JP3791338B2 - 電気光学装置及びその製造方法並びに投射型表示装置 - Google Patents

電気光学装置及びその製造方法並びに投射型表示装置 Download PDF

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Publication number
JP3791338B2
JP3791338B2 JP2001032517A JP2001032517A JP3791338B2 JP 3791338 B2 JP3791338 B2 JP 3791338B2 JP 2001032517 A JP2001032517 A JP 2001032517A JP 2001032517 A JP2001032517 A JP 2001032517A JP 3791338 B2 JP3791338 B2 JP 3791338B2
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Japan
Prior art keywords
electro
region
light
optical device
film
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Expired - Fee Related
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JP2001032517A
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Japanese (ja)
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JP2002236460A (ja
JP2002236460A5 (https=
Inventor
研一 高原
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Seiko Epson Corp
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Seiko Epson Corp
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  • Liquid Crystal (AREA)
  • Projection Apparatus (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
JP2001032517A 2001-02-08 2001-02-08 電気光学装置及びその製造方法並びに投射型表示装置 Expired - Fee Related JP3791338B2 (ja)

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JP2001032517A JP3791338B2 (ja) 2001-02-08 2001-02-08 電気光学装置及びその製造方法並びに投射型表示装置

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JP2001032517A JP3791338B2 (ja) 2001-02-08 2001-02-08 電気光学装置及びその製造方法並びに投射型表示装置

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JP2002236460A JP2002236460A (ja) 2002-08-23
JP2002236460A5 JP2002236460A5 (https=) 2005-02-24
JP3791338B2 true JP3791338B2 (ja) 2006-06-28

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9954014B2 (en) 2015-12-28 2018-04-24 Lg Display Co., Ltd. Thin film transistor substrate and display using the same

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004053630A (ja) * 2002-07-16 2004-02-19 Sharp Corp 液晶表示装置及びその製造方法
JP2005012494A (ja) 2003-06-19 2005-01-13 Olympus Corp 画像処理装置
JP4613491B2 (ja) * 2004-01-13 2011-01-19 セイコーエプソン株式会社 電気光学装置の製造方法
KR101236726B1 (ko) * 2006-06-30 2013-02-25 엘지디스플레이 주식회사 액정표시장치의 제조방법
KR101453829B1 (ko) * 2007-03-23 2014-10-22 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치 및 그 제조 방법
JP4760818B2 (ja) * 2007-11-22 2011-08-31 セイコーエプソン株式会社 電気光学基板、並びにこれを具備する電気光学装置及び電子機器
US20130286314A1 (en) * 2010-12-27 2013-10-31 Sharp Kabushiki Kaisha Display element
KR102123497B1 (ko) * 2013-11-04 2020-06-16 엘지디스플레이 주식회사 박막 트랜지스터 기판과 디스플레이 장치 및 그들의 제조방법
KR102558900B1 (ko) * 2015-10-23 2023-07-25 엘지디스플레이 주식회사 표시장치와 이의 제조방법
CN115841973B (zh) * 2023-02-17 2023-04-28 成都莱普科技股份有限公司 一种用于晶圆激光退火的挡光环及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07335890A (ja) * 1994-06-03 1995-12-22 Seiko Epson Corp 薄膜半導体装置の製造方法
JP3711781B2 (ja) * 1999-03-12 2005-11-02 セイコーエプソン株式会社 電気光学装置及びその製造方法
JP3687415B2 (ja) * 1999-05-28 2005-08-24 セイコーエプソン株式会社 電気光学装置の製造方法、電気光学装置及び投射型表示装置
JP4221827B2 (ja) * 1999-06-30 2009-02-12 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法及び電子機器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9954014B2 (en) 2015-12-28 2018-04-24 Lg Display Co., Ltd. Thin film transistor substrate and display using the same

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JP2002236460A (ja) 2002-08-23

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