JP4223226B2 - フレキソ印刷版用光重合性エレメントおよびそのエレメントから前記版を調製する方法 - Google Patents

フレキソ印刷版用光重合性エレメントおよびそのエレメントから前記版を調製する方法 Download PDF

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Publication number
JP4223226B2
JP4223226B2 JP2002119809A JP2002119809A JP4223226B2 JP 4223226 B2 JP4223226 B2 JP 4223226B2 JP 2002119809 A JP2002119809 A JP 2002119809A JP 2002119809 A JP2002119809 A JP 2002119809A JP 4223226 B2 JP4223226 B2 JP 4223226B2
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Japan
Prior art keywords
layer
photopolymerizable
exposure
image
salt
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Japanese (ja)
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JP2002351057A5 (https=
JP2002351057A (ja
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ラング エイドリアン
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EIDP Inc
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EI Du Pont de Nemours and Co
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2002119809A 2001-04-20 2002-04-22 フレキソ印刷版用光重合性エレメントおよびそのエレメントから前記版を調製する方法 Expired - Fee Related JP4223226B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/839,803 2001-04-20
US09/839,803 US20030087178A1 (en) 2001-04-20 2001-04-20 Photopolymerizable element for use as a flexographic printing plate and a process for preparing the plate from the element

Publications (3)

Publication Number Publication Date
JP2002351057A JP2002351057A (ja) 2002-12-04
JP2002351057A5 JP2002351057A5 (https=) 2005-08-25
JP4223226B2 true JP4223226B2 (ja) 2009-02-12

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Family Applications (1)

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JP2002119809A Expired - Fee Related JP4223226B2 (ja) 2001-04-20 2002-04-22 フレキソ印刷版用光重合性エレメントおよびそのエレメントから前記版を調製する方法

Country Status (4)

Country Link
US (2) US20030087178A1 (https=)
EP (1) EP1251400B1 (https=)
JP (1) JP4223226B2 (https=)
DE (1) DE60231071D1 (https=)

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JP5305182B2 (ja) * 2011-02-16 2013-10-02 東洋紡株式会社 印刷版用現像液組成物、現像液および印刷原版の製造方法
US9669405B2 (en) 2012-10-22 2017-06-06 The Regents Of The University Of California Sterilizable photopolymer serum separator
JP2014111715A (ja) * 2012-10-31 2014-06-19 Nitto Denko Corp 紫外線硬化型アクリル系粘着剤層を有する粘着シートの製造方法
US10025183B2 (en) * 2014-01-22 2018-07-17 Macdermid Graphics Solutions, Llc Photosensitive resin composition
CN109476946A (zh) * 2016-04-13 2019-03-15 西甘产业股份有限公司 光学渐逝变色组合物及其制备和使用的方法
CN113168096B (zh) * 2018-12-10 2024-05-24 易客发有限公司 Uv或紫色敏化的平版印刷版的在机加工

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Also Published As

Publication number Publication date
EP1251400A3 (en) 2005-02-23
EP1251400B1 (en) 2009-02-04
US20030087178A1 (en) 2003-05-08
EP1251400A2 (en) 2002-10-23
JP2002351057A (ja) 2002-12-04
US20060160025A1 (en) 2006-07-20
US7754412B2 (en) 2010-07-13
DE60231071D1 (de) 2009-03-19

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