JP4508354B2 - 走査露光装置および走査露光方法 - Google Patents

走査露光装置および走査露光方法 Download PDF

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Publication number
JP4508354B2
JP4508354B2 JP2000128714A JP2000128714A JP4508354B2 JP 4508354 B2 JP4508354 B2 JP 4508354B2 JP 2000128714 A JP2000128714 A JP 2000128714A JP 2000128714 A JP2000128714 A JP 2000128714A JP 4508354 B2 JP4508354 B2 JP 4508354B2
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substrate
original
region
mark
crystal panel
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Expired - Fee Related
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JP2000128714A
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Japanese (ja)
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JP2001312069A5 (https=
JP2001312069A (ja
Inventor
浩之 高橋
誠 杉岡
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000128714A 2000-04-28 2000-04-28 走査露光装置および走査露光方法 Expired - Fee Related JP4508354B2 (ja)

Priority Applications (1)

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JP2000128714A JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000128714A JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

Publications (3)

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JP2001312069A JP2001312069A (ja) 2001-11-09
JP2001312069A5 JP2001312069A5 (https=) 2007-06-21
JP4508354B2 true JP4508354B2 (ja) 2010-07-21

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JP2000128714A Expired - Fee Related JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100997968B1 (ko) 2003-10-13 2010-12-02 삼성전자주식회사 박막 트랜지스터 표시판의 제조 방법
JP4401834B2 (ja) 2004-03-23 2010-01-20 株式会社アドテックエンジニアリング 露光装置及び位置合わせ方法
WO2007113933A1 (ja) * 2006-04-05 2007-10-11 Sharp Kabushiki Kaisha 露光方法および露光装置
WO2012073810A1 (ja) * 2010-12-03 2012-06-07 シャープ株式会社 表示パネル用基板及び基板露光方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919318A (ja) * 1982-07-23 1984-01-31 Hitachi Ltd 転写パタ−ンの位置ずれ検査方法および転写パタ−ンマスク
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法
JPS61226924A (ja) * 1985-04-01 1986-10-08 Canon Inc 露光装置
JPS61242021A (ja) * 1985-04-19 1986-10-28 Canon Inc 露光装置
JPH03180017A (ja) * 1989-12-08 1991-08-06 Fujitsu Ltd 半導体装置の製造方法
JP2741114B2 (ja) * 1991-05-08 1998-04-15 日立電子エンジニアリング株式会社 カラー用液晶基板の位置合わせ方法
JPH05265027A (ja) * 1992-03-24 1993-10-15 Toshiba Corp 位置決め方法及びその装置
JP3198310B2 (ja) * 1993-01-06 2001-08-13 株式会社ニコン 露光方法及び装置
JP3259409B2 (ja) * 1993-02-16 2002-02-25 株式会社ニコン 露光装置
JPH07297106A (ja) * 1994-04-25 1995-11-10 Dainippon Screen Mfg Co Ltd 拡大投影型露光装置における投影像のアライメント方法
JP3379238B2 (ja) * 1994-09-08 2003-02-24 株式会社ニコン 走査型露光装置
JPH08293453A (ja) * 1995-04-25 1996-11-05 Canon Inc 走査型露光装置及び該装置を用いた露光方法
JPH09115820A (ja) * 1995-10-13 1997-05-02 Nikon Corp 走査型露光装置及び露光方法
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
JP2001296667A (ja) * 2000-04-14 2001-10-26 Nikon Corp 走査露光方法および走査型露光装置並びにマスク

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JP2001312069A (ja) 2001-11-09

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