JP4410838B1 - フェライト付着体及びその製造方法 - Google Patents
フェライト付着体及びその製造方法 Download PDFInfo
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- 229910000859 α-Fe Inorganic materials 0.000 title claims abstract description 112
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000006243 chemical reaction Methods 0.000 claims abstract description 33
- 230000001590 oxidative effect Effects 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000001133 acceleration Effects 0.000 claims abstract description 21
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 239000012295 chemical reaction liquid Substances 0.000 claims abstract description 13
- 230000003647 oxidation Effects 0.000 claims abstract description 13
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 13
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001448 ferrous ion Inorganic materials 0.000 claims abstract description 5
- 230000005484 gravity Effects 0.000 claims abstract description 5
- 239000007800 oxidant agent Substances 0.000 claims abstract description 4
- 239000013078 crystal Substances 0.000 claims description 14
- 230000001464 adherent effect Effects 0.000 claims description 11
- 238000007747 plating Methods 0.000 abstract description 13
- 239000000243 solution Substances 0.000 description 55
- 239000007864 aqueous solution Substances 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 5
- 230000035699 permeability Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- -1 metal hydroxide ions Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052596 spinel Inorganic materials 0.000 description 2
- 239000011029 spinel Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G49/00—Compounds of iron
- C01G49/0018—Mixed oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Abstract
【解決手段】基体3とその基体3に付着したフェライト膜とを備えるフェライト付着体を製造する製造方法を提供する。この製造方法は、基体3の裏側に100μm以上のスペースを空けた状態で基体3を支持し、少なくとも第1鉄イオンを含む反応液と少なくとも酸化剤を含む酸化液とを反応液ノズル1及び酸化液ノズル2から基体3の表側に供給し、反応液と前記酸化液に対して重力以外に起因する2〜150m/s2の加速度を加える。
【選択図】図1
Description
2 酸化液ノズル
3 基体
4 支持部材
5 台(回転テーブル)
6 フェライト膜
Claims (8)
- 基体と該基体に付着したフェライト膜とを備えるフェライト付着体を製造する製造方法であって、
前記基体は、単一の棒状のものであるか又は複数の棒状のものを連結してなるものであり、
前記基体が前記単一の棒状のものである場合には前記基体は5mm以下の最大幅を有すると共に5mm以下の最大高さを有しており、前記基体が前記複数の棒状のものを連結してなるものである場合には前記棒状のものの夫々が5mm以下の最大幅を有すると共に5mm以下の最大高さを有し且つ前記棒状のもの間の隙間は100μm以上である、製造方法において、
前記基体の裏側に100μm以上のスペースを空けた状態で前記基体を支持し、
少なくとも第1鉄イオンを含む反応液と少なくとも酸化剤を含む酸化液とを前記基体の表側に供給し、
前記反応液と前記酸化液に対して重力以外に起因する2〜150m/s2の加速度を加える
製造方法。 - 請求項1記載の製造方法であって、
前記基体の支持は、台の上に支持部材を配置し、前記台と前記基体との間に前記スペースを確保した状態で前記支持部材によって前記基体を支持することにより、行われる
製造方法。 - 請求項2記載の製造方法であって、
前記加速度は、前記台を回転させることにより生じる遠心力に起因するものである
製造方法。 - 請求項1又は請求項2記載の製造方法であって、
前記加速度は、前記基体に振動を与えることにより生じるものである
製造方法。 - 請求項1乃至請求項4のいずれかに記載の製造方法であって、
前記基体の前記表側に対して前記反応液と前記酸化液を直接供給し且つ前記加速度を加えてフェライト膜を直接形成した後、前記基体の前記裏側に対して前記反応液と前記酸化液を直接供給し且つ前記加速度を加えてフェライト膜を直接形成する
製造方法。 - 三次元形状の基体と該基体に付着したフェライト膜とを備えるフェライト付着体であって、
前記基体は、単一の棒状のものであり、
前記基体は5mm以下の最大幅を有すると共に5mm以下の最大高さを有しており、
前記フェライト膜は、長軸及び短軸を有し且つ前記長軸を前記フェライト膜の膜厚方向に沿うようにして並べてなる複数の柱状結晶からなり、
前記柱状結晶の前記長軸は0.1〜10μmであり、前記短軸は0.01〜1μmであり、
前記フェライト膜の平均膜厚xと膜厚の標準偏差σの比σ/xが1以下であるフェライト付着体。 - 三次元形状の基体と該基体に付着したフェライト膜とを備えるフェライト付着体であって、
前記基体は、複数の棒状のものを連結してなるものであり、
前記棒状のものの夫々が5mm以下の最大幅を有すると共に5mm以下の最大高さを有し且つ前記棒状のもの間の隙間は100μm以上であり、
前記フェライト膜は、長軸及び短軸を有し且つ前記長軸を前記フェライト膜の膜厚方向に沿うようにして並べてなる複数の柱状結晶からなり、
前記柱状結晶の前記長軸は0.1〜10μmであり、前記短軸は0.01〜1μmであり、
前記フェライト膜の平均膜厚xと膜厚の標準偏差σの比σ/xが1以下であるフェライト付着体。 - 請求項6又は請求項7記載のフェライト付着体であって、
前記基体は、少なくとも隣接する二つの面を備えており、
前記フェライト膜は、前記二つの面の夫々の上に直接形成されており、
前記二つの面の上に形成された前記フェライト膜は、互いに磁気的に結合している
フェライト付着体。
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JP2009176209A JP4410838B1 (ja) | 2008-09-25 | 2009-07-29 | フェライト付着体及びその製造方法 |
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JP2008245066 | 2008-09-25 | ||
JP2009176209A JP4410838B1 (ja) | 2008-09-25 | 2009-07-29 | フェライト付着体及びその製造方法 |
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JP4410838B1 true JP4410838B1 (ja) | 2010-02-03 |
JP2010100928A JP2010100928A (ja) | 2010-05-06 |
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US (1) | US20110183130A1 (ja) |
JP (1) | JP4410838B1 (ja) |
KR (1) | KR101596476B1 (ja) |
CN (1) | CN102159749B (ja) |
WO (1) | WO2010035383A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102330077A (zh) * | 2011-09-13 | 2012-01-25 | 南京航空航天大学 | 喷射化学镀加工多层膜的方法及装置 |
CN113070196B (zh) * | 2021-03-01 | 2022-05-03 | 电子科技大学 | 一种改善旋转喷涂制备NiZn铁氧体薄膜性能的方法 |
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US4392013A (en) * | 1979-12-27 | 1983-07-05 | Asahi Kasei Kogyo Kabushiki Kaisha | Fine-patterned thick film conductor structure and manufacturing method thereof |
JPS59111929A (ja) * | 1982-12-15 | 1984-06-28 | Masanori Abe | フエライト膜作製方法 |
JPH11168010A (ja) * | 1997-12-04 | 1999-06-22 | Yamaha Corp | マイクロインダクタ |
JP2002015415A (ja) * | 2000-06-29 | 2002-01-18 | Fuji Photo Film Co Ltd | 磁気ディスク |
JP2005129766A (ja) * | 2003-10-24 | 2005-05-19 | Nec Tokin Corp | プリント回路基板及びその製造方法 |
JP2005126776A (ja) * | 2003-10-24 | 2005-05-19 | Nec Tokin Corp | 柱状結晶を有するフェライト膜、及びその製造方法 |
JP4480016B2 (ja) * | 2005-03-04 | 2010-06-16 | Necトーキン株式会社 | フェライト膜製造装置 |
JP4515336B2 (ja) * | 2005-06-13 | 2010-07-28 | Necトーキン株式会社 | フェライト膜の製造装置 |
WO2007052528A1 (ja) * | 2005-11-01 | 2007-05-10 | Kabushiki Kaisha Toshiba | 平面磁気素子およびそれを用いた電源icパッケージ |
JP2007250924A (ja) * | 2006-03-17 | 2007-09-27 | Sony Corp | インダクタ素子とその製造方法、並びにインダクタ素子を用いた半導体モジュール |
JP2008091974A (ja) * | 2006-09-29 | 2008-04-17 | Nec Tokin Corp | アンテナおよびそれを用いたrfidタグ |
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- 2009-07-29 CN CN200980136558XA patent/CN102159749B/zh not_active Expired - Fee Related
- 2009-07-29 WO PCT/JP2009/003584 patent/WO2010035383A1/ja active Application Filing
- 2009-07-29 US US13/121,108 patent/US20110183130A1/en not_active Abandoned
- 2009-07-29 JP JP2009176209A patent/JP4410838B1/ja active Active
- 2009-07-29 KR KR1020117006568A patent/KR101596476B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
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US20110183130A1 (en) | 2011-07-28 |
KR20110066149A (ko) | 2011-06-16 |
KR101596476B1 (ko) | 2016-02-22 |
CN102159749B (zh) | 2013-01-23 |
CN102159749A (zh) | 2011-08-17 |
WO2010035383A1 (ja) | 2010-04-01 |
JP2010100928A (ja) | 2010-05-06 |
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