TW200610729A - Method for producing high-purity colloidal silica - Google Patents
Method for producing high-purity colloidal silicaInfo
- Publication number
- TW200610729A TW200610729A TW094122536A TW94122536A TW200610729A TW 200610729 A TW200610729 A TW 200610729A TW 094122536 A TW094122536 A TW 094122536A TW 94122536 A TW94122536 A TW 94122536A TW 200610729 A TW200610729 A TW 200610729A
- Authority
- TW
- Taiwan
- Prior art keywords
- aqueous
- colloidal silica
- purity
- silicic acid
- acid solution
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 4
- 239000008119 colloidal silica Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 150000001450 anions Chemical class 0.000 abstract 2
- 239000002738 chelating agent Substances 0.000 abstract 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
- 125000004437 phosphorous atom Chemical group 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 238000000746 purification Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
- C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
- C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
- B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
- B01J20/103—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate comprising silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/08—Silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Colloid Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004232393A JP3691048B1 (ja) | 2004-08-09 | 2004-08-09 | 高純度コロイダルシリカの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200610729A true TW200610729A (en) | 2006-04-01 |
| TWI372727B TWI372727B (https=) | 2012-09-21 |
Family
ID=35004130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094122536A TW200610729A (en) | 2004-08-09 | 2005-07-04 | Method for producing high-purity colloidal silica |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3691048B1 (https=) |
| KR (1) | KR20060048902A (https=) |
| TW (1) | TW200610729A (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2890894B1 (fr) * | 2005-09-22 | 2008-10-03 | Glaverbel Sa Belge | Vitrage anti-feu |
| JP5373250B2 (ja) * | 2006-02-07 | 2013-12-18 | 日本化学工業株式会社 | 半導体ウエハ研磨用組成物の製造方法 |
| JP2008307485A (ja) * | 2007-06-15 | 2008-12-25 | Hiroshi Kokuta | 水性造膜性無機コロイド溶液におけるコロイド粒径の調節方法 |
| KR102686976B1 (ko) * | 2018-02-26 | 2024-07-19 | 닛산 가가쿠 가부시키가이샤 | 가늘고 긴 입자형상을 갖는 실리카졸의 제조방법 |
| CN114007981A (zh) * | 2019-06-24 | 2022-02-01 | 日产化学株式会社 | 含有螯合剂的水玻璃及硅溶胶的制造方法 |
| CN111747419B (zh) * | 2020-07-08 | 2023-08-22 | 青岛美高集团有限公司 | 一种降低硅胶中重金属含量的方法 |
| KR102650839B1 (ko) * | 2021-09-01 | 2024-03-26 | (주)에이스나노켐 | 고순도 콜로이달 실리카의 제조방법 및 고순도 실리카 |
| CN113929102B (zh) * | 2021-11-24 | 2023-06-20 | 航天特种材料及工艺技术研究所 | 一种利用螯合原理制备高纯硅酸的方法 |
| CN114455596B (zh) * | 2022-01-22 | 2024-02-20 | 江西双龙硅材料科技有限公司 | 一种硅橡胶领域用白炭黑及其生产工艺 |
| CN116891237B (zh) * | 2023-07-13 | 2025-06-03 | 福建同晟新材料科技股份公司 | 一种作为牙膏添加剂的二氧化硅及其生产工艺 |
-
2004
- 2004-08-09 JP JP2004232393A patent/JP3691048B1/ja not_active Expired - Fee Related
-
2005
- 2005-07-04 TW TW094122536A patent/TW200610729A/zh not_active IP Right Cessation
- 2005-07-29 KR KR1020050069222A patent/KR20060048902A/ko not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| TWI372727B (https=) | 2012-09-21 |
| JP3691048B1 (ja) | 2005-08-31 |
| JP2006045039A (ja) | 2006-02-16 |
| KR20060048902A (ko) | 2006-05-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |