JP4178011B2 - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物 Download PDF

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Publication number
JP4178011B2
JP4178011B2 JP2002257936A JP2002257936A JP4178011B2 JP 4178011 B2 JP4178011 B2 JP 4178011B2 JP 2002257936 A JP2002257936 A JP 2002257936A JP 2002257936 A JP2002257936 A JP 2002257936A JP 4178011 B2 JP4178011 B2 JP 4178011B2
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Japan
Prior art keywords
group
general formula
carbon atoms
resin composition
photosensitive resin
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Expired - Fee Related
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JP2002257936A
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English (en)
Japanese (ja)
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JP2004094118A5 (de
JP2004094118A (ja
Inventor
武志 對比地
倫康 山崎
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Gun Ei Chemical Industry Co Ltd
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Gun Ei Chemical Industry Co Ltd
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Priority to JP2002257936A priority Critical patent/JP4178011B2/ja
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Publication of JP2004094118A5 publication Critical patent/JP2004094118A5/ja
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  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP2002257936A 2002-09-03 2002-09-03 ポジ型感光性樹脂組成物 Expired - Fee Related JP4178011B2 (ja)

Priority Applications (1)

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JP2002257936A JP4178011B2 (ja) 2002-09-03 2002-09-03 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002257936A JP4178011B2 (ja) 2002-09-03 2002-09-03 ポジ型感光性樹脂組成物

Publications (3)

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JP2004094118A JP2004094118A (ja) 2004-03-25
JP2004094118A5 JP2004094118A5 (de) 2006-08-31
JP4178011B2 true JP4178011B2 (ja) 2008-11-12

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JP2002257936A Expired - Fee Related JP4178011B2 (ja) 2002-09-03 2002-09-03 ポジ型感光性樹脂組成物

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JP (1) JP4178011B2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4084597B2 (ja) * 2002-05-07 2008-04-30 群栄化学工業株式会社 アミノ基含有フェノール誘導体
KR100981830B1 (ko) 2005-09-22 2010-09-13 히다치 가세이듀퐁 마이쿠로시스데무즈 가부시키가이샤 네거티브형 감광성 수지 조성물, 패턴 형성방법 및전자부품
JP5380805B2 (ja) 2006-08-31 2014-01-08 Ｊｎｃ株式会社 インクジェット用インク
EP2133743B1 (de) 2007-03-12 2018-01-24 Hitachi Chemical DuPont Microsystems, Ltd. Lichtempfindliche harzzusammensetzung, prozess zur herstellung eines strukturierten gehärteten films unter deren verwendung und elektronisches bauteil
KR101640143B1 (ko) 2007-04-02 2016-07-18 닛산 가가쿠 고교 가부시키 가이샤 포지티브형 감광성 수지 조성물, 이의 경화막 및 표시소자
JP5179844B2 (ja) * 2007-04-06 2013-04-10 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及びそれを用いた感光性フィルム
KR20100014914A (ko) * 2007-04-10 2010-02-11 니폰 가야꾸 가부시끼가이샤 감광성 수지 조성물
KR101505899B1 (ko) 2007-10-23 2015-03-25 제이엔씨 주식회사 잉크젯용 잉크
KR101113063B1 (ko) * 2008-05-22 2012-02-15 주식회사 엘지화학 폴리이미드와 노볼락 수지를 포함하는 감광성 수지 조성물
JP5477527B2 (ja) * 2008-09-30 2014-04-23 日産化学工業株式会社 末端官能基含有ポリイミドを含むポジ型感光性樹脂組成物
JP5928129B2 (ja) 2012-04-25 2016-06-01 Jnc株式会社 インクジェットインク
JP2014159551A (ja) 2013-01-28 2014-09-04 Jnc Corp 熱硬化性組成物、硬化膜および電子部品
JP6960404B2 (ja) 2016-07-29 2021-11-05 株式会社カネカ ポリイミド樹脂、および樹脂組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2614526B2 (ja) * 1990-03-23 1997-05-28 株式会社巴川製紙所 ポジ型感光性ポリアミドイミド樹脂の製造法
JP2614527B2 (ja) * 1990-03-29 1997-05-28 株式会社巴川製紙所 ポジ型感光性ポリアミドイミド樹脂の製造法
JP3262108B2 (ja) * 1998-09-09 2002-03-04 東レ株式会社 ポジ型感光性樹脂組成物
JP2001133975A (ja) * 1999-08-23 2001-05-18 Toray Ind Inc ポジ型感光性樹脂前駆体組成物
JP2003076007A (ja) * 2001-08-31 2003-03-14 Toray Ind Inc ポジ型感光性樹脂前駆体組成物

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JP2004094118A (ja) 2004-03-25

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