JP2002517163A - レーザーによる染料の熱転写のための供与体エレメントおよび方法 - Google Patents
レーザーによる染料の熱転写のための供与体エレメントおよび方法Info
- Publication number
- JP2002517163A JP2002517163A JP52064197A JP52064197A JP2002517163A JP 2002517163 A JP2002517163 A JP 2002517163A JP 52064197 A JP52064197 A JP 52064197A JP 52064197 A JP52064197 A JP 52064197A JP 2002517163 A JP2002517163 A JP 2002517163A
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- Prior art keywords
- layer
- transfer
- polymer
- laser
- flexible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- WEAPVABOECTMGR-UHFFFAOYSA-N triethyl 2-acetyloxypropane-1,2,3-tricarboxylate Chemical compound CCOC(=O)CC(C(=O)OCC)(OC(C)=O)CC(=O)OCC WEAPVABOECTMGR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- PHYFQTYBJUILEZ-IUPFWZBJSA-N triolein Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CCCCCCCC)COC(=O)CCCCCCC\C=C/CCCCCCCC PHYFQTYBJUILEZ-IUPFWZBJSA-N 0.000 description 1
- FJFYFBRNDHRTHL-UHFFFAOYSA-N tris(8-methylnonyl) benzene-1,2,4-tricarboxylate Chemical compound CC(C)CCCCCCCOC(=O)C1=CC=C(C(=O)OCCCCCCCC(C)C)C(C(=O)OCCCCCCCC(C)C)=C1 FJFYFBRNDHRTHL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
- B41M5/38214—Structural details, e.g. multilayer systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
- B41M5/44—Intermediate, backcoat, or covering layers characterised by the macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0045—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or film forming compositions cured by mechanical wave energy, e.g. ultrasonics, cured by electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams, or cured by magnetic or electric fields, e.g. electric discharge, plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/06—Printing methods or features related to printing methods; Location or type of the layers relating to melt (thermal) mass transfer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/30—Thermal donors, e.g. thermal ribbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/41—Base layers supports or substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.(a)分解温度T1を有する第1のポリマーを含む少なくとも一つの可撓性射出 層、 (b) 少なくとも一つの加熱層および (c) (i)分解温度T2を有する第2のポリマーと(ii)画像形成性成分とを含 む少なくとも一つの転写層、ここでT2≧(T1+100)とする、 をこの順序で含み、ただし転写過程に際して供与体エレメントが、引張り係数が ≧2.9GPaである非可撓性の支持基材を含まない、レーザーで誘起される熱的転写 法で使用するための供与体エレメント。 2.転写過程に際して供与体エレメントが支持体を含まない請求項1記載のエレ メント。 3.少なくとも一つの可撓性射出層が2.5ギガパスカルより小さいかまたはこれ に等しい引張り係数を有する請求項1記載のエレメント。 4.少なくとも一つの可撓性射出層が特性的なガラス転移温度Tg 1およびTg 0を有 し、|Tg 1−Tg 0|が0〜80℃である請求項1記載のエレメント。 5.(a)可撓性射出層が約1ミル(25マイクロメートル)〜約8ミル(200マイク ロメートル)の範囲の厚さを有し、 (b) 加熱層が20Å〜0.1マイクロメートル(μm)の範囲の厚さを有し、 そして (c) 転写層が約0.1マイクロメートル〜約50マイクロメートルの範囲の厚さ を有する 請求項1記載のエレメント。 6.供与体エレメントの画像転写効率が、約257ミリジュール/cm2のレーザー流 束量において0.9より高くまたこのエレメントの感度が約257ミリジュール/cm2 より低い請求項1記載のエレメント。 7.(a)ポリマー物質を含みまた引張り係数が≦2.5GPaである可撓性の底部層、 (b) 分解温度T1を有する第1のポリマーからなる少なくとも一つの射出層 をこの順序で含む、レーザーで誘起される熱的転写法に使用するための供与体 エレメント。 8.(1)(A)(a)分解温度T1を有する第1のポリマーを含む少なくとも一つの可 撓性射出層、 (b) 少なくとも一つの加熱層および (c) 外表面を有し、また(i)分解温度T2を有する第2のポリマーと (ii)画像形成性成分とを含む少なくとも一つの転写層、 ここでT2≧(T1+100)とする をこの順序で含み、ただし転写過程に際して非可撓性の支持基材を含 まない供与体エレメントと、 (B) 供与体エレメントの転写層(c)の外表面と接触する受容体エレメン ト とからなるレーザー処理可能な組み合わせ物をレーザー放射線に像 様露光し、転写層のかなりの部分を受容体エレメントに転写し、そして (2) 受容体エレメントから供与体エレメントを分離する ことからなるレーザーで誘起される熱的転写法。 9.(1)(A)(a)引張り係数が≦2.5ギガパスカルである可撓性の底部層、 (b) 分解温度T1を有する第1のポリマーを含む少なくとも一つの可 撓性射出層、 (c) 少なくとも一つの加熱層および (d) 外表面を有し、また(i)分解温度T2を有する第2のポリマーと (ii)画像形成性成分とを含む少なくとも一つの転写層、 ここでT2≧(T1+100)とする、 をこの順序で含み、ただし不活性で非可撓性である支持体を含まない 供与体エレメントと、 (B) 供与体エレメントの転写層(c)の外表面と接触する受容体 エレメント とからなるレーザー処理可能な組み合わせ物をレーザー放射線に像 様露光し、転写層のかなりの部分を受容体エレメントに転写し、そして (2) 受容体エレメントから供与体エレメントを分離する ことからなるレーザーで誘起される熱的転写法。 10.(A)(A1) 受容体支持体、 (A2) バインダー、少なくとも一つの光硬化性成分および開始剤を含む光 硬化性層、 (A3) 場合によってはバリアー層および (A4) 場合によってはカバーシート をこの順序で含む感光性受容体エレメントと、 (B)(B1) 分解温度T1を有する第1のポリマーを含む少なくとも一つの可撓性 射出層、 (B2) 少なくとも一つの加熱層および (B3) 外表面を有し、また(i)分解温度T2を有する第2のポリマーと(ii) 画像形成性成分とを含む少なくとも一つの転写層、ここでT2は(T1+100)より 大きいかまたはそれに等しいものとす る、 をこの順序で含み、転写層(B3)の外表面が、光硬化性層(A2)、随意的なバリ アー層(A3)および随意的なカバーシート(A4)からなる群から選択される威光性受 容体エレメントの層に隣接しそして接触する供与体エレメント とからなり、レーザーで誘起される熱的転写法に従って感光性受容体エレメ ント上でフォトマスクが作成されるが、ただし少なくとも転写過程に際して供与 体エレメントが2.9GPaより大きいまたはこれに等しい引張り係数を有する非可撓 性の支持基材を含まない、レーザーで誘起される熱的転写法で使用するための組 み合わせ物。 11.転写過程に際して供与体エレメントが支持体を含まない請求項10記載の組み 合わせ物。 12.感光性受容体エレメント(A)が、 (A5) 少なくとも一つのエラストマー層、 (A1) 受容体支持体、 (A2) バインダー、少なくとも一つの光硬化性成分および開始剤を含む光硬化 性層、 (A3) 場合によってはバリアー層および (A4)場合によってはカバーシート をこの順序でさらに含む請求項10記載の組み合わせ物。 13.供与体エレメント(B)が、 (B4) 引張り係数が≦2.5ギガパスカルである可撓性の底部層、 (B1) 分解温度T1を有する第1のポリマーを含む少なくとも一の可撓性射出層 、 (B2) 少なくとも一つの加熱層および (B3) 外表面を有し、また(i)分解温度T2を有する第2のポリマーと (ii) 画像形成性成分とを含み、T2≧(T1+100)である少なくとも一つの転写層、 をこの順序でさらに含む請求項10記載の組み合わせ物。 14.(1)(A)(A1)受容体支持体、 (A2) バインダー、少なくとも一つの光硬化性成分および開始剤を含 む光硬化性層、 (A3) 場合によってはバリアー層および (A4) 場合によってはカバーシート をこの順序で含む感光性受容体エレメントと、 (B)(B1) 分解温度T1を有する第1のポリマーを含む少なくとも一つの可 撓性射出層、 (B2) 少なくとも一つの加熱層および (B3) 外表面を有し、また(i)分解温度T2を有する第2のポリマーと (ii)画像形成性成分とを含む少なくとも一つの転写層 をこの順序で含み、T2が(T1+100)より大きいかまたはそれに等しく 、転写層(B3)の外表面が、光硬化性層(A2)、随意的なバリアー層(A3)および随意 的なカバーシート(A4)からなる群から選択される感光性受容体エレメントの層に 隣接しそして接触する供与体エレメント とからなり、像様露光の結果、転写層(B3)の露光された領域が隣接する感光 性受容体エレメントの層に転写されるが、ただし少なくとも転写過程に際して供 与体エレメントが2.9GPaより大きいまたはこれに等しい引張り係数を有する非可 撓性の支持基材を含まないレーザー処 理可能な組み合わせ物をレーザー放射線に像様露光し、そして (2) 受容体エレメントから供与体エレメントを分離することによって感光性 受容体エレメント上にフォトマスクを作成する ことからなるレーザーで誘起される熱的転写法。 15.(3)工程(2)でつくられる受容体エレメントをフォトマスクを通じて化学放 射線に全体的に露光しそして (4) 工程(3)の生成物を少なくとも一つの現像剤溶液で処理して、フォトマ スクと、光硬化性層の化学放射線に露光されなかった領域とを少なくとも除去す る ことをさらに含む請求項14記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US56454695A | 1995-11-29 | 1995-11-29 | |
US08/564,546 | 1995-11-29 | ||
US08/757,717 | 1996-11-26 | ||
US08/757,717 US5766819A (en) | 1995-11-29 | 1996-11-26 | Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer |
PCT/US1996/018970 WO1997020252A1 (en) | 1995-11-29 | 1996-11-27 | Donor elements and processes for thermal dye transfer by laser |
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Publication Number | Publication Date |
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JP2002517163A true JP2002517163A (ja) | 2002-06-11 |
JP3421054B2 JP3421054B2 (ja) | 2003-06-30 |
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JP52064197A Expired - Fee Related JP3421054B2 (ja) | 1995-11-29 | 1996-11-27 | レーザーによる染料の熱転写のための供与体エレメントおよび方法 |
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US (1) | US5766819A (ja) |
EP (1) | EP0864118B1 (ja) |
JP (1) | JP3421054B2 (ja) |
DE (1) | DE69609860T2 (ja) |
WO (1) | WO1997020252A1 (ja) |
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JP2005158757A (ja) * | 2005-03-07 | 2005-06-16 | Seiko Epson Corp | 有機el表示装置の製造方法 |
WO2011091266A3 (en) * | 2010-01-22 | 2011-12-29 | Octi Tech Limited, LLC | Imaging process for flooring material |
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US6143451A (en) * | 1996-11-26 | 2000-11-07 | E. I. Du Pont De Nemours And Company | Imaged laserable assemblages and associated processes with high speed and durable image-transfer characteristics for laser-induced thermal transfer |
US5840463A (en) * | 1997-07-14 | 1998-11-24 | E. I. Du Pont De Nemours And Company | Photosensitive donor element assemblages and associated process for laser-induced thermal transfer |
US6350555B1 (en) * | 1998-01-14 | 2002-02-26 | Precision Coatings, Inc. | Direct write imaging medium |
US5994026A (en) * | 1998-03-30 | 1999-11-30 | Eastman Kodak Company | Flexographic printing plate with mask layer and methods of imaging and printing |
FR2779090B1 (fr) * | 1998-05-27 | 2000-07-13 | Sagadev | Procede de fabrication d'un cliche d'impression flexographique |
US6228543B1 (en) | 1999-09-09 | 2001-05-08 | 3M Innovative Properties Company | Thermal transfer with a plasticizer-containing transfer layer |
EP1092554A3 (en) * | 1999-10-15 | 2003-04-23 | E.I. Du Pont De Nemours And Company | Thermal imaging process providing color versatility |
US6759175B2 (en) | 2000-04-11 | 2004-07-06 | Agfa-Gevaert | Method for on-site preparation of a relief image |
EP1146392B1 (en) * | 2000-04-11 | 2013-08-07 | Agfa Graphics N.V. | Method for on-site preparation of a relief image |
DE10023128A1 (de) * | 2000-05-11 | 2001-11-15 | Roland Man Druckmasch | Abtastverfahren und Abtastvorrichtung zur optischen Dichtemessung |
JP2004505292A (ja) * | 2000-07-24 | 2004-02-19 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | レーザー誘起熱転写記録プロセス |
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- 1996-11-27 WO PCT/US1996/018970 patent/WO1997020252A1/en active IP Right Grant
- 1996-11-27 EP EP96942074A patent/EP0864118B1/en not_active Expired - Lifetime
- 1996-11-27 JP JP52064197A patent/JP3421054B2/ja not_active Expired - Fee Related
- 1996-11-27 DE DE69609860T patent/DE69609860T2/de not_active Expired - Lifetime
Cited By (6)
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JPH11260549A (ja) * | 1998-03-09 | 1999-09-24 | Seiko Epson Corp | 有機el表示装置の製造方法 |
JP4547723B2 (ja) * | 1998-03-09 | 2010-09-22 | セイコーエプソン株式会社 | 有機el表示装置の製造方法 |
JP2005158757A (ja) * | 2005-03-07 | 2005-06-16 | Seiko Epson Corp | 有機el表示装置の製造方法 |
JP4548153B2 (ja) * | 2005-03-07 | 2010-09-22 | セイコーエプソン株式会社 | 有機el表示装置の製造方法 |
WO2011091266A3 (en) * | 2010-01-22 | 2011-12-29 | Octi Tech Limited, LLC | Imaging process for flooring material |
CN102971152A (zh) * | 2010-01-22 | 2013-03-13 | 奥克蒂技术有限责任公司 | 地板材料的成像方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0864118A1 (en) | 1998-09-16 |
EP0864118B1 (en) | 2000-08-16 |
US5766819A (en) | 1998-06-16 |
DE69609860T2 (de) | 2001-04-12 |
JP3421054B2 (ja) | 2003-06-30 |
DE69609860D1 (de) | 2000-09-21 |
WO1997020252A1 (en) | 1997-06-05 |
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