JP4464166B2 - 測定装置を搭載した露光装置 - Google Patents

測定装置を搭載した露光装置 Download PDF

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Publication number
JP4464166B2
JP4464166B2 JP2004055358A JP2004055358A JP4464166B2 JP 4464166 B2 JP4464166 B2 JP 4464166B2 JP 2004055358 A JP2004055358 A JP 2004055358A JP 2004055358 A JP2004055358 A JP 2004055358A JP 4464166 B2 JP4464166 B2 JP 4464166B2
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JP
Japan
Prior art keywords
optical system
light
mask
slit
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004055358A
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English (en)
Japanese (ja)
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JP2005244126A (ja
JP2005244126A5 (enExample
Inventor
章博 中内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2004055358A priority Critical patent/JP4464166B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to TW094105911A priority patent/TWI261109B/zh
Priority to US11/067,112 priority patent/US7619748B2/en
Priority to EP08150790A priority patent/EP1914530A1/en
Priority to EP05004212A priority patent/EP1568976B1/en
Priority to DE602005008654T priority patent/DE602005008654D1/de
Priority to KR1020050016560A priority patent/KR100752813B1/ko
Publication of JP2005244126A publication Critical patent/JP2005244126A/ja
Publication of JP2005244126A5 publication Critical patent/JP2005244126A5/ja
Application granted granted Critical
Publication of JP4464166B2 publication Critical patent/JP4464166B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B3/00—Hand knives with fixed blades
    • B26B3/02—Table-knives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B29/00—Guards or sheaths or guides for hand cutting tools; Arrangements for guiding hand cutting tools
    • B26B29/02—Guards or sheaths for knives
    • B26B29/025—Knife sheaths or scabbards
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B9/00—Blades for hand knives
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2004055358A 2004-02-27 2004-02-27 測定装置を搭載した露光装置 Expired - Fee Related JP4464166B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004055358A JP4464166B2 (ja) 2004-02-27 2004-02-27 測定装置を搭載した露光装置
US11/067,112 US7619748B2 (en) 2004-02-27 2005-02-25 Exposure apparatus mounted with measuring apparatus
EP08150790A EP1914530A1 (en) 2004-02-27 2005-02-25 Exposure apparatus mounted with measuring apparatus
EP05004212A EP1568976B1 (en) 2004-02-27 2005-02-25 Exposure apparatus mounted with measuring apparatus
TW094105911A TWI261109B (en) 2004-02-27 2005-02-25 Exposure apparatus mounted with measuring apparatus
DE602005008654T DE602005008654D1 (de) 2004-02-27 2005-02-25 Belichtungsapparat ausgestattet mit Messvorrichtung
KR1020050016560A KR100752813B1 (ko) 2004-02-27 2005-02-28 측정장치를 탑재한 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004055358A JP4464166B2 (ja) 2004-02-27 2004-02-27 測定装置を搭載した露光装置

Publications (3)

Publication Number Publication Date
JP2005244126A JP2005244126A (ja) 2005-09-08
JP2005244126A5 JP2005244126A5 (enExample) 2007-11-08
JP4464166B2 true JP4464166B2 (ja) 2010-05-19

Family

ID=34747588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004055358A Expired - Fee Related JP4464166B2 (ja) 2004-02-27 2004-02-27 測定装置を搭載した露光装置

Country Status (6)

Country Link
US (1) US7619748B2 (enExample)
EP (2) EP1914530A1 (enExample)
JP (1) JP4464166B2 (enExample)
KR (1) KR100752813B1 (enExample)
DE (1) DE602005008654D1 (enExample)
TW (1) TWI261109B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4464166B2 (ja) 2004-02-27 2010-05-19 キヤノン株式会社 測定装置を搭載した露光装置
JP4666982B2 (ja) * 2004-09-02 2011-04-06 キヤノン株式会社 光学特性測定装置、露光装置及びデバイス製造方法
US7333175B2 (en) * 2004-09-13 2008-02-19 Asml Netherlands, B.V. Method and system for aligning a first and second marker
JP2006303370A (ja) * 2005-04-25 2006-11-02 Canon Inc 露光装置及びそれを用いたデバイス製造方法
JP2006324311A (ja) * 2005-05-17 2006-11-30 Canon Inc 波面収差測定装置及びそれを有する露光装置
JP2007035709A (ja) * 2005-07-22 2007-02-08 Canon Inc 露光装置及びそれを用いたデバイス製造方法
JP2007180152A (ja) * 2005-12-27 2007-07-12 Canon Inc 測定方法及び装置、露光装置、並びに、デバイス製造方法
JP4724558B2 (ja) * 2005-12-27 2011-07-13 キヤノン株式会社 測定方法及び装置、露光装置
EP2963498B8 (en) * 2006-01-19 2017-07-26 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2007281003A (ja) 2006-04-03 2007-10-25 Canon Inc 測定方法及び装置、並びに、露光装置
JP2008192855A (ja) * 2007-02-05 2008-08-21 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP4912205B2 (ja) * 2007-04-18 2012-04-11 キヤノン株式会社 露光装置及びデバイス製造方法
JP5063229B2 (ja) 2007-07-12 2012-10-31 キヤノン株式会社 露光装置及びデバイス製造方法
DE102008029970A1 (de) 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
JP5503193B2 (ja) 2009-06-08 2014-05-28 キヤノン株式会社 波面収差の測定装置、露光装置及びデバイス製造方法
DE102011005826A1 (de) * 2011-03-21 2012-03-29 Carl Zeiss Smt Gmbh Optische Vorrichtung
JP6293024B2 (ja) * 2014-09-10 2018-03-14 株式会社ニューフレアテクノロジー 試料高さ検出装置およびパターン検査システム
CN106292202B (zh) * 2016-10-09 2018-06-15 中国科学院长春光学精密机械与物理研究所 一种可标定系统误差的系统波像差检测方法
CN117804329B (zh) * 2024-03-01 2024-05-31 鹏城实验室 相位干涉显微成像系统

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US4624569A (en) * 1983-07-18 1986-11-25 Lockheed Missiles & Space Company, Inc. Real-time diffraction interferometer
JP2864060B2 (ja) * 1991-09-04 1999-03-03 キヤノン株式会社 縮小投影型露光装置及び方法
US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP2000097666A (ja) 1998-09-22 2000-04-07 Nikon Corp 面形状計測用干渉計、波面収差測定機、前記干渉計及び前記波面収差測定機を用いた投影光学系の製造方法、及び前記干渉計の校正方法
US6307635B1 (en) * 1998-10-21 2001-10-23 The Regents Of The University Of California Phase-shifting point diffraction interferometer mask designs
JP2000146705A (ja) 1998-11-04 2000-05-26 Nikon Corp グレーティングシアリング干渉計を用いた位相分布の計測方法
JP3315658B2 (ja) * 1998-12-28 2002-08-19 キヤノン株式会社 投影装置および露光装置
JP3796368B2 (ja) 1999-03-24 2006-07-12 キヤノン株式会社 投影露光装置
US6266147B1 (en) * 1999-10-14 2001-07-24 The Regents Of The University Of California Phase-shifting point diffraction interferometer phase grating designs
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JP3728187B2 (ja) * 2000-07-10 2005-12-21 キヤノン株式会社 結像光学系性能測定方法及び装置
US6573997B1 (en) * 2000-07-17 2003-06-03 The Regents Of California Hybrid shearing and phase-shifting point diffraction interferometer
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP3862497B2 (ja) * 2000-11-10 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
CN1491427A (zh) 2001-02-06 2004-04-21 ������������ʽ���� 曝光装置、曝光法和器件制造法
EP1231514A1 (en) * 2001-02-13 2002-08-14 Asm Lithography B.V. Measurement of wavefront aberrations in a lithographic projection apparatus
EP1233256B1 (de) 2001-02-16 2002-10-16 Acterna Eningen GmbH Vorrichtung und Verfahren zum Messen der chromatischen Dispersion einer optischen Übertragungsstrecke
JP2002250677A (ja) 2001-02-23 2002-09-06 Nikon Corp 波面収差測定方法、波面収差測定装置、露光装置、デバイス製造方法、及びデバイス
US6643025B2 (en) * 2001-03-29 2003-11-04 Georgia Tech Research Corporation Microinterferometer for distance measurements
AU2003222799A1 (en) * 2002-04-15 2003-10-27 Carl Zeiss Smt Ag Interferometric measuring device and projection illumination installation comprising one such measuring device
EP1387220A3 (en) * 2002-07-29 2007-01-03 Canon Kabushiki Kaisha Adjustment method and apparatus of optical system, and exposure apparatus
JP2004184309A (ja) * 2002-12-05 2004-07-02 Pulstec Industrial Co Ltd 干渉計
WO2005038885A1 (ja) * 2003-10-16 2005-04-28 Nikon Corporation 光学特性計測装置及び光学特性計測方法、露光装置及び露光方法、並びにデバイス製造方法
JP4408040B2 (ja) * 2003-11-28 2010-02-03 キヤノン株式会社 干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP4464166B2 (ja) 2004-02-27 2010-05-19 キヤノン株式会社 測定装置を搭載した露光装置

Also Published As

Publication number Publication date
US7619748B2 (en) 2009-11-17
TW200537081A (en) 2005-11-16
DE602005008654D1 (de) 2008-09-18
KR20060043246A (ko) 2006-05-15
JP2005244126A (ja) 2005-09-08
EP1568976A1 (en) 2005-08-31
KR100752813B1 (ko) 2007-08-29
EP1914530A1 (en) 2008-04-23
TWI261109B (en) 2006-09-01
US20050190378A1 (en) 2005-09-01
EP1568976B1 (en) 2008-08-06

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