JP2695752B2 - 電着画像の形成方法 - Google Patents

電着画像の形成方法

Info

Publication number
JP2695752B2
JP2695752B2 JP6123789A JP12378994A JP2695752B2 JP 2695752 B2 JP2695752 B2 JP 2695752B2 JP 6123789 A JP6123789 A JP 6123789A JP 12378994 A JP12378994 A JP 12378994A JP 2695752 B2 JP2695752 B2 JP 2695752B2
Authority
JP
Japan
Prior art keywords
image
electrodeposited
electrodeposited image
conductive film
metal plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6123789A
Other languages
English (en)
Japanese (ja)
Other versions
JPH07331479A (ja
Inventor
村 忠 知 中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEFCO AOMORI Co Ltd
Original Assignee
TEFCO AOMORI Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14869345&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2695752(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by TEFCO AOMORI Co Ltd filed Critical TEFCO AOMORI Co Ltd
Priority to JP6123789A priority Critical patent/JP2695752B2/ja
Priority to TW083106669A priority patent/TW261673B/zh
Priority to KR1019940019048A priority patent/KR0133994B1/ko
Priority to CN94108573A priority patent/CN1092252C/zh
Publication of JPH07331479A publication Critical patent/JPH07331479A/ja
Application granted granted Critical
Publication of JP2695752B2 publication Critical patent/JP2695752B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/20—Duplicating or marking methods; Sheet materials for use therein using electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/16—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
    • B44C1/165—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
    • B44C1/17—Dry transfer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/22—Electroplating combined with mechanical treatment during the deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Decoration By Transfer Pictures (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP6123789A 1994-06-06 1994-06-06 電着画像の形成方法 Expired - Lifetime JP2695752B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6123789A JP2695752B2 (ja) 1994-06-06 1994-06-06 電着画像の形成方法
TW083106669A TW261673B (en) 1994-06-06 1994-07-21 Method for forming an electroplated image
KR1019940019048A KR0133994B1 (ko) 1994-06-06 1994-08-01 전착화상의 형성 방법
CN94108573A CN1092252C (zh) 1994-06-06 1994-08-18 电沉积图样的形成、利用方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6123789A JP2695752B2 (ja) 1994-06-06 1994-06-06 電着画像の形成方法

Publications (2)

Publication Number Publication Date
JPH07331479A JPH07331479A (ja) 1995-12-19
JP2695752B2 true JP2695752B2 (ja) 1998-01-14

Family

ID=14869345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6123789A Expired - Lifetime JP2695752B2 (ja) 1994-06-06 1994-06-06 電着画像の形成方法

Country Status (4)

Country Link
JP (1) JP2695752B2 (ko)
KR (1) KR0133994B1 (ko)
CN (1) CN1092252C (ko)
TW (1) TW261673B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4475737B2 (ja) * 2000-05-02 2010-06-09 シチズンホールディングス株式会社 立体電鋳品及びその製造方法ならびに立体電鋳品シート
JP4530262B2 (ja) * 2004-03-31 2010-08-25 セイコーインスツル株式会社 低融点金属を用いた電鋳部品の製造方法
JP2008261982A (ja) * 2007-04-11 2008-10-30 Nagashima Kogei Kk 象嵌表示パネル及びその製造方法
JP2008044371A (ja) * 2007-08-08 2008-02-28 Tefuko Aomori Kk 装飾プレート
WO2013054786A1 (ja) * 2011-10-14 2013-04-18 日立化成株式会社 金属フィルターの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01225789A (ja) * 1988-03-05 1989-09-08 Hitake Seiko Kk 金属パターンの形成方法

Also Published As

Publication number Publication date
JPH07331479A (ja) 1995-12-19
KR0133994B1 (ko) 1998-04-25
CN1116663A (zh) 1996-02-14
TW261673B (en) 1995-11-01
CN1092252C (zh) 2002-10-09
KR960000515A (ko) 1996-01-25

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