JP4485853B2 - 基板の搬送装置及び搬送方法 - Google Patents
基板の搬送装置及び搬送方法 Download PDFInfo
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- JP4485853B2 JP4485853B2 JP2004165846A JP2004165846A JP4485853B2 JP 4485853 B2 JP4485853 B2 JP 4485853B2 JP 2004165846 A JP2004165846 A JP 2004165846A JP 2004165846 A JP2004165846 A JP 2004165846A JP 4485853 B2 JP4485853 B2 JP 4485853B2
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- 239000000758 substrate Substances 0.000 title claims description 172
- 238000000034 method Methods 0.000 title claims description 22
- 230000032258 transport Effects 0.000 claims description 42
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 description 15
- 230000005540 biological transmission Effects 0.000 description 9
- 238000005530 etching Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G43/00—Control devices, e.g. for safety, warning or fault-correcting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/22—Devices influencing the relative position or the attitude of articles during transit by conveyors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/068—Stacking or destacking devices; Means for preventing damage to stacked sheets, e.g. spaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67271—Sorting devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Attitude Control For Articles On Conveyors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
- Intermediate Stations On Conveyors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
水平な状態で送られてきた基板を搬送方向と交差する幅方向に対して所定の傾斜角度に傾斜させて上記処理部に受け渡す搬入受け渡し部と、
この搬入受け渡し部で所定の角度に傾斜された上記基板を受けてその傾斜角度で上記処理部内を搬送する傾斜搬送部と、
所定の傾斜角度で上記処理部内を搬送されて処理された基板を上記傾斜搬送部から受けて水平な状態に戻す搬出受け渡し部とを具備し、
上記搬入受け渡し部と搬出受け渡し部との少なくとも一方は、基板の搬送方向に沿って順次並設されているとともに、それぞれ別々に基板の傾斜角度の設定ができ、かつ長さ寸法が上記基板の搬送方向に沿う長さ寸法よりも短く設定された複数のコンベアによって構成された角度変換手段を備え、
上記搬入受け渡し部の角度変換手段は、基板の搬送方向に沿って順次並設された第1の搬入コンベアと第2の搬入コンベアとによって構成されていて、第1、第2の搬入コンベアは水平状態で基板を受けて所定の角度に傾斜して上記傾斜搬送部に搬送するとともに、基板の長さ寸法のほぼ半分が第1の搬入コンベアから外れた時点でこの第1の搬入コンベアはつぎの基板の受け渡しが可能な水平状態に倒伏させられることを特徴とする基板の搬送装置にある。
水平な状態で送られてきた基板を上記処理部に搬入する搬入工程と、
上記処理部に搬入された基板を搬送方向と交差する幅方向に所定の傾斜角度に傾斜させて搬送する搬送工程と、
上記処理部で処理された基板を受ける搬出工程を具備し、
上記搬入工程は、基板の傾斜角度を変換する角度変換工程を備えていて、
上記角度変換工程は、
基板の搬送方向に沿って順次並設された第1の搬入コンベアと第2の搬入コンベアとを水平な状態にして基板を受ける第1の工程と、
水平状態で受けた基板を上記第1の搬入コンベアと第2の搬入コンベアとによって傾斜させて搬送する第2の工程と、
基板の長さ寸法のほぼ半分が第1の搬入コンベアから外れた時点でこの第1の搬入コンベアをつぎの基板の受け渡しが可能な水平状態に倒伏させる第3の工程と
を具備したことを特徴とする基板の搬送方法にある。
なお、第1の搬入コンベア31と第2の搬入コンベア32及び第1の搬出コンベア33と第2の搬出コンベア34は、それぞれ基板Wの傾斜角度を変換する角度変換手段を構成している。
Claims (2)
- 処理部で処理される基板を搬送する搬送装置であって、
水平な状態で送られてきた基板を搬送方向と交差する幅方向に対して所定の傾斜角度に傾斜させて上記処理部に受け渡す搬入受け渡し部と、
この搬入受け渡し部で所定の角度に傾斜された上記基板を受けてその傾斜角度で上記処理部内を搬送する傾斜搬送部と、
所定の傾斜角度で上記処理部内を搬送されて処理された基板を上記傾斜搬送部から受けて水平な状態に戻す搬出受け渡し部とを具備し、
上記搬入受け渡し部と搬出受け渡し部との少なくとも一方は、基板の搬送方向に沿って順次並設されているとともに、それぞれ別々に基板の傾斜角度の設定ができ、かつ長さ寸法が上記基板の搬送方向に沿う長さ寸法よりも短く設定された複数のコンベアによって構成された角度変換手段を備え、
上記搬入受け渡し部の角度変換手段は、基板の搬送方向に沿って順次並設された第1の搬入コンベアと第2の搬入コンベアとによって構成されていて、第1、第2の搬入コンベアは水平状態で基板を受けて所定の角度に傾斜して上記傾斜搬送部に搬送するとともに、基板の長さ寸法のほぼ半分が第1の搬入コンベアから外れた時点でこの第1の搬入コンベアはつぎの基板の受け渡しが可能な水平状態に倒伏させられることを特徴とする基板の搬送装置。 - 処理部で処理される基板を搬送する搬送方法であって、
水平な状態で送られてきた基板を上記処理部に搬入する搬入工程と、
上記処理部に搬入された基板を搬送方向と交差する幅方向に所定の傾斜角度に傾斜させて搬送する搬送工程と、
上記処理部で処理された基板を受ける搬出工程を具備し、
上記搬入工程は、基板の傾斜角度を変換する角度変換工程を備えていて、
上記角度変換工程は、
基板の搬送方向に沿って順次並設された第1の搬入コンベアと第2の搬入コンベアとを水平な状態にして基板を受ける第1の工程と、
水平状態で受けた基板を上記第1の搬入コンベアと第2の搬入コンベアとによって傾斜させて搬送する第2の工程と、
基板の長さ寸法のほぼ半分が第1の搬入コンベアから外れた時点でこの第1の搬入コンベアをつぎの基板の受け渡しが可能な水平状態に倒伏させる第3の工程と
を具備したことを特徴とする基板の搬送方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004165846A JP4485853B2 (ja) | 2004-06-03 | 2004-06-03 | 基板の搬送装置及び搬送方法 |
TW094116722A TWI359472B (en) | 2004-06-03 | 2005-05-23 | Apparatus for carrying substrates and method of ca |
KR1020050047229A KR101160534B1 (ko) | 2004-06-03 | 2005-06-02 | 기판의 반송 장치 |
CNB2005100748988A CN100470754C (zh) | 2004-06-03 | 2005-06-03 | 基板的输送装置以及输送方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004165846A JP4485853B2 (ja) | 2004-06-03 | 2004-06-03 | 基板の搬送装置及び搬送方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005343639A JP2005343639A (ja) | 2005-12-15 |
JP4485853B2 true JP4485853B2 (ja) | 2010-06-23 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2004165846A Expired - Lifetime JP4485853B2 (ja) | 2004-06-03 | 2004-06-03 | 基板の搬送装置及び搬送方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4485853B2 (ja) |
KR (1) | KR101160534B1 (ja) |
CN (1) | CN100470754C (ja) |
TW (1) | TWI359472B (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4593536B2 (ja) * | 2006-08-23 | 2010-12-08 | 大日本スクリーン製造株式会社 | 姿勢変換装置および基板搬送装置 |
US8502952B2 (en) | 2007-04-14 | 2013-08-06 | Industrial Technology Research Institute | Color cholesteric liquid crystal display devices and fabrication methods thereof |
JP4834604B2 (ja) * | 2007-05-10 | 2011-12-14 | 芝浦メカトロニクス株式会社 | 基板の角度変換装置及び基板の処理装置 |
CN103065998A (zh) * | 2011-10-21 | 2013-04-24 | 东京毅力科创株式会社 | 处理台装置及使用该处理台装置的涂布处理装置 |
KR101303900B1 (ko) * | 2012-04-17 | 2013-09-05 | 세메스 주식회사 | 기판 처리 장치 및 그 방법 |
TWI557056B (zh) * | 2013-04-24 | 2016-11-11 | 財團法人工業技術研究院 | 具撓性基材保護功能的卷對卷輸送設備 |
CN104347352B (zh) * | 2013-07-31 | 2018-05-29 | 细美事有限公司 | 一种基板处理装置及基板处理方法 |
CN108033270A (zh) * | 2017-11-23 | 2018-05-15 | 东旭科技集团有限公司 | 玻璃基板传送装置及其操作方法与玻璃基板传送系统 |
JP2019102540A (ja) * | 2017-11-29 | 2019-06-24 | 三星ダイヤモンド工業株式会社 | 基板搬出装置 |
KR101867016B1 (ko) | 2018-03-22 | 2018-06-12 | 김민석 | 기능성 밀걸레 |
JP7170748B2 (ja) * | 2018-12-19 | 2022-11-14 | 東京エレクトロン株式会社 | 基板処理装置、および基板処理方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854427Y2 (ja) * | 1979-10-31 | 1983-12-12 | シ−ケ−ディ株式会社 | 多重列屈曲コンベア |
JPH11307493A (ja) * | 1998-04-17 | 1999-11-05 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2005247491A (ja) * | 2004-03-03 | 2005-09-15 | Dainippon Printing Co Ltd | 基板搬送システム |
-
2004
- 2004-06-03 JP JP2004165846A patent/JP4485853B2/ja not_active Expired - Lifetime
-
2005
- 2005-05-23 TW TW094116722A patent/TWI359472B/zh not_active IP Right Cessation
- 2005-06-02 KR KR1020050047229A patent/KR101160534B1/ko active IP Right Grant
- 2005-06-03 CN CNB2005100748988A patent/CN100470754C/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854427Y2 (ja) * | 1979-10-31 | 1983-12-12 | シ−ケ−ディ株式会社 | 多重列屈曲コンベア |
JPH11307493A (ja) * | 1998-04-17 | 1999-11-05 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2005247491A (ja) * | 2004-03-03 | 2005-09-15 | Dainippon Printing Co Ltd | 基板搬送システム |
Also Published As
Publication number | Publication date |
---|---|
TW200603328A (en) | 2006-01-16 |
KR20060049511A (ko) | 2006-05-19 |
KR101160534B1 (ko) | 2012-06-28 |
TWI359472B (en) | 2012-03-01 |
JP2005343639A (ja) | 2005-12-15 |
CN100470754C (zh) | 2009-03-18 |
CN1705097A (zh) | 2005-12-07 |
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