JP4416901B2 - レベルシフタ - Google Patents
レベルシフタ Download PDFInfo
- Publication number
- JP4416901B2 JP4416901B2 JP2000071256A JP2000071256A JP4416901B2 JP 4416901 B2 JP4416901 B2 JP 4416901B2 JP 2000071256 A JP2000071256 A JP 2000071256A JP 2000071256 A JP2000071256 A JP 2000071256A JP 4416901 B2 JP4416901 B2 JP 4416901B2
- Authority
- JP
- Japan
- Prior art keywords
- mos transistor
- drain
- electrically connected
- source
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 claims description 17
- 238000005401 electroluminescence Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 59
- 238000006243 chemical reaction Methods 0.000 description 51
- 239000012535 impurity Substances 0.000 description 45
- 238000000034 method Methods 0.000 description 36
- 239000004065 semiconductor Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 26
- 238000005530 etching Methods 0.000 description 21
- 102100036285 25-hydroxyvitamin D-1 alpha hydroxylase, mitochondrial Human genes 0.000 description 19
- 101000875403 Homo sapiens 25-hydroxyvitamin D-1 alpha hydroxylase, mitochondrial Proteins 0.000 description 19
- 239000011159 matrix material Substances 0.000 description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 14
- 230000008569 process Effects 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 238000004088 simulation Methods 0.000 description 10
- 230000007704 transition Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 125000006850 spacer group Chemical group 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
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- 239000000945 filler Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
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- 238000005499 laser crystallization Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- -1 and for example Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/353—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
- H03K3/356—Bistable circuits
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0008—Arrangements for reducing power consumption
- H03K19/0013—Arrangements for reducing power consumption in field effect transistor circuits
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0175—Coupling arrangements; Interface arrangements
- H03K19/0185—Coupling arrangements; Interface arrangements using field effect transistors only
- H03K19/018507—Interface arrangements
- H03K19/018521—Interface arrangements of complementary type, e.g. CMOS
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2310/00—Command of the display device
- G09G2310/02—Addressing, scanning or driving the display screen or processing steps related thereto
- G09G2310/0264—Details of driving circuits
- G09G2310/0289—Details of voltage level shifters arranged for use in a driving circuit
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
- G09G3/3611—Control of matrices with row and column drivers
- G09G3/3685—Details of drivers for data electrodes
- G09G3/3688—Details of drivers for data electrodes suitable for active matrices only
Landscapes
- Computer Hardware Design (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Logic Circuits (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Transforming Electric Information Into Light Information (AREA)
- Control Of El Displays (AREA)
- Liquid Crystal (AREA)
- Manipulation Of Pulses (AREA)
- Liquid Crystal Display Device Control (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000071256A JP4416901B2 (ja) | 2000-03-14 | 2000-03-14 | レベルシフタ |
| US09/797,697 US6384808B2 (en) | 2000-03-14 | 2001-03-05 | Level shifter |
| TW090105608A TW478186B (en) | 2000-03-14 | 2001-03-09 | Level shifter |
| KR1020010012402A KR100783030B1 (ko) | 2000-03-14 | 2001-03-10 | 레벨 시프터 및 액티브 매트릭스형 표시장치 |
| CNB2005100080666A CN100344062C (zh) | 2000-03-14 | 2001-03-14 | 电平移动器 |
| EP01106247A EP1134893B1 (en) | 2000-03-14 | 2001-03-14 | Level shifter |
| CNB011116560A CN1197043C (zh) | 2000-03-14 | 2001-03-14 | 电平移动器 |
| US10/092,447 US6567067B2 (en) | 2000-03-14 | 2002-03-08 | Level shifter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000071256A JP4416901B2 (ja) | 2000-03-14 | 2000-03-14 | レベルシフタ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001257581A JP2001257581A (ja) | 2001-09-21 |
| JP2001257581A5 JP2001257581A5 (enExample) | 2007-04-26 |
| JP4416901B2 true JP4416901B2 (ja) | 2010-02-17 |
Family
ID=18589870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000071256A Expired - Fee Related JP4416901B2 (ja) | 2000-03-14 | 2000-03-14 | レベルシフタ |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6384808B2 (enExample) |
| EP (1) | EP1134893B1 (enExample) |
| JP (1) | JP4416901B2 (enExample) |
| KR (1) | KR100783030B1 (enExample) |
| CN (2) | CN100344062C (enExample) |
| TW (1) | TW478186B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9606379B2 (en) | 2014-09-01 | 2017-03-28 | Samsung Electronics Co., Ltd. | Light modulating apparatus and method of driving the same |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7235810B1 (en) | 1998-12-03 | 2007-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of fabricating the same |
| US6646692B2 (en) * | 2000-01-26 | 2003-11-11 | Semiconductor Energy Laboratory Co., Ltd. | Liquid-crystal display device and method of fabricating the same |
| US6825488B2 (en) * | 2000-01-26 | 2004-11-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| DE20006642U1 (de) | 2000-04-11 | 2000-08-17 | Agilent Technologies, Inc. (n.d.Ges.d.Staates Delaware), Palo Alto, Calif. | Optische Vorrichtung |
| US7525165B2 (en) | 2000-04-17 | 2009-04-28 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and manufacturing method thereof |
| US6580475B2 (en) | 2000-04-27 | 2003-06-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of fabricating the same |
| US7804552B2 (en) * | 2000-05-12 | 2010-09-28 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device with light shielding portion comprising laminated colored layers, electrical equipment having the same, portable telephone having the same |
| JP2001356741A (ja) * | 2000-06-14 | 2001-12-26 | Sanyo Electric Co Ltd | レベルシフタ及びそれを用いたアクティブマトリクス型表示装置 |
| US6731273B2 (en) * | 2000-06-27 | 2004-05-04 | Semiconductor Energy Laboratory Co., Ltd. | Level shifter |
| US6933928B1 (en) * | 2000-07-18 | 2005-08-23 | Scott E. Lilienthal | Electronic book player with audio synchronization |
| US6562671B2 (en) | 2000-09-22 | 2003-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor display device and manufacturing method thereof |
| US6825496B2 (en) | 2001-01-17 | 2004-11-30 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| TW591268B (en) * | 2001-03-27 | 2004-06-11 | Sanyo Electric Co | Active matrix type display device |
| US6828584B2 (en) * | 2001-05-18 | 2004-12-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| JP2003084733A (ja) * | 2001-07-04 | 2003-03-19 | Sharp Corp | 表示装置および携帯機器 |
| US6737302B2 (en) * | 2001-10-31 | 2004-05-18 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for field-effect transistor |
| JP4216092B2 (ja) * | 2002-03-08 | 2009-01-28 | 株式会社半導体エネルギー研究所 | 液晶表示装置 |
| KR100461467B1 (ko) * | 2002-03-13 | 2004-12-13 | 엘지.필립스 엘시디 주식회사 | 능동행렬 유기전기발광소자 |
| JP2003347926A (ja) * | 2002-05-30 | 2003-12-05 | Sony Corp | レベルシフト回路、表示装置および携帯端末 |
| JP4339103B2 (ja) | 2002-12-25 | 2009-10-07 | 株式会社半導体エネルギー研究所 | 半導体装置及び表示装置 |
| JP2005004835A (ja) * | 2003-06-10 | 2005-01-06 | Toshiba Corp | 半導体記憶装置 |
| US7215043B2 (en) * | 2003-12-30 | 2007-05-08 | Ememory Technology Inc. | Power supply voltage switch circuit |
| TWI297476B (en) * | 2004-03-10 | 2008-06-01 | Au Optronics Corp | Voltage level shifter and sequential pulse generator |
| JP2005333595A (ja) * | 2004-05-21 | 2005-12-02 | Matsushita Electric Ind Co Ltd | 電圧レベル変換回路 |
| US7034572B2 (en) * | 2004-06-14 | 2006-04-25 | Micron Technology, Inc. | Voltage level shifting circuit and method |
| JP2006135560A (ja) * | 2004-11-05 | 2006-05-25 | Matsushita Electric Ind Co Ltd | レベルシフト回路およびこれを含む半導体集積回路装置 |
| US7332936B2 (en) * | 2004-12-03 | 2008-02-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor circuit, display device, electronic apparatus |
| US7323924B2 (en) * | 2005-04-19 | 2008-01-29 | Semiconductor Energy Laboratory Co., Ltd. | Level shifter circuit |
| US9153341B2 (en) | 2005-10-18 | 2015-10-06 | Semiconductor Energy Laboratory Co., Ltd. | Shift register, semiconductor device, display device, and electronic device |
| KR101137855B1 (ko) * | 2005-11-14 | 2012-04-20 | 엘지디스플레이 주식회사 | 표시장치의 구동회로 및 이의 구동방법 |
| KR100784890B1 (ko) * | 2005-12-26 | 2007-12-11 | 주식회사 하이닉스반도체 | 반도체 메모리 장치의 내부 전압 제어 회로 및 방법 |
| JP4800781B2 (ja) * | 2006-01-31 | 2011-10-26 | セイコーインスツル株式会社 | 電圧レベルシフト回路、および半導体集積回路 |
| US7358790B2 (en) * | 2006-02-17 | 2008-04-15 | Himax Technologies Limited | High performance level shift circuit with low input voltage |
| US7443202B2 (en) | 2006-06-02 | 2008-10-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic apparatus having the same |
| KR101230313B1 (ko) * | 2006-07-05 | 2013-02-06 | 재단법인서울대학교산학협력재단 | 레벨 시프터 및 그의 구동 방법 |
| JP5034372B2 (ja) * | 2006-08-24 | 2012-09-26 | ソニー株式会社 | レベルシフト回路、駆動装置、撮像装置 |
| JP2008111861A (ja) * | 2006-10-27 | 2008-05-15 | Toshiba Corp | 液晶表示装置とその駆動回路 |
| KR100849209B1 (ko) * | 2006-12-14 | 2008-07-31 | 삼성전자주식회사 | 스택 구조의 부하 트랜지스터 쌍들을 구비하는 레벨 쉬프터및 이를 구비하는 장치 |
| US7679418B2 (en) * | 2007-04-27 | 2010-03-16 | Mosaid Technologies Incorporated | Voltage level shifter and buffer using same |
| US7560972B1 (en) | 2008-01-29 | 2009-07-14 | Texas Instruments Incorporated | Methods and apparatus to reduce propagation delay of circuits |
| JP4565043B1 (ja) * | 2009-06-01 | 2010-10-20 | シャープ株式会社 | レベルシフタ回路、走査線駆動装置、および表示装置 |
| US8665192B2 (en) * | 2009-07-08 | 2014-03-04 | Hitachi Displays, Ltd. | Liquid crystal display device |
| JP5530344B2 (ja) | 2010-12-08 | 2014-06-25 | ルネサスエレクトロニクス株式会社 | レベルシフト回路及びそれを備えた駆動回路 |
| TW201234778A (en) * | 2011-02-01 | 2012-08-16 | Raydium Semiconductor Corp | Level shifter |
| CN103065680A (zh) * | 2011-10-20 | 2013-04-24 | 上海新储集成电路有限公司 | 一种基于相变存储单元的可编程电平转换器及其实现方法 |
| JP5780650B2 (ja) * | 2011-11-11 | 2015-09-16 | 株式会社Joled | レベルシフタ回路、走査回路、表示装置、及び、電子機器 |
| CN103297034B (zh) * | 2012-02-28 | 2017-12-26 | 恩智浦美国有限公司 | 电压电平移位器 |
| TWI459341B (zh) * | 2012-03-19 | 2014-11-01 | Raydium Semiconductor Corp | 電位平移電路 |
| US9251753B2 (en) * | 2013-05-24 | 2016-02-02 | Texas Instruments Deutschland Gmbh | Cost effective low pin/ball count level-shifter for LCD bias applications supporting charge sharing of gate lines with perfect waveform matching |
| CN104184458A (zh) * | 2014-09-16 | 2014-12-03 | 上海坤锐电子科技有限公司 | 一种具有上电清零功能的电平转换器 |
| US10033361B2 (en) * | 2015-12-28 | 2018-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Level-shift circuit, driver IC, and electronic device |
| CN108667450B (zh) * | 2017-03-29 | 2022-08-09 | 台湾积体电路制造股份有限公司 | 位准移位器与位准移位方法 |
| CN107370485B (zh) * | 2017-06-30 | 2020-11-17 | 湖南国科微电子股份有限公司 | 负压电平转换电路 |
| CN109039327A (zh) * | 2018-10-18 | 2018-12-18 | 上海艾为电子技术股份有限公司 | 一种电平转换电路 |
| US11476853B2 (en) * | 2018-11-14 | 2022-10-18 | Sony Semiconductor Solutions Corporation | Level shift circuit and electronic apparatus |
| KR20210094175A (ko) * | 2020-01-20 | 2021-07-29 | 삼성전자주식회사 | 레벨 시프터를 포함하는 전자 장치 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2770941B2 (ja) * | 1985-12-10 | 1998-07-02 | シチズン時計株式会社 | シユミツトトリガ回路 |
| JPS63164526A (ja) * | 1986-12-25 | 1988-07-07 | Toshiba Corp | レベルコンバ−タ |
| JPH04253417A (ja) * | 1991-01-29 | 1992-09-09 | Nec Corp | レベルシフト回路 |
| JPH04269011A (ja) * | 1991-02-25 | 1992-09-25 | Nec Corp | レベルシフト回路 |
| JPH04277920A (ja) | 1991-03-06 | 1992-10-02 | Nec Corp | レベルシフト回路 |
| US5399915A (en) | 1992-03-23 | 1995-03-21 | Nec Corporation | Drive circuit including two level-shift circuits |
| JP2586785B2 (ja) | 1993-02-01 | 1997-03-05 | 日本電気株式会社 | 信号レベル変換回路 |
| GB9314849D0 (en) * | 1993-07-16 | 1993-09-01 | Philips Electronics Uk Ltd | Electronic devices |
| JPH0879053A (ja) * | 1994-09-06 | 1996-03-22 | Toshiba Corp | レベルシフト回路 |
| KR0145615B1 (ko) | 1995-03-13 | 1998-12-01 | 김광호 | 박막 트랜지스터 액정 표시장치의 구동장치 |
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| TW522354B (en) * | 1998-08-31 | 2003-03-01 | Semiconductor Energy Lab | Display device and method of driving the same |
-
2000
- 2000-03-14 JP JP2000071256A patent/JP4416901B2/ja not_active Expired - Fee Related
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2001
- 2001-03-05 US US09/797,697 patent/US6384808B2/en not_active Expired - Lifetime
- 2001-03-09 TW TW090105608A patent/TW478186B/zh not_active IP Right Cessation
- 2001-03-10 KR KR1020010012402A patent/KR100783030B1/ko not_active Expired - Fee Related
- 2001-03-14 CN CNB2005100080666A patent/CN100344062C/zh not_active Expired - Fee Related
- 2001-03-14 EP EP01106247A patent/EP1134893B1/en not_active Expired - Lifetime
- 2001-03-14 CN CNB011116560A patent/CN1197043C/zh not_active Expired - Fee Related
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9606379B2 (en) | 2014-09-01 | 2017-03-28 | Samsung Electronics Co., Ltd. | Light modulating apparatus and method of driving the same |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1134893A3 (en) | 2006-05-24 |
| US6384808B2 (en) | 2002-05-07 |
| KR20010102842A (ko) | 2001-11-16 |
| EP1134893B1 (en) | 2012-05-09 |
| CN1197043C (zh) | 2005-04-13 |
| CN100344062C (zh) | 2007-10-17 |
| CN1325096A (zh) | 2001-12-05 |
| EP1134893A2 (en) | 2001-09-19 |
| CN1655453A (zh) | 2005-08-17 |
| KR100783030B1 (ko) | 2007-12-07 |
| TW478186B (en) | 2002-03-01 |
| US20020118159A1 (en) | 2002-08-29 |
| US20010054999A1 (en) | 2001-12-27 |
| JP2001257581A (ja) | 2001-09-21 |
| US6567067B2 (en) | 2003-05-20 |
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