニッケル(Ni)、金(Au)、白金(Pt)、パラジウム(Pd)および鉄(Fe)およびこれらの中の二つ以上の金属を含む混合物の中で少なくとも一つを選択することができる。
金属混合物と金属ナノ粒子とを混合して、これを有機溶媒に溶かすと導電性インクが形成される。この有機溶媒は非極性であることが好ましくて、従来の水系溶媒を使用した時より金属ナノ粒子の分散安定性が優れる。このような非極性有機溶媒の例として炭化水素系化合物があげられるし、より具体的には、ヘキサン、オクタン、デカン、テトラデカン、テトラデセン、ヘキサデカン、1-ヘキサデシン、オクタデセン、1-オクタデシン、トルエン、キシレン、クロロ安息香酸などをあげることができる。このなかで、粘度の低いテトラデカンが好ましい。
本発明の好ましい実施例によれば、接着性、粘度または、インクの吐出時の尾の模様、ヘッドの濡れ性などを考慮して選択的に添加剤をさらに添加することができる。このような添加剤は所望の目的を発現させるのに相応しく導電性インクに含まれることができる。
好ましい実施例によれば、上記の金属前駆体とアミン系化合物は、モル比1:2ないし1:10で混合することができる。しかしながら、モル比が1:2以下になると金属前駆体を解離させることができない。また、モル比が1:10以上になると形成された金属混合物の粘度が高くなってインクジェット方式によって印刷するのに適しない。金属前駆体とアミン系化合物をモル比1:2で混合するのがより好ましい。
ポリマー基板のようなベース基材の表面を洗浄して、このベース基材上にフォトリソグラフィ法またはスクリーン印刷法を利用してあらかじめ設計された配線パターンを転写する。その後、導電性インクをインクジェット方式によって予め転写された配線パターンに沿ってベース基材に印刷する。この導電性インクおよびその製造方法は上記と同様である。このベース基材を還元雰囲気下にて焼成させると、アミン系化合物、キャッピング膜、および、有機溶媒のような有機成分は除去される。金属ナノ粒子は互いにくっついて粒子間の空隙は金属前駆体より提供された微細な金属粒子にて満たされて優れた電気伝導度を有する導電性配線が形成される。このとき、焼成温度は60ないし150℃範囲内である。
[比較例]
Claims (7)
- 硝酸銀をブチルアミンと混合した混合物と、ドデシルアミンによってキャッピングされた銀ナノ粒子を1:1ないし1:1000の重量部でテトラデカンにて混合した導電性インク。
- 前記硝酸銀と前記ブチルアミンは、モル比1:2ないし1:10で混合された請求項1記載の導電性インク。
- 前記銀ナノ粒子の大きさは1ないし10nmである請求項1記載の導電性インク。
- 硝酸銀をブチルアミンと混合して混合物を形成させる段階、および
ドデシルアミンによってキャッピングされた銀ナノ粒子と前記混合物とを混合物1重量部に対して銀ナノ粒子1ないし1000重量部でテトラデカンにて混合させる段階を含む導電性インクの製造方法。 - 前記硝酸銀と前記ブチルアミンは、モル比1:2ないし1:10で混合された請求項4記載の導電性インクの製造方法。
- 前記金属ナノ粒子の大きさは、1ないし10nmである請求項4記載の導電性インクの製造方法。
- 請求項1、2、および3の中のある一項に記載された導電性インクをインクジェット方式によってベース基材に配線を形成して、前記ベース基材を60ないし150℃で焼成させて製造された導電性基板。
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Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100790457B1 (ko) * | 2006-07-10 | 2008-01-02 | 삼성전기주식회사 | 금속 나노입자의 제조방법 |
US7968008B2 (en) | 2006-08-03 | 2011-06-28 | Fry's Metals, Inc. | Particles and inks and films using them |
KR100797484B1 (ko) * | 2006-08-29 | 2008-01-23 | 삼성전기주식회사 | 큐빅 형태의 구리 나노입자의 제조방법 |
US9615463B2 (en) | 2006-09-22 | 2017-04-04 | Oscar Khaselev | Method for producing a high-aspect ratio conductive pattern on a substrate |
KR100882095B1 (ko) * | 2006-12-20 | 2009-02-10 | 주식회사 포스코 | 자기 조립 특성을 이용한 금속 입자의 표면 처리 방법,상기 방법에 의해 표면 처리된 금속 입자, 상기 금속입자를 포함하는 고분자 수지 용액 제조 방법 및 상기방법으로 제조된 고분자 수지 용액으로 코팅된 강판 |
JP5081454B2 (ja) * | 2007-01-15 | 2012-11-28 | Dowaエレクトロニクス株式会社 | 銀導電膜およびその製造方法 |
KR100709724B1 (ko) * | 2007-01-30 | 2007-04-24 | (주)이그잭스 | 도전막 형성을 위한 금속 페이스트 |
CN101274751B (zh) * | 2007-03-30 | 2010-04-14 | 清华大学 | 单分散银、硫化银及硒化银纳米晶的制备方法 |
KR20090012605A (ko) * | 2007-07-30 | 2009-02-04 | 삼성전기주식회사 | 금속 나노입자의 제조방법 |
KR100935168B1 (ko) * | 2007-09-21 | 2010-01-06 | 삼성전기주식회사 | 비수계 전도성 나노잉크 조성물 |
JP5194711B2 (ja) * | 2007-10-22 | 2013-05-08 | コニカミノルタホールディングス株式会社 | インクジェット用洗浄液及び洗浄方法 |
US8197717B2 (en) * | 2007-12-18 | 2012-06-12 | Lg Chem, Ltd. | Metal ink for ink-jet printing |
JP5371247B2 (ja) * | 2008-01-06 | 2013-12-18 | Dowaエレクトロニクス株式会社 | 銀塗料およびその製造法 |
JP5139846B2 (ja) * | 2008-03-11 | 2013-02-06 | Dowaエレクトロニクス株式会社 | ケトンとの親和性に優れた銀微粉および銀インク |
WO2010065503A2 (en) * | 2008-12-01 | 2010-06-10 | University Of Massachusetts Lowell | Conductive formulations for use in electrical, electronic and rf applications |
JP5521207B2 (ja) * | 2009-01-28 | 2014-06-11 | 東ソー株式会社 | 導電膜形成用組成物及びその製造方法、並びに導電膜の形成方法 |
KR101180475B1 (ko) * | 2009-02-05 | 2012-09-07 | 주식회사 엘지화학 | 전도성 패턴의 형성방법 및 이에 의하여 제조된 전도성 패턴을 갖는 기판 |
CA2810827A1 (en) | 2009-09-08 | 2011-06-03 | University Of Massachusetts | Wireless passive radio-frequency strain and displacement sensors |
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KR101701819B1 (ko) * | 2011-09-08 | 2017-02-13 | 김명진 | 금속의 제조방법 |
TWI591134B (zh) * | 2012-08-02 | 2017-07-11 | Daicel Corp | A method of manufacturing silver ink containing silver nanoparticles, and an ink containing silver nanoparticles |
KR101350507B1 (ko) * | 2013-01-09 | 2014-01-17 | (주)쎄미시스코 | 금속 나노입자를 포함하는 전기전도성 잉크 및 이의 광 소결 방법 |
US10516118B2 (en) * | 2015-09-30 | 2019-12-24 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, display device, method for manufacturing the same, and system including a plurality of display devices |
US9902862B2 (en) * | 2016-07-06 | 2018-02-27 | National Cheng Kung University | Method of fabricating nano-silver paste having high bonding strength |
CA3085837A1 (en) * | 2017-12-22 | 2019-06-27 | National Research Council Of Canada | Copper ink for high conductivity fine printing |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1180647A (ja) * | 1997-07-17 | 1999-03-26 | Nippon Paint Co Ltd | 貴金属又は銅のコロイド溶液及びその製造方法並びに塗料組成物及び樹脂成型物 |
WO2002018080A1 (fr) * | 2000-08-03 | 2002-03-07 | Upepo & Maji Inc. | Composition de solution colloidale metallique et conducteur ou encre destine a la formation d'un motif semi-conducteur la renfermant, et procede de formation d'un motif conducteur ou semi-conducteur |
JP2003071277A (ja) * | 2001-09-03 | 2003-03-11 | Fuji Electric Co Ltd | 超音波化学反応方法及び装置 |
WO2003051562A1 (fr) * | 2001-12-18 | 2003-06-26 | Asahi Kasei Kabushiki Kaisha | Dispersion d'oxyde metallique |
JP2003288812A (ja) * | 2001-12-29 | 2003-10-10 | Samsung Electronics Co Ltd | 金属ナノ粒子クラスターインクおよびこれを用いた金属パターン形成方法 |
WO2004005413A1 (en) * | 2002-07-03 | 2004-01-15 | Nanopowders Industries Ltd. | Low sintering temperatures conductive nano-inks and a method for producing the same |
JP2004143325A (ja) * | 2002-10-25 | 2004-05-20 | Bando Chem Ind Ltd | 導電性インク |
JP2004256757A (ja) * | 2003-02-27 | 2004-09-16 | Asahi Glass Co Ltd | インクジェットプリンタ用の導電性インクおよび製造方法 |
JP2005109415A (ja) * | 2003-10-02 | 2005-04-21 | Denso Corp | 電子部品の実装構造 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05135619A (ja) * | 1991-11-13 | 1993-06-01 | Kao Corp | 導電性銅ペーストの製造方法および該方法により得られる導電性銅ペースト |
JP2000309734A (ja) | 1999-02-17 | 2000-11-07 | Canon Inc | インクジェット用インク、導電性膜、電子放出素子、電子源および画像形成装置の製造方法 |
US7629017B2 (en) * | 2001-10-05 | 2009-12-08 | Cabot Corporation | Methods for the deposition of conductive electronic features |
KR100839367B1 (ko) * | 2002-04-03 | 2008-06-20 | 삼성에스디아이 주식회사 | 코팅막 형성용 조성물 및 그 제조방법 |
JP4416080B2 (ja) | 2003-01-29 | 2010-02-17 | 富士フイルム株式会社 | プリント配線基板形成用インク、プリント配線基板の形成方法及びプリント配線基板 |
AU2005245950A1 (en) * | 2004-05-19 | 2005-12-01 | Flexcon Company, Inc. | Liquid formulations for coating and printing substrates |
-
2005
- 2005-05-23 KR KR20050043254A patent/KR100690360B1/ko not_active IP Right Cessation
-
2006
- 2006-05-18 JP JP2006139449A patent/JP4562688B2/ja not_active Expired - Fee Related
- 2006-05-22 US US11/437,812 patent/US20060261316A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1180647A (ja) * | 1997-07-17 | 1999-03-26 | Nippon Paint Co Ltd | 貴金属又は銅のコロイド溶液及びその製造方法並びに塗料組成物及び樹脂成型物 |
WO2002018080A1 (fr) * | 2000-08-03 | 2002-03-07 | Upepo & Maji Inc. | Composition de solution colloidale metallique et conducteur ou encre destine a la formation d'un motif semi-conducteur la renfermant, et procede de formation d'un motif conducteur ou semi-conducteur |
JP2003071277A (ja) * | 2001-09-03 | 2003-03-11 | Fuji Electric Co Ltd | 超音波化学反応方法及び装置 |
WO2003051562A1 (fr) * | 2001-12-18 | 2003-06-26 | Asahi Kasei Kabushiki Kaisha | Dispersion d'oxyde metallique |
JP2003288812A (ja) * | 2001-12-29 | 2003-10-10 | Samsung Electronics Co Ltd | 金属ナノ粒子クラスターインクおよびこれを用いた金属パターン形成方法 |
WO2004005413A1 (en) * | 2002-07-03 | 2004-01-15 | Nanopowders Industries Ltd. | Low sintering temperatures conductive nano-inks and a method for producing the same |
JP2004143325A (ja) * | 2002-10-25 | 2004-05-20 | Bando Chem Ind Ltd | 導電性インク |
JP2004256757A (ja) * | 2003-02-27 | 2004-09-16 | Asahi Glass Co Ltd | インクジェットプリンタ用の導電性インクおよび製造方法 |
JP2005109415A (ja) * | 2003-10-02 | 2005-04-21 | Denso Corp | 電子部品の実装構造 |
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US20060261316A1 (en) | 2006-11-23 |
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