TWI319516B - Exposure device and exposure method - Google Patents

Exposure device and exposure method

Info

Publication number
TWI319516B
TWI319516B TW092105577A TW92105577A TWI319516B TW I319516 B TWI319516 B TW I319516B TW 092105577 A TW092105577 A TW 092105577A TW 92105577 A TW92105577 A TW 92105577A TW I319516 B TWI319516 B TW I319516B
Authority
TW
Taiwan
Prior art keywords
exposure
exposure device
exposure method
Prior art date
Application number
TW092105577A
Other languages
English (en)
Other versions
TW200305788A (en
Inventor
Akinori Shirato
Shirasu Hiroshi
Kato Masaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200305788A publication Critical patent/TW200305788A/zh
Application granted granted Critical
Publication of TWI319516B publication Critical patent/TWI319516B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
TW092105577A 2002-04-12 2003-03-14 Exposure device and exposure method TWI319516B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002110906A JP4211272B2 (ja) 2002-04-12 2002-04-12 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
TW200305788A TW200305788A (en) 2003-11-01
TWI319516B true TWI319516B (en) 2010-01-11

Family

ID=29243252

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092105577A TWI319516B (en) 2002-04-12 2003-03-14 Exposure device and exposure method

Country Status (4)

Country Link
JP (1) JP4211272B2 (zh)
KR (1) KR100961925B1 (zh)
CN (1) CN100343760C (zh)
TW (1) TWI319516B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1902733A (zh) * 2004-01-06 2007-01-24 株式会社尼康 曝光方法和装置以及器件制造方法
JP2005266779A (ja) * 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
EP1768169B9 (en) * 2004-06-04 2013-03-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
JP4583827B2 (ja) * 2004-07-21 2010-11-17 富士フイルム株式会社 画像形成装置および画像形成方法
JP2006100568A (ja) * 2004-09-29 2006-04-13 Nikon Corp 走査型投影露光装置及びマイクロデバイスの製造方法
JP4929762B2 (ja) * 2006-03-03 2012-05-09 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP2007250947A (ja) * 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP2010102130A (ja) * 2008-10-23 2010-05-06 Canon Inc 露光装置
JP5699419B2 (ja) * 2009-05-14 2015-04-08 株式会社ニコン 露光方法及び露光装置並びにデバイス製造方法
JP5818424B2 (ja) * 2010-12-01 2015-11-18 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
WO2013035341A1 (ja) 2011-09-08 2013-03-14 パナソニック株式会社 位置検出装置、駆動装置、レンズ鏡筒
JP2013125790A (ja) * 2011-12-13 2013-06-24 Canon Inc 保持装置、露光装置、およびデバイス製造方法
JP2013219089A (ja) * 2012-04-04 2013-10-24 Canon Inc 光学系、露光装置、およびデバイス製造方法
JP6039292B2 (ja) * 2012-08-02 2016-12-07 キヤノン株式会社 露光装置及び物品の製造方法
CN105549327B (zh) 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
CN106292188B (zh) 2015-05-24 2019-01-18 上海微电子装备（集团）股份有限公司 曝光装置
CN107966881B (zh) 2017-03-15 2018-11-23 上海微电子装备（集团）股份有限公司 光刻装置及方法
WO2018181912A1 (ja) * 2017-03-31 2018-10-04 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0618166B2 (ja) * 1986-04-21 1994-03-09 キヤノン株式会社 投影露光装置
JP3214027B2 (ja) * 1992-01-14 2001-10-02 キヤノン株式会社 露光装置及びそれを用いた半導体チップの製造方法
US6198527B1 (en) * 1992-09-14 2001-03-06 Nikon Corporation Projection exposure apparatus and exposure method
JP3610597B2 (ja) * 1994-07-29 2005-01-12 株式会社ニコン 露光装置及び方法
JP3555233B2 (ja) * 1995-04-13 2004-08-18 株式会社ニコン 投影露光装置
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
KR0132269B1 (ko) * 1994-08-24 1998-04-11 이대원 노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법
JP3236193B2 (ja) * 1995-08-02 2001-12-10 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JPH09320952A (ja) * 1996-05-29 1997-12-12 Nikon Corp 露光装置
US6235438B1 (en) * 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
TW446829B (en) * 1998-09-25 2001-07-21 Nippon Kogaku Kk Image formation position adjusting device, exposure system, image formation adjusting method and exposure method
JP3507459B2 (ja) * 2001-07-09 2004-03-15 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2003309053A (ja) 2003-10-31
KR20030081183A (ko) 2003-10-17
KR100961925B1 (ko) 2010-06-10
CN1452017A (zh) 2003-10-29
TW200305788A (en) 2003-11-01
CN100343760C (zh) 2007-10-17
JP4211272B2 (ja) 2009-01-21

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