JP4211272B2 - 露光装置及び露光方法 - Google Patents

露光装置及び露光方法 Download PDF

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Publication number
JP4211272B2
JP4211272B2 JP2002110906A JP2002110906A JP4211272B2 JP 4211272 B2 JP4211272 B2 JP 4211272B2 JP 2002110906 A JP2002110906 A JP 2002110906A JP 2002110906 A JP2002110906 A JP 2002110906A JP 4211272 B2 JP4211272 B2 JP 4211272B2
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JP
Japan
Prior art keywords
mask
image plane
photosensitive substrate
optical member
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002110906A
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English (en)
Japanese (ja)
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JP2003309053A (ja
Inventor
章仁 白戸
廣 白数
正紀 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2002110906A priority Critical patent/JP4211272B2/ja
Priority to TW092105577A priority patent/TWI319516B/zh
Priority to CNB031218156A priority patent/CN100343760C/zh
Priority to KR1020030023205A priority patent/KR100961925B1/ko
Publication of JP2003309053A publication Critical patent/JP2003309053A/ja
Application granted granted Critical
Publication of JP4211272B2 publication Critical patent/JP4211272B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002110906A 2002-04-12 2002-04-12 露光装置及び露光方法 Expired - Lifetime JP4211272B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002110906A JP4211272B2 (ja) 2002-04-12 2002-04-12 露光装置及び露光方法
TW092105577A TWI319516B (en) 2002-04-12 2003-03-14 Exposure device and exposure method
CNB031218156A CN100343760C (zh) 2002-04-12 2003-04-10 曝光装置及曝光方法
KR1020030023205A KR100961925B1 (ko) 2002-04-12 2003-04-12 노광 장치 및 노광 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002110906A JP4211272B2 (ja) 2002-04-12 2002-04-12 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JP2003309053A JP2003309053A (ja) 2003-10-31
JP4211272B2 true JP4211272B2 (ja) 2009-01-21

Family

ID=29243252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002110906A Expired - Lifetime JP4211272B2 (ja) 2002-04-12 2002-04-12 露光装置及び露光方法

Country Status (4)

Country Link
JP (1) JP4211272B2 (zh)
KR (1) KR100961925B1 (zh)
CN (1) CN100343760C (zh)
TW (1) TWI319516B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2005067012A1 (ja) * 2004-01-06 2007-07-26 株式会社ニコン 露光方法及び装置並びにデバイス製造方法
JP2005266779A (ja) * 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
KR101264936B1 (ko) * 2004-06-04 2013-05-15 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP4583827B2 (ja) * 2004-07-21 2010-11-17 富士フイルム株式会社 画像形成装置および画像形成方法
JP2006100568A (ja) * 2004-09-29 2006-04-13 Nikon Corp 走査型投影露光装置及びマイクロデバイスの製造方法
JP4929762B2 (ja) * 2006-03-03 2012-05-09 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP2007250947A (ja) * 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP2010102130A (ja) * 2008-10-23 2010-05-06 Canon Inc 露光装置
JP5699419B2 (ja) * 2009-05-14 2015-04-08 株式会社ニコン 露光方法及び露光装置並びにデバイス製造方法
JP5818424B2 (ja) * 2010-12-01 2015-11-18 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5875012B2 (ja) 2011-09-08 2016-03-02 パナソニックＩｐマネジメント株式会社 位置検出装置、駆動装置、レンズ鏡筒
JP2013125790A (ja) * 2011-12-13 2013-06-24 Canon Inc 保持装置、露光装置、およびデバイス製造方法
JP2013219089A (ja) * 2012-04-04 2013-10-24 Canon Inc 光学系、露光装置、およびデバイス製造方法
JP6039292B2 (ja) * 2012-08-02 2016-12-07 キヤノン株式会社 露光装置及び物品の製造方法
CN105549327B (zh) * 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
CN106292188B (zh) * 2015-05-24 2019-01-18 上海微电子装备（集团）股份有限公司 曝光装置
CN107966881B (zh) 2017-03-15 2018-11-23 上海微电子装备（集团）股份有限公司 光刻装置及方法
KR102595405B1 (ko) * 2017-03-31 2023-10-27 가부시키가이샤 니콘 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 이동체의 구동 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0618166B2 (ja) * 1986-04-21 1994-03-09 キヤノン株式会社 投影露光装置
JP3214027B2 (ja) * 1992-01-14 2001-10-02 キヤノン株式会社 露光装置及びそれを用いた半導体チップの製造方法
US6198527B1 (en) * 1992-09-14 2001-03-06 Nikon Corporation Projection exposure apparatus and exposure method
JP3610597B2 (ja) * 1994-07-29 2005-01-12 株式会社ニコン 露光装置及び方法
JP3555233B2 (ja) * 1995-04-13 2004-08-18 株式会社ニコン 投影露光装置
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
KR0132269B1 (ko) * 1994-08-24 1998-04-11 이대원 노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법
JP3236193B2 (ja) * 1995-08-02 2001-12-10 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JPH09320952A (ja) * 1996-05-29 1997-12-12 Nikon Corp 露光装置
US6235438B1 (en) * 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
TW446829B (en) * 1998-09-25 2001-07-21 Nippon Kogaku Kk Image formation position adjusting device, exposure system, image formation adjusting method and exposure method
JP3507459B2 (ja) * 2001-07-09 2004-03-15 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2003309053A (ja) 2003-10-31
CN1452017A (zh) 2003-10-29
CN100343760C (zh) 2007-10-17
TWI319516B (en) 2010-01-11
TW200305788A (en) 2003-11-01
KR100961925B1 (ko) 2010-06-10
KR20030081183A (ko) 2003-10-17

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