KR100961925B1 - 노광 장치 및 노광 방법 - Google Patents

노광 장치 및 노광 방법 Download PDF

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Publication number
KR100961925B1
KR100961925B1 KR1020030023205A KR20030023205A KR100961925B1 KR 100961925 B1 KR100961925 B1 KR 100961925B1 KR 1020030023205 A KR1020030023205 A KR 1020030023205A KR 20030023205 A KR20030023205 A KR 20030023205A KR 100961925 B1 KR100961925 B1 KR 100961925B1
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KR
South Korea
Prior art keywords
optical member
mask
exposure
substrate
optical
Prior art date
Application number
KR1020030023205A
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English (en)
Korean (ko)
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KR20030081183A (ko
Inventor
시라토아키노리
시라스히로시
가토마사키
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20030081183A publication Critical patent/KR20030081183A/ko
Application granted granted Critical
Publication of KR100961925B1 publication Critical patent/KR100961925B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020030023205A 2002-04-12 2003-04-12 노광 장치 및 노광 방법 KR100961925B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2002-00110906 2002-04-12
JP2002110906A JP4211272B2 (ja) 2002-04-12 2002-04-12 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
KR20030081183A KR20030081183A (ko) 2003-10-17
KR100961925B1 true KR100961925B1 (ko) 2010-06-10

Family

ID=29243252

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030023205A KR100961925B1 (ko) 2002-04-12 2003-04-12 노광 장치 및 노광 방법

Country Status (4)

Country Link
JP (1) JP4211272B2 (zh)
KR (1) KR100961925B1 (zh)
CN (1) CN100343760C (zh)
TW (1) TWI319516B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005067012A1 (ja) * 2004-01-06 2005-07-21 Nikon Corporation 露光方法及び装置並びにデバイス製造方法
JP2005266779A (ja) * 2004-02-18 2005-09-29 Fuji Photo Film Co Ltd 露光装置及び方法
CN1954408B (zh) * 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
JP4583827B2 (ja) * 2004-07-21 2010-11-17 富士フイルム株式会社 画像形成装置および画像形成方法
JP2006100568A (ja) * 2004-09-29 2006-04-13 Nikon Corp 走査型投影露光装置及びマイクロデバイスの製造方法
JP4929762B2 (ja) * 2006-03-03 2012-05-09 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP2007250947A (ja) * 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP2010102130A (ja) * 2008-10-23 2010-05-06 Canon Inc 露光装置
JP5699419B2 (ja) * 2009-05-14 2015-04-08 株式会社ニコン 露光方法及び露光装置並びにデバイス製造方法
JP5818424B2 (ja) * 2010-12-01 2015-11-18 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
WO2013035341A1 (ja) 2011-09-08 2013-03-14 パナソニック株式会社 位置検出装置、駆動装置、レンズ鏡筒
JP2013125790A (ja) * 2011-12-13 2013-06-24 Canon Inc 保持装置、露光装置、およびデバイス製造方法
JP2013219089A (ja) * 2012-04-04 2013-10-24 Canon Inc 光学系、露光装置、およびデバイス製造方法
JP6039292B2 (ja) * 2012-08-02 2016-12-07 キヤノン株式会社 露光装置及び物品の製造方法
CN105549327B (zh) * 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
CN106292188B (zh) 2015-05-24 2019-01-18 上海微电子装备（集团）股份有限公司 曝光装置
CN107966881B (zh) * 2017-03-15 2018-11-23 上海微电子装备（集团）股份有限公司 光刻装置及方法
KR102595405B1 (ko) * 2017-03-31 2023-10-27 가부시키가이샤 니콘 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 이동체의 구동 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0618166B2 (ja) * 1986-04-21 1994-03-09 キヤノン株式会社 投影露光装置
JP3214027B2 (ja) * 1992-01-14 2001-10-02 キヤノン株式会社 露光装置及びそれを用いた半導体チップの製造方法
US6198527B1 (en) * 1992-09-14 2001-03-06 Nikon Corporation Projection exposure apparatus and exposure method
JP3610597B2 (ja) * 1994-07-29 2005-01-12 株式会社ニコン 露光装置及び方法
JP3555233B2 (ja) * 1995-04-13 2004-08-18 株式会社ニコン 投影露光装置
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
KR0132269B1 (ko) * 1994-08-24 1998-04-11 이대원 노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법
JP3236193B2 (ja) * 1995-08-02 2001-12-10 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JPH09320952A (ja) * 1996-05-29 1997-12-12 Nikon Corp 露光装置
US6235438B1 (en) * 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
TW446829B (en) * 1998-09-25 2001-07-21 Nippon Kogaku Kk Image formation position adjusting device, exposure system, image formation adjusting method and exposure method
JP3507459B2 (ja) * 2001-07-09 2004-03-15 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
CN1452017A (zh) 2003-10-29
CN100343760C (zh) 2007-10-17
JP4211272B2 (ja) 2009-01-21
TWI319516B (en) 2010-01-11
KR20030081183A (ko) 2003-10-17
JP2003309053A (ja) 2003-10-31
TW200305788A (en) 2003-11-01

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