JP4531447B2 - 表面検査装置 - Google Patents

表面検査装置 Download PDF

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Publication number
JP4531447B2
JP4531447B2 JP2004165671A JP2004165671A JP4531447B2 JP 4531447 B2 JP4531447 B2 JP 4531447B2 JP 2004165671 A JP2004165671 A JP 2004165671A JP 2004165671 A JP2004165671 A JP 2004165671A JP 4531447 B2 JP4531447 B2 JP 4531447B2
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JP
Japan
Prior art keywords
light
irradiation
light receiving
measurement object
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004165671A
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English (en)
Japanese (ja)
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JP2005345281A5 (enExample
JP2005345281A (ja
Inventor
一宏 宮川
陽一郎 岩
明彦 関根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Topcon Corp
Original Assignee
Topcon Corp
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Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Priority to JP2004165671A priority Critical patent/JP4531447B2/ja
Priority to US11/135,478 priority patent/US7348585B2/en
Publication of JP2005345281A publication Critical patent/JP2005345281A/ja
Publication of JP2005345281A5 publication Critical patent/JP2005345281A5/ja
Application granted granted Critical
Publication of JP4531447B2 publication Critical patent/JP4531447B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2004165671A 2004-06-03 2004-06-03 表面検査装置 Expired - Fee Related JP4531447B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004165671A JP4531447B2 (ja) 2004-06-03 2004-06-03 表面検査装置
US11/135,478 US7348585B2 (en) 2004-06-03 2005-05-24 Surface inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004165671A JP4531447B2 (ja) 2004-06-03 2004-06-03 表面検査装置

Publications (3)

Publication Number Publication Date
JP2005345281A JP2005345281A (ja) 2005-12-15
JP2005345281A5 JP2005345281A5 (enExample) 2007-07-19
JP4531447B2 true JP4531447B2 (ja) 2010-08-25

Family

ID=35448524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004165671A Expired - Fee Related JP4531447B2 (ja) 2004-06-03 2004-06-03 表面検査装置

Country Status (2)

Country Link
US (1) US7348585B2 (enExample)
JP (1) JP4531447B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4694179B2 (ja) * 2004-11-18 2011-06-08 株式会社トプコン 表面検査装置
JP4908925B2 (ja) * 2006-02-08 2012-04-04 株式会社日立ハイテクノロジーズ ウェハ表面欠陥検査装置およびその方法
US20070211241A1 (en) 2006-02-24 2007-09-13 Noriyuki Aizawa Optical defect inspection apparatus
JP4931502B2 (ja) * 2006-07-13 2012-05-16 株式会社日立ハイテクノロジーズ 表面検査方法及び検査装置
JP2008216105A (ja) * 2007-03-06 2008-09-18 Topcon Corp 表面検査方法及び装置
US7925075B2 (en) * 2007-05-07 2011-04-12 General Electric Company Inspection system and methods with autocompensation for edge break gauging orientation
JP5241245B2 (ja) 2008-01-11 2013-07-17 株式会社日立ハイテクノロジーズ 検査装置及び検査方法
JP2010197210A (ja) * 2009-02-25 2010-09-09 Tokyo Gas Co Ltd 表面形状測定方法及びその装置
JP5448599B2 (ja) * 2009-06-24 2014-03-19 キヤノン株式会社 測定システム及び測定処理方法
EP2816585A1 (en) * 2013-06-17 2014-12-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam system and method of operating thereof
JP2013210393A (ja) * 2013-07-01 2013-10-10 Hitachi High-Technologies Corp 欠陥検査方法及び欠陥検査装置
JP2020085468A (ja) * 2018-11-15 2020-06-04 アダマンド並木精密宝石株式会社 光学式内周面表面気孔測定装置及び気孔率の測定方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56158904A (en) * 1980-05-12 1981-12-08 Nippon Sheet Glass Co Ltd Method and device for measuring surface strain of surface having light reflexibility
US5835220A (en) * 1995-10-27 1998-11-10 Nkk Corporation Method and apparatus for detecting surface flaws
US5892224A (en) * 1996-05-13 1999-04-06 Nikon Corporation Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams
JP4215220B2 (ja) * 1997-11-21 2009-01-28 株式会社トプコン 表面検査方法及び表面検査装置
US6636310B1 (en) * 1998-05-12 2003-10-21 Metroptic Technologies, Ltd. Wavelength-dependent surface contour measurement system and method
US6432729B1 (en) * 1999-09-29 2002-08-13 Lam Research Corporation Method for characterization of microelectronic feature quality
JP4644329B2 (ja) * 2000-02-24 2011-03-02 株式会社トプコン 表面検査装置
US6731384B2 (en) * 2000-10-10 2004-05-04 Hitachi, Ltd. Apparatus for detecting foreign particle and defect and the same method
US20020180959A1 (en) * 2001-05-30 2002-12-05 Hiroshi Nakajima Optical system for detecting surface defects and disk tester and disk testing method utilizing the same optical system
US20040042001A1 (en) * 2002-04-18 2004-03-04 Kla-Tencor Technologies Corporation Simultaneous multi-spot inspection and imaging

Also Published As

Publication number Publication date
US20050270522A1 (en) 2005-12-08
JP2005345281A (ja) 2005-12-15
US7348585B2 (en) 2008-03-25

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