JP4075298B2 - 電極被覆用低融点ガラス - Google Patents
電極被覆用低融点ガラス Download PDFInfo
- Publication number
- JP4075298B2 JP4075298B2 JP2000275150A JP2000275150A JP4075298B2 JP 4075298 B2 JP4075298 B2 JP 4075298B2 JP 2000275150 A JP2000275150 A JP 2000275150A JP 2000275150 A JP2000275150 A JP 2000275150A JP 4075298 B2 JP4075298 B2 JP 4075298B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- electrode
- less
- silver
- softening point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000275150A JP4075298B2 (ja) | 2000-09-11 | 2000-09-11 | 電極被覆用低融点ガラス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000275150A JP4075298B2 (ja) | 2000-09-11 | 2000-09-11 | 電極被覆用低融点ガラス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002087843A JP2002087843A (ja) | 2002-03-27 |
| JP2002087843A5 JP2002087843A5 (enExample) | 2005-07-14 |
| JP4075298B2 true JP4075298B2 (ja) | 2008-04-16 |
Family
ID=18760814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000275150A Expired - Fee Related JP4075298B2 (ja) | 2000-09-11 | 2000-09-11 | 電極被覆用低融点ガラス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4075298B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4725045B2 (ja) * | 2003-07-18 | 2011-07-13 | 旭硝子株式会社 | 無鉛ガラス、電極被覆用ガラス粉末およびプラズマディスプレイ装置 |
| KR20070009992A (ko) * | 2004-06-02 | 2007-01-19 | 샌트랄 글래스 컴퍼니 리미티드 | 무연 저융점 유리 |
| JP4765269B2 (ja) * | 2004-06-02 | 2011-09-07 | セントラル硝子株式会社 | 無鉛低融点ガラス |
| JP2007126319A (ja) * | 2005-11-02 | 2007-05-24 | Nihon Yamamura Glass Co Ltd | ビスマス系無鉛ガラス組成物 |
| CN105272168A (zh) * | 2014-07-15 | 2016-01-27 | 汇力恒通(厦门)远红外科技有限公司 | 一种易熔非晶瓷粉的配方及其制作方法 |
| CN117342797A (zh) * | 2023-10-07 | 2024-01-05 | 广东爱晟电子科技有限公司 | 一种金电极玻璃粉、制备方法、金电极浆料及ntc热敏电阻 |
| CN119841547B (zh) * | 2025-01-15 | 2025-11-14 | 武汉理工大学 | 一种铅硼硅玻璃固化基材及其制备方法和应用 |
-
2000
- 2000-09-11 JP JP2000275150A patent/JP4075298B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002087843A (ja) | 2002-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI230699B (en) | Lead-free low-melting glass | |
| JP2002053342A (ja) | 電極被覆用低融点ガラス | |
| JP2004284934A (ja) | 無鉛低融点ガラス | |
| JP2005041734A (ja) | 誘電体形成用ガラス及びプラズマディスプレーパネル用誘電体形成材料 | |
| US6497962B1 (en) | Low melting point glass for covering electrodes, and plasma display device | |
| JP2007297265A (ja) | 電極被覆用ガラス、電気配線形成ガラス板およびプラズマディスプレイ装置 | |
| JP4282885B2 (ja) | 電極被覆用低融点ガラスおよびプラズマディスプレイ装置 | |
| JP4075298B2 (ja) | 電極被覆用低融点ガラス | |
| JP2006193385A (ja) | 電極被覆用ガラス、プラズマディスプレイパネル前面基板およびプラズマディスプレイパネル背面基板 | |
| KR100732720B1 (ko) | 전극 피복용 유리, 전극 피복용 착색 분말, 및 플라즈마디스플레이 장치 | |
| JP2007039269A (ja) | 電極被覆用ガラスおよびプラズマディスプレイ装置 | |
| JP2007217271A (ja) | 電極被覆用ガラスおよびプラズマディスプレイ装置 | |
| JP5018032B2 (ja) | 電極被覆用無鉛ガラス | |
| JP2001151532A (ja) | 電極被覆用低融点ガラスおよびプラズマディスプレイ装置 | |
| JP4725045B2 (ja) | 無鉛ガラス、電極被覆用ガラス粉末およびプラズマディスプレイ装置 | |
| US6376400B1 (en) | Low melting point glass for covering electrodes, and glass ceramic composition for covering electrodes | |
| JP4300760B2 (ja) | 電極被覆用ガラスおよびプラズマディスプレイ装置 | |
| JP4380589B2 (ja) | 電極被覆用低融点ガラスおよびプラズマディスプレイ装置 | |
| JP2001080934A (ja) | プラズマディスプレーパネル用材料及びガラス粉末 | |
| JP4016560B2 (ja) | 電極被覆用低融点ガラスおよび電極被覆用ガラスセラミック組成物 | |
| JP4151143B2 (ja) | 電極被覆用低融点ガラス粉末およびプラズマディスプレイ装置 | |
| JPH11236244A (ja) | 電極被覆用低融点ガラス組成物およびプラズマディスプレイ装置 | |
| JP2007277016A (ja) | 平面蛍光ランプ電極被覆用無鉛ガラス | |
| JP2004345913A (ja) | プラズマディスプレイパネル用誘電体材料 | |
| JP4352770B2 (ja) | 電極被覆用ガラス、電極被覆用着色粉末およびプラズマディスプレイ装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041119 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041119 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070509 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070522 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070604 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071113 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071119 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080108 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080121 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110208 Year of fee payment: 3 |
|
| LAPS | Cancellation because of no payment of annual fees |