JP3691048B1 - 高純度コロイダルシリカの製造方法 - Google Patents

高純度コロイダルシリカの製造方法 Download PDF

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Publication number
JP3691048B1
JP3691048B1 JP2004232393A JP2004232393A JP3691048B1 JP 3691048 B1 JP3691048 B1 JP 3691048B1 JP 2004232393 A JP2004232393 A JP 2004232393A JP 2004232393 A JP2004232393 A JP 2004232393A JP 3691048 B1 JP3691048 B1 JP 3691048B1
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JP
Japan
Prior art keywords
colloidal silica
aqueous solution
chelating agent
acid
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004232393A
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English (en)
Japanese (ja)
Other versions
JP2006045039A (ja
Inventor
邦明 前島
慎介 宮部
昌宏 泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP2004232393A priority Critical patent/JP3691048B1/ja
Priority to TW094122536A priority patent/TW200610729A/zh
Priority to KR1020050069222A priority patent/KR20060048902A/ko
Application granted granted Critical
Publication of JP3691048B1 publication Critical patent/JP3691048B1/ja
Publication of JP2006045039A publication Critical patent/JP2006045039A/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/103—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate comprising silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/08—Silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
JP2004232393A 2004-08-09 2004-08-09 高純度コロイダルシリカの製造方法 Expired - Fee Related JP3691048B1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004232393A JP3691048B1 (ja) 2004-08-09 2004-08-09 高純度コロイダルシリカの製造方法
TW094122536A TW200610729A (en) 2004-08-09 2005-07-04 Method for producing high-purity colloidal silica
KR1020050069222A KR20060048902A (ko) 2004-08-09 2005-07-29 고순도 콜로이드실리카의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004232393A JP3691048B1 (ja) 2004-08-09 2004-08-09 高純度コロイダルシリカの製造方法

Publications (2)

Publication Number Publication Date
JP3691048B1 true JP3691048B1 (ja) 2005-08-31
JP2006045039A JP2006045039A (ja) 2006-02-16

Family

ID=35004130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004232393A Expired - Fee Related JP3691048B1 (ja) 2004-08-09 2004-08-09 高純度コロイダルシリカの製造方法

Country Status (3)

Country Link
JP (1) JP3691048B1 (https=)
KR (1) KR20060048902A (https=)
TW (1) TW200610729A (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2890894A1 (fr) * 2005-09-22 2007-03-23 Glaverbel Sa Belge Vitrage anti-feu
JP2007214173A (ja) * 2006-02-07 2007-08-23 Nippon Chem Ind Co Ltd 半導体ウエハ研磨用研磨組成物、その製造方法、及び研磨加工方法
CN111788153A (zh) * 2018-02-26 2020-10-16 日产化学株式会社 具有细长的粒子形状的硅溶胶的制造方法
JPWO2020262406A1 (https=) * 2019-06-24 2020-12-30
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN114455596A (zh) * 2022-01-22 2022-05-10 江西双龙硅材料科技有限公司 一种硅橡胶领域用白炭黑及其生产工艺
CN116891237A (zh) * 2023-07-13 2023-10-17 福建同晟新材料科技股份公司 一种作为牙膏添加剂的二氧化硅及其生产工艺

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008307485A (ja) * 2007-06-15 2008-12-25 Hiroshi Kokuta 水性造膜性無機コロイド溶液におけるコロイド粒径の調節方法
CN111747419B (zh) * 2020-07-08 2023-08-22 青岛美高集团有限公司 一种降低硅胶中重金属含量的方法
KR102650839B1 (ko) * 2021-09-01 2024-03-26 (주)에이스나노켐 고순도 콜로이달 실리카의 제조방법 및 고순도 실리카

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007033950A1 (fr) * 2005-09-22 2007-03-29 Agc Flat Glass Europe Sa Vitrage anti-feu
FR2890894A1 (fr) * 2005-09-22 2007-03-23 Glaverbel Sa Belge Vitrage anti-feu
JP2007214173A (ja) * 2006-02-07 2007-08-23 Nippon Chem Ind Co Ltd 半導体ウエハ研磨用研磨組成物、その製造方法、及び研磨加工方法
CN111788153B (zh) * 2018-02-26 2023-12-19 日产化学株式会社 具有细长的粒子形状的硅溶胶的制造方法
CN111788153A (zh) * 2018-02-26 2020-10-16 日产化学株式会社 具有细长的粒子形状的硅溶胶的制造方法
JPWO2020262406A1 (https=) * 2019-06-24 2020-12-30
WO2020262406A1 (ja) * 2019-06-24 2020-12-30 日産化学株式会社 キレート剤含有水ガラス及びシリカゾルの製造方法
CN114007981A (zh) * 2019-06-24 2022-02-01 日产化学株式会社 含有螯合剂的水玻璃及硅溶胶的制造方法
JP7663074B2 (ja) 2019-06-24 2025-04-16 日産化学株式会社 キレート剤含有水ガラス及びシリカゾルの製造方法
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN113929102B (zh) * 2021-11-24 2023-06-20 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN114455596B (zh) * 2022-01-22 2024-02-20 江西双龙硅材料科技有限公司 一种硅橡胶领域用白炭黑及其生产工艺
CN114455596A (zh) * 2022-01-22 2022-05-10 江西双龙硅材料科技有限公司 一种硅橡胶领域用白炭黑及其生产工艺
CN116891237A (zh) * 2023-07-13 2023-10-17 福建同晟新材料科技股份公司 一种作为牙膏添加剂的二氧化硅及其生产工艺

Also Published As

Publication number Publication date
TWI372727B (https=) 2012-09-21
TW200610729A (en) 2006-04-01
JP2006045039A (ja) 2006-02-16
KR20060048902A (ko) 2006-05-18

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