JP4502921B2 - 基板処理における排気装置 - Google Patents
基板処理における排気装置 Download PDFInfo
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- JP4502921B2 JP4502921B2 JP2005291046A JP2005291046A JP4502921B2 JP 4502921 B2 JP4502921 B2 JP 4502921B2 JP 2005291046 A JP2005291046 A JP 2005291046A JP 2005291046 A JP2005291046 A JP 2005291046A JP 4502921 B2 JP4502921 B2 JP 4502921B2
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- exhaust
- substrate processing
- wafer
- cylinder
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- Prior art date
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- 238000012545 processing Methods 0.000 title claims description 90
- 239000000758 substrate Substances 0.000 title claims description 32
- 239000012530 fluid Substances 0.000 claims description 49
- 238000011144 upstream manufacturing Methods 0.000 claims description 23
- 230000002093 peripheral effect Effects 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000002244 precipitate Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 133
- 238000012546 transfer Methods 0.000 description 38
- 238000010438 heat treatment Methods 0.000 description 31
- 238000000576 coating method Methods 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 20
- 238000001816 cooling Methods 0.000 description 19
- 238000011161 development Methods 0.000 description 12
- 230000018109 developmental process Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 10
- 230000005484 gravity Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000000859 sublimation Methods 0.000 description 3
- 230000008022 sublimation Effects 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67225—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one lithography chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
Description
図4は、この発明に係る排気装置の第1実施形態の使用状態を示す断面図、図5は、上記排気装置と加熱装置を示す斜視図、図6は、上記排気装置の要部を示す拡大断面図である。
図8は、この発明に係る排気装置の第2実施形態の要部を示す断面斜視図である。
図9は、この発明に係る排気装置の第3実施形態を示す概略断面図である。
上記実施形態では、この発明に係る排気装置を具備する加熱処理装置を半導体ウエハのレジスト塗布・現像処理システムにおける加熱処理装置に適用した場合について説明したが、LCDガラス基板のレジスト塗布・現像処理システムにおける加熱処理装置にも適用できることは勿論である。
68 排気管
69 導電性コイル
70 排気装置
71 外部排気筒
71a 内壁面
71b 底部
73 マノメータ(圧力検出手段)
74 目視窓
75 上部半体
76 下部半体
77 粗面部
80,80A 中間排気筒
80a 内壁面
80b 外壁面
90 内部排気筒
90b 外壁面
100 エジェクタ(排気手段)
201 下流案内路
202 上流案内路
203 排出路
Claims (8)
- 被処理基板を収容する処理室内に供給されて処理に供される流体を排気する排気装置であって、
排気管を介して上記処理室に接続される上下端が閉塞する外部排気筒内に、該外部排気筒内を流れる排気流体を下方へ案内する下流案内路と、該下流案内路を流れた排気流体を上方へ案内すると共に排気流体中の異物等を重力沈降させる上流案内路と、該上流案内路を流れる排気流体を下方外部へ案内する排出路とを具備し、上記排出路に排気手段を介設してなり、
上記外部排気筒と、該外部排気筒の頂部に一端が連結され、下端が開放する中間排気筒とで上記下流案内路を形成し、上記中間排気筒と、該中間排気筒内に隙間をおいて、かつ、上端が開放した状態で挿入されると共に、上記外部排気筒の底部を貫通する内部排気筒とで上記上流案内路を形成し、かつ、上記内部排気筒にて上記排出路を形成してなる、ことを特徴とする基板処理における排気装置。 - 請求項1記載の基板処理における排気装置において、
上記外部排気筒に、複数の処理室にそれぞれ接続する複数の排気管を接続してなる、ことを特徴とする基板処理における排気装置。 - 請求項1又は2記載の基板処理における排気装置において、
上記外部排気筒に、該外部排気筒内に堆積した異物等を検出すべく外部排気筒内の圧力を検出する圧力検出手段を更に具備してなる、ことを特徴とする基板処理における排気装置。 - 請求項1ないし3のいずれかに記載の基板処理における排気装置において、
上記外部排気筒の底部付近に、外部排気筒内に堆積した異物等を目視可能な目視窓を更に具備してなる、ことを特徴とする基板処理における排気装置。 - 請求項1ないし4のいずれかに記載の基板処理における排気装置において、
上記中間排気筒が形成する上流案内路の外周内壁を下方に向かって拡開テーパ状に形成してなる、ことを特徴とする基板処理における排気装置。 - 請求項1ないし5のいずれかに記載の基板処理における排気装置において、
上記外部排気筒の内壁面、上記中間排気筒の内外壁面及び上記内部排気筒の外壁面における少なくとも中間排気筒の内壁面と内部排気筒の外壁面に、排気流体中の異物等の付着を促進する粗面部を形成してなる、ことを特徴とする基板処理における排気装置。 - 請求項1ないし6のいずれかに記載の基板処理における排気装置において、
上記外部排気筒を、中間排気筒を連結した上部半体と、内部排気筒を嵌挿した下部半体とに分割可能に形成してなる、ことを特徴とする基板処理における排気装置。 - 請求項1ないし7のいずれかに記載の基板処理における排気装置において、
上記排気管に帯電防止処理を施してなる、ことを特徴とする基板処理における排気装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005291046A JP4502921B2 (ja) | 2005-10-04 | 2005-10-04 | 基板処理における排気装置 |
CNB2006101599684A CN100511586C (zh) | 2005-10-04 | 2006-09-28 | 用于基板处理的排气装置 |
US11/529,504 US20070074745A1 (en) | 2005-10-04 | 2006-09-29 | Exhaust system for use in processing a substrate |
TW095136534A TW200741807A (en) | 2005-10-04 | 2006-10-02 | Exhaust device in substrate processing |
KR1020060096982A KR101084457B1 (ko) | 2005-10-04 | 2006-10-02 | 기판 처리에 있어서의 배기 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005291046A JP4502921B2 (ja) | 2005-10-04 | 2005-10-04 | 基板処理における排気装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007103638A JP2007103638A (ja) | 2007-04-19 |
JP4502921B2 true JP4502921B2 (ja) | 2010-07-14 |
Family
ID=37900749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005291046A Active JP4502921B2 (ja) | 2005-10-04 | 2005-10-04 | 基板処理における排気装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070074745A1 (ja) |
JP (1) | JP4502921B2 (ja) |
KR (1) | KR101084457B1 (ja) |
CN (1) | CN100511586C (ja) |
TW (1) | TW200741807A (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100842018B1 (ko) * | 2007-02-20 | 2008-06-27 | 세메스 주식회사 | 기판 처리 장치 |
TW200929357A (en) | 2007-12-20 | 2009-07-01 | Gudeng Prec Industral Co Ltd | Gas filling apparatus |
JP2013030366A (ja) * | 2011-07-28 | 2013-02-07 | Ngk Spark Plug Co Ltd | 発電装置用異物分離器、燃料電池スタック、排ガス熱交換装置、発電装置システム |
CN102503106B (zh) | 2011-10-28 | 2013-11-27 | 深圳市华星光电技术有限公司 | 切割机构的碎屑收集装置及lcd面板切割碎屑吸除装置 |
US20170032983A1 (en) * | 2015-07-29 | 2017-02-02 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing method, maintenance method of substrate processing apparatus, and storage medium |
JP7036642B2 (ja) * | 2018-03-23 | 2022-03-15 | 株式会社Screenホールディングス | 基板処理装置及びその排気方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0359016U (ja) * | 1989-10-06 | 1991-06-10 | ||
JPH04506626A (ja) * | 1990-04-11 | 1992-11-19 | ヴィセール オイ | 湿式ブラスター/湿式洗浄機 |
JP2003347198A (ja) * | 2002-05-28 | 2003-12-05 | Tokyo Electron Ltd | 基板ベーク装置、基板ベーク方法及び塗布膜形成装置 |
JP2006292350A (ja) * | 2005-03-18 | 2006-10-26 | Dowa Mining Co Ltd | 廃棄物処理方法及び廃棄物処理システム |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT991990B (it) * | 1973-07-20 | 1975-08-30 | Exxon Co | Reattore catalitico a flusso radiale per la depurazione dei gas di scarico in autoveicoli |
JPS587854U (ja) * | 1981-07-04 | 1983-01-19 | 新日本製鐵株式会社 | 高炉用除塵器 |
DE3542555A1 (de) * | 1985-12-02 | 1987-06-04 | Bosch Siemens Hausgeraete | Abscheider fuer in einem gasstrom mitgerissene feststoffpartikel, insb. reif- und/oder eiskristalle |
KR0147044B1 (ko) * | 1990-01-23 | 1998-11-02 | 카자마 젠쥬 | 배기 시스템을 가지는 열처리장치 |
JPH06257463A (ja) * | 1993-03-05 | 1994-09-13 | Hitachi Ltd | 加圧流動層ボイラ複合発電プラント用脱塵システム |
JPH07214296A (ja) * | 1994-02-10 | 1995-08-15 | Tamura Seisakusho Co Ltd | 気相式はんだ付け装置における蒸気回収用分離装置 |
US5548955A (en) * | 1994-10-19 | 1996-08-27 | Briggs & Stratton Corporation | Catalytic converter having a venturi formed from two stamped components |
TW430866B (en) * | 1998-11-26 | 2001-04-21 | Tokyo Electron Ltd | Thermal treatment apparatus |
-
2005
- 2005-10-04 JP JP2005291046A patent/JP4502921B2/ja active Active
-
2006
- 2006-09-28 CN CNB2006101599684A patent/CN100511586C/zh active Active
- 2006-09-29 US US11/529,504 patent/US20070074745A1/en not_active Abandoned
- 2006-10-02 TW TW095136534A patent/TW200741807A/zh unknown
- 2006-10-02 KR KR1020060096982A patent/KR101084457B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0359016U (ja) * | 1989-10-06 | 1991-06-10 | ||
JPH04506626A (ja) * | 1990-04-11 | 1992-11-19 | ヴィセール オイ | 湿式ブラスター/湿式洗浄機 |
JP2003347198A (ja) * | 2002-05-28 | 2003-12-05 | Tokyo Electron Ltd | 基板ベーク装置、基板ベーク方法及び塗布膜形成装置 |
JP2006292350A (ja) * | 2005-03-18 | 2006-10-26 | Dowa Mining Co Ltd | 廃棄物処理方法及び廃棄物処理システム |
Also Published As
Publication number | Publication date |
---|---|
US20070074745A1 (en) | 2007-04-05 |
KR101084457B1 (ko) | 2011-11-21 |
KR20070038007A (ko) | 2007-04-09 |
CN1945795A (zh) | 2007-04-11 |
TW200741807A (en) | 2007-11-01 |
JP2007103638A (ja) | 2007-04-19 |
CN100511586C (zh) | 2009-07-08 |
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