JP2688583B2 - 溶媒又は分散剤として水を含む感光性組成物 - Google Patents

溶媒又は分散剤として水を含む感光性組成物

Info

Publication number
JP2688583B2
JP2688583B2 JP3353893A JP35389391A JP2688583B2 JP 2688583 B2 JP2688583 B2 JP 2688583B2 JP 3353893 A JP3353893 A JP 3353893A JP 35389391 A JP35389391 A JP 35389391A JP 2688583 B2 JP2688583 B2 JP 2688583B2
Authority
JP
Japan
Prior art keywords
water
composition
polymer
coating
binder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3353893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059407A (ja
Inventor
ピーレ−エリー ザルフィン ローガー
シュルテス アドリアン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4268122&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2688583(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JPH059407A publication Critical patent/JPH059407A/ja
Application granted granted Critical
Publication of JP2688583B2 publication Critical patent/JP2688583B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
JP3353893A 1990-12-18 1991-12-18 溶媒又は分散剤として水を含む感光性組成物 Expired - Fee Related JP2688583B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH401090 1990-12-18
CH4010/90-8 1990-12-18

Publications (2)

Publication Number Publication Date
JPH059407A JPH059407A (ja) 1993-01-19
JP2688583B2 true JP2688583B2 (ja) 1997-12-10

Family

ID=4268122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3353893A Expired - Fee Related JP2688583B2 (ja) 1990-12-18 1991-12-18 溶媒又は分散剤として水を含む感光性組成物

Country Status (7)

Country Link
US (2) US5501942A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0493317B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2688583B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR100203822B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA2057725C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE59108989D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW208071B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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US6315684B1 (en) 1992-04-24 2001-11-13 Spalding Sports Worldwide, Inc. Golf ball with soft core
US6422953B1 (en) 1992-04-24 2002-07-23 Spalding Sports Worldwide, Inc. Golf ball
US6325730B1 (en) 1992-04-24 2001-12-04 Spalding Sports Worldwide, Inc. Golf ball with soft core
US6413172B1 (en) 1992-04-24 2002-07-02 Spalding Sports Worldwide, Inc. Golf ball with soft core
TW268031B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1993-07-02 1996-01-11 Ciba Geigy
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DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung
DE19510766A1 (de) * 1995-03-24 1996-09-26 Bayer Ag Epoxy(meth)acrylate, ein Verfahren zu ihrer Herstellung und ihre Verwendung
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US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
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US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
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DE19718948A1 (de) * 1997-05-05 1998-11-12 Basf Ag Wässrige, strahlungshärtbare Beschichtungsmassen
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WO2000002091A1 (fr) 1998-07-07 2000-01-13 Kansai Paint Co., Ltd. Composition de resist de soudage a base d'eau
US6187374B1 (en) 1998-09-02 2001-02-13 Xim Products, Inc. Coatings with increased adhesion
US6048587A (en) * 1998-10-01 2000-04-11 Ricon Resins, Inc. Water-dispersible, radiation and thermally-curable polymeric compositions
CN1218220C (zh) 1998-12-22 2005-09-07 范蒂科股份公司 光致抗蚀剂涂层的制备方法
US6433038B1 (en) * 1999-03-16 2002-08-13 Seiko Epson Corporation Photocurable ink composition for ink jet recording and ink jet recording method using the same
JP2001222103A (ja) * 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
US6342541B1 (en) * 1999-12-08 2002-01-29 Advanced Ceramics Research, Inc. Machinable positive image model material for shape deposition manufacturing
US6803112B1 (en) * 2000-03-29 2004-10-12 Sun Chemical Corporation Radiation curable aqueous compositions for low extractable film packaging
US7037953B2 (en) * 2000-03-29 2006-05-02 Sun Chemical Corporation Radiation curable aqueous compositions
DE10026955A1 (de) * 2000-05-30 2001-12-13 Daimler Chrysler Ag Materialsystem zur Verwendung beim 3D-Drucken
ATE311421T1 (de) * 2001-03-05 2005-12-15 Georg Gros Beschichtungsgemisch auf wasserbasis, verfahren zum aufbringen einer korrosionsschutzschicht mit diesem gemisch, derart beschichtete unterlage und deren verwendung
US7141614B2 (en) 2001-10-30 2006-11-28 Kaneka Corporation Photosensitive resin composition and photosensitive films and laminates made by using the same
AU2002353536A1 (en) * 2001-12-03 2003-06-17 Showa Denko K. K. Photosensitive composition and production processes for photosensitive film and printed wiring board
KR20050013537A (ko) * 2002-04-20 2005-02-04 케메탈 게엠베하 저마모성으로 성형이 가능한 비부식성 폴리머 코팅을도포하기 위한 혼합물 및 그 혼합물의 제조방법
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
KR100629887B1 (ko) * 2003-05-14 2006-09-28 이규한 금속 칩스케일 반도체패키지 및 그 제조방법
JP4531475B2 (ja) * 2003-08-15 2010-08-25 株式会社半導体エネルギー研究所 半導体装置の作製方法
US20050056954A1 (en) * 2003-09-12 2005-03-17 Devlin Brian Gerrard Method for making contact lenses
TW200630447A (en) * 2004-11-19 2006-09-01 Showa Denko Kk Resin cured film for flexible printed wiring board and production process thereof
US7863485B2 (en) * 2004-12-10 2011-01-04 Omnitech Environmental, Llc Additive and vehicle for inks, paints, coatings and adhesives
US7199192B2 (en) * 2004-12-21 2007-04-03 Callaway Golf Company Golf ball
CN101277979B (zh) 2005-09-30 2010-05-19 株式会社日本触媒 水性固化性树脂组合物
JP2012003225A (ja) 2010-01-27 2012-01-05 Fujifilm Corp ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法
JP5417364B2 (ja) 2011-03-08 2014-02-12 富士フイルム株式会社 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法
KR101313441B1 (ko) * 2011-10-25 2013-10-01 주식회사 포스코 용접성, 내스크래치성 및 내식성이 우수한 표면처리 강판
JP6252583B2 (ja) * 2013-05-13 2017-12-27 Jsr株式会社 重合体組成物、架橋重合体、タイヤ及び重合体
KR102609535B1 (ko) * 2015-07-08 2023-12-04 주식회사 동진쎄미켐 포토레지스트 패턴 코팅용 조성물 및 이를 이용한 미세 패턴 형성 방법
TWI707004B (zh) * 2018-08-02 2020-10-11 臻鼎科技股份有限公司 感光樹脂組合物及其製備方法
CN114539843B (zh) * 2021-12-21 2023-03-28 深圳市容大感光科技股份有限公司 一种喷墨打印阻焊油墨组合物及其线路板

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Also Published As

Publication number Publication date
EP0493317A1 (de) 1992-07-01
US5691006A (en) 1997-11-25
DE59108989D1 (de) 1998-06-25
TW208071B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-06-21
JPH059407A (ja) 1993-01-19
CA2057725C (en) 2000-09-19
CA2057725A1 (en) 1992-06-19
EP0493317B1 (de) 1998-05-20
US5501942A (en) 1996-03-26
EP0493317B2 (de) 2001-01-10
KR920013026A (ko) 1992-07-28
KR100203822B1 (ko) 1999-06-15

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