JP4497968B2 - 照明装置、露光装置及びデバイス製造方法 - Google Patents

照明装置、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4497968B2
JP4497968B2 JP2004078065A JP2004078065A JP4497968B2 JP 4497968 B2 JP4497968 B2 JP 4497968B2 JP 2004078065 A JP2004078065 A JP 2004078065A JP 2004078065 A JP2004078065 A JP 2004078065A JP 4497968 B2 JP4497968 B2 JP 4497968B2
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JP
Japan
Prior art keywords
phase
light
light source
illumination
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004078065A
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English (en)
Japanese (ja)
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JP2005268489A (ja
JP2005268489A5 (enExample
Inventor
俊彦 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004078065A priority Critical patent/JP4497968B2/ja
Priority to TW094108085A priority patent/TWI307453B/zh
Priority to EP05251640A priority patent/EP1577709A3/en
Priority to US11/082,508 priority patent/US7130025B2/en
Priority to KR1020050022634A priority patent/KR100674045B1/ko
Publication of JP2005268489A publication Critical patent/JP2005268489A/ja
Priority to US11/457,957 priority patent/US7239375B2/en
Publication of JP2005268489A5 publication Critical patent/JP2005268489A5/ja
Application granted granted Critical
Publication of JP4497968B2 publication Critical patent/JP4497968B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02B—HYDRAULIC ENGINEERING
    • E02B13/00—Irrigation ditches, i.e. gravity flow, open channel water distribution systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2004078065A 2004-03-18 2004-03-18 照明装置、露光装置及びデバイス製造方法 Expired - Fee Related JP4497968B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2004078065A JP4497968B2 (ja) 2004-03-18 2004-03-18 照明装置、露光装置及びデバイス製造方法
TW094108085A TWI307453B (en) 2004-03-18 2005-03-16 Illumination apparatus, exposure apparatus and device manufacturing method
US11/082,508 US7130025B2 (en) 2004-03-18 2005-03-17 Illumination apparatus, exposure apparatus and device manufacturing method
EP05251640A EP1577709A3 (en) 2004-03-18 2005-03-17 Illumination apparatus exposure apparatus and device manufacturing method
KR1020050022634A KR100674045B1 (ko) 2004-03-18 2005-03-18 조명장치, 노광장치 및 디바이스 제조방법
US11/457,957 US7239375B2 (en) 2004-03-18 2006-07-17 Illumination apparatus, exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004078065A JP4497968B2 (ja) 2004-03-18 2004-03-18 照明装置、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005268489A JP2005268489A (ja) 2005-09-29
JP2005268489A5 JP2005268489A5 (enExample) 2007-05-17
JP4497968B2 true JP4497968B2 (ja) 2010-07-07

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004078065A Expired - Fee Related JP4497968B2 (ja) 2004-03-18 2004-03-18 照明装置、露光装置及びデバイス製造方法

Country Status (5)

Country Link
US (2) US7130025B2 (enExample)
EP (1) EP1577709A3 (enExample)
JP (1) JP4497968B2 (enExample)
KR (1) KR100674045B1 (enExample)
TW (1) TWI307453B (enExample)

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TWI628698B (zh) 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
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US7872731B2 (en) * 2007-04-20 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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JP5339721B2 (ja) * 2007-12-28 2013-11-13 キヤノン株式会社 計算機ホログラム及び露光装置
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Also Published As

Publication number Publication date
JP2005268489A (ja) 2005-09-29
US7239375B2 (en) 2007-07-03
US7130025B2 (en) 2006-10-31
EP1577709A3 (en) 2007-01-17
US20050206871A1 (en) 2005-09-22
KR100674045B1 (ko) 2007-01-25
EP1577709A2 (en) 2005-09-21
TWI307453B (en) 2009-03-11
KR20060044393A (ko) 2006-05-16
US20060250600A1 (en) 2006-11-09
TW200537256A (en) 2005-11-16

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