JP4526661B2 - 検査装置および検査方法 - Google Patents

検査装置および検査方法 Download PDF

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Publication number
JP4526661B2
JP4526661B2 JP2000195128A JP2000195128A JP4526661B2 JP 4526661 B2 JP4526661 B2 JP 4526661B2 JP 2000195128 A JP2000195128 A JP 2000195128A JP 2000195128 A JP2000195128 A JP 2000195128A JP 4526661 B2 JP4526661 B2 JP 4526661B2
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JP2002014054A (ja
JP2002014054A5 (enExample
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明 吉川
和久 町田
仁 小室
大博 平井
勝弘 北橋
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Hitachi Ltd
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Hitachi Ltd
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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • G06T7/001Industrial image inspection using an image reference approach
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/60Analysis of geometric attributes
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2200/00Indexing scheme for image data processing or generation, in general
    • G06T2200/24Indexing scheme for image data processing or generation, in general involving graphical user interfaces [GUIs]
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Geometry (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
JP2000195128A 2000-06-28 2000-06-28 検査装置および検査方法 Expired - Lifetime JP4526661B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000195128A JP4526661B2 (ja) 2000-06-28 2000-06-28 検査装置および検査方法
US09/886,976 US6968079B2 (en) 2000-06-28 2001-06-25 Investigation device and investigation method

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JP2000195128A JP4526661B2 (ja) 2000-06-28 2000-06-28 検査装置および検査方法

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JP2002014054A JP2002014054A (ja) 2002-01-18
JP2002014054A5 JP2002014054A5 (enExample) 2007-08-02
JP4526661B2 true JP4526661B2 (ja) 2010-08-18

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JP (1) JP4526661B2 (enExample)

Families Citing this family (23)

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US7158888B2 (en) 2001-05-04 2007-01-02 Takeda San Diego, Inc. Determining structures by performing comparisons between molecular replacement results for multiple different biomolecules
EP1349114A3 (en) 2002-03-19 2011-06-15 Canon Kabushiki Kaisha Sensor calibration apparatus, sensor calibration method, program, storage medium, information processing method, and information processing apparatus
JP4155496B2 (ja) * 2002-04-25 2008-09-24 大日本スクリーン製造株式会社 分類支援装置、分類装置およびプログラム
JP4118703B2 (ja) * 2002-05-23 2008-07-16 株式会社日立ハイテクノロジーズ 欠陥分類装置及び欠陥自動分類方法並びに欠陥検査方法及び処理装置
JP3978098B2 (ja) * 2002-08-12 2007-09-19 株式会社日立製作所 欠陥分類方法及びその装置
AU2003299056A1 (en) * 2002-09-26 2004-04-19 Lam Research Corporation User interface for quantifying wafer non-uniformities and graphically explore significance
US7602962B2 (en) * 2003-02-25 2009-10-13 Hitachi High-Technologies Corporation Method of classifying defects using multiple inspection machines
JP2004354251A (ja) * 2003-05-29 2004-12-16 Nidek Co Ltd 欠陥検査装置
US7333650B2 (en) * 2003-05-29 2008-02-19 Nidek Co., Ltd. Defect inspection apparatus
JP3834041B2 (ja) * 2004-03-31 2006-10-18 オリンパス株式会社 学習型分類装置及び学習型分類方法
US7647132B2 (en) * 2004-05-05 2010-01-12 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for problem case packaging
US8891852B2 (en) * 2004-06-09 2014-11-18 Cognex Technology And Investment Corporation Method and apparatus for configuring and testing a machine vision detector
JP5871446B2 (ja) * 2004-10-12 2016-03-01 ケーエルエー−テンカー コーポレイション 試験体上の欠陥を分類するためのコンピュータに実装された方法およびシステム
JP4691453B2 (ja) * 2006-02-22 2011-06-01 株式会社日立ハイテクノロジーズ 欠陥表示方法およびその装置
US8639028B2 (en) * 2006-03-30 2014-01-28 Adobe Systems Incorporated Automatic stacking based on time proximity and visual similarity
JP2011009244A (ja) * 2007-10-25 2011-01-13 Nikon Corp 観察装置および観察方法、並びに検査装置および検査方法
US20110032259A1 (en) * 2009-06-09 2011-02-10 Intromedic Co., Ltd. Method of displaying images obtained from an in-vivo imaging device and apparatus using same
JP5719760B2 (ja) * 2011-12-28 2015-05-20 株式会社日立ハイテクノロジーズ 欠陥分類装置
US8983150B2 (en) 2012-12-17 2015-03-17 Adobe Systems Incorporated Photo importance determination
US8897556B2 (en) 2012-12-17 2014-11-25 Adobe Systems Incorporated Photo chapters organization
JP6997964B2 (ja) * 2018-03-13 2022-02-04 オムロン株式会社 判別システム、判別装置、学習装置、判別方法及びプログラム
US10481379B1 (en) 2018-10-19 2019-11-19 Nanotronics Imaging, Inc. Method and system for automatically mapping fluid objects on a substrate
JP7480536B2 (ja) * 2020-03-12 2024-05-10 富士フイルムビジネスイノベーション株式会社 文書処理装置及びプログラム

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04326287A (ja) * 1991-04-25 1992-11-16 Sony Corp 立体外観検査装置
JPH0518901A (ja) * 1991-07-15 1993-01-26 Toshiba Corp ウエーハ表面検査装置
JPH06342359A (ja) * 1993-10-08 1994-12-13 Casio Comput Co Ltd メニュー選択方法
JP3476913B2 (ja) 1994-07-08 2003-12-10 オリンパス株式会社 欠陥種別判定装置及びプロセス管理システム
JPH0863486A (ja) * 1994-08-24 1996-03-08 Fuji Photo Film Co Ltd 画像ファイル記録方法および画像ファイリングシステム
JPH1091634A (ja) * 1996-08-15 1998-04-10 Hewlett Packard Co <Hp> 写真画像検索システム
JP4132229B2 (ja) 1998-06-03 2008-08-13 株式会社ルネサステクノロジ 欠陥分類方法
JP4220595B2 (ja) 1998-08-10 2009-02-04 株式会社日立製作所 欠陥の分類方法並びに教示用データ作成方法
JP2000076570A (ja) * 1998-08-28 2000-03-14 Mitsubishi Electric Corp 映像警報表示装置及び映像警報表示方法
JP3893765B2 (ja) * 1998-09-25 2007-03-14 株式会社日立製作所 レビュー装置
JP3493312B2 (ja) * 1998-11-30 2004-02-03 株式会社日立製作所 回路パターンの検査装置および検査方法
JP4006119B2 (ja) * 1998-11-30 2007-11-14 株式会社日立製作所 回路パターン検査装置、および回路パターン検査方法
JP4035242B2 (ja) * 1998-11-30 2008-01-16 株式会社日立製作所 回路パターンの検査方法及び検査装置
JP2000164661A (ja) * 1998-11-30 2000-06-16 Hitachi Ltd 回路パターンの検査装置
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
JP3812185B2 (ja) * 1998-12-01 2006-08-23 株式会社日立製作所 欠陥分類方法およびその装置

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US6968079B2 (en) 2005-11-22
JP2002014054A (ja) 2002-01-18

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