JP4298078B2 - 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法 - Google Patents

基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法 Download PDF

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Publication number
JP4298078B2
JP4298078B2 JP23359199A JP23359199A JP4298078B2 JP 4298078 B2 JP4298078 B2 JP 4298078B2 JP 23359199 A JP23359199 A JP 23359199A JP 23359199 A JP23359199 A JP 23359199A JP 4298078 B2 JP4298078 B2 JP 4298078B2
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Japan
Prior art keywords
substrate
convex portion
outer peripheral
wafer
central
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Expired - Fee Related
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JP23359199A
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English (en)
Japanese (ja)
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JP2001060617A (ja
JP2001060617A5 (enExample
Inventor
秀樹 野川
幸夫 高林
いたる 藤田
泉 塚本
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP23359199A priority Critical patent/JP4298078B2/ja
Priority to EP00307078A priority patent/EP1077393A2/en
Priority to US09/640,724 priority patent/US6809802B1/en
Publication of JP2001060617A publication Critical patent/JP2001060617A/ja
Priority to US10/648,479 priority patent/US6762826B2/en
Publication of JP2001060617A5 publication Critical patent/JP2001060617A5/ja
Application granted granted Critical
Publication of JP4298078B2 publication Critical patent/JP4298078B2/ja
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP23359199A 1999-08-19 1999-08-20 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法 Expired - Fee Related JP4298078B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP23359199A JP4298078B2 (ja) 1999-08-20 1999-08-20 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
EP00307078A EP1077393A2 (en) 1999-08-19 2000-08-18 Substrate attracting and holding system for use in exposure apparatus
US09/640,724 US6809802B1 (en) 1999-08-19 2000-08-18 Substrate attracting and holding system for use in exposure apparatus
US10/648,479 US6762826B2 (en) 1999-08-19 2003-08-27 Substrate attracting and holding system for use in exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23359199A JP4298078B2 (ja) 1999-08-20 1999-08-20 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法

Publications (3)

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JP2001060617A JP2001060617A (ja) 2001-03-06
JP2001060617A5 JP2001060617A5 (enExample) 2006-10-05
JP4298078B2 true JP4298078B2 (ja) 2009-07-15

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JP23359199A Expired - Fee Related JP4298078B2 (ja) 1999-08-19 1999-08-20 基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法

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JP (1) JP4298078B2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4040423B2 (ja) 2002-10-16 2008-01-30 キヤノン株式会社 基板保持装置
EP1482370B1 (en) * 2003-05-06 2012-02-01 ASML Netherlands B.V. Substrate holder for lithographic apparatus
EP1475666A1 (en) * 2003-05-06 2004-11-10 ASML Netherlands B.V. Substrate holder for lithographic apparatus
JP2005039155A (ja) * 2003-07-18 2005-02-10 Matsushita Electric Ind Co Ltd 半導体装置の製造方法及びそれに用いる半導体基板の製造方法
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
JP4845564B2 (ja) * 2006-03-31 2011-12-28 株式会社東芝 パターン転写方法
JP4899879B2 (ja) * 2007-01-17 2012-03-21 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP2009212344A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
JP2009212345A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
JP5967993B2 (ja) * 2012-03-19 2016-08-10 芝浦メカトロニクス株式会社 減圧装置
JP5657039B2 (ja) * 2013-01-28 2015-01-21 株式会社日立ハイテクノロジーズ 試料搭載装置
JP6130703B2 (ja) * 2013-04-01 2017-05-17 キヤノン株式会社 ホルダ、ステージ装置、リソグラフィ装置及び物品の製造方法
JP6181428B2 (ja) * 2013-05-24 2017-08-16 株式会社東京精密 ウェーハ研磨装置
JP2014241357A (ja) * 2013-06-12 2014-12-25 レーザーテック株式会社 基板保持装置、及び光学装置、及び基板保持方法
JP6732419B2 (ja) * 2015-09-02 2020-07-29 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6609694B2 (ja) * 2015-09-28 2019-11-20 エーエスエムエル ネザーランズ ビー．ブイ． 基板ホルダ、リソグラフィ装置、及びデバイスを製造する方法
JP6496255B2 (ja) * 2016-01-29 2019-04-03 日本特殊陶業株式会社 基板保持装置
JP7011459B2 (ja) * 2017-12-21 2022-01-26 日本特殊陶業株式会社 真空吸着部材
JP7778482B2 (ja) * 2021-03-02 2025-12-02 キヤノン株式会社 チャック、基板保持装置、基板処理装置、及び物品の製造方法
JP7581146B2 (ja) * 2021-03-02 2024-11-12 キヤノン株式会社 チャック、基板保持装置、基板処理装置、及び物品の製造方法
KR20220124090A (ko) * 2021-03-02 2022-09-13 캐논 가부시끼가이샤 척, 기판 유지장치, 기판 처리장치, 및 물품의 제조방법

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