JP2024512805A - 集積回路アセンブリ埋め込み用に使用されるアセンブリ並びにその用途及び製造方法 - Google Patents
集積回路アセンブリ埋め込み用に使用されるアセンブリ並びにその用途及び製造方法 Download PDFInfo
- Publication number
- JP2024512805A JP2024512805A JP2023561117A JP2023561117A JP2024512805A JP 2024512805 A JP2024512805 A JP 2024512805A JP 2023561117 A JP2023561117 A JP 2023561117A JP 2023561117 A JP2023561117 A JP 2023561117A JP 2024512805 A JP2024512805 A JP 2024512805A
- Authority
- JP
- Japan
- Prior art keywords
- components
- amalgam
- release layer
- assembly
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/019—Manufacture or treatment using temporary auxiliary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/662—Laminate layers, e.g. stacks of alternating high-k metal oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/016—Manufacture or treatment using moulds
- H10W74/017—Auxiliary layers for moulds, e.g. release layers or layers preventing residue
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
- H10W74/121—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by multiple encapsulations, e.g. by a thin protective coating and a thick encapsulation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/147—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations being multilayered
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/10—Configurations of laterally-adjacent chips
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163169658P | 2021-04-01 | 2021-04-01 | |
| US63/169,658 | 2021-04-01 | ||
| PCT/US2022/022532 WO2022212492A2 (en) | 2021-04-01 | 2022-03-30 | Assemblies used for embedding integrated circuit assemblies, and their uses and method of fabrication thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024512805A true JP2024512805A (ja) | 2024-03-19 |
| JP2024512805A5 JP2024512805A5 (cg-RX-API-DMAC7.html) | 2025-04-07 |
Family
ID=81585417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023561117A Pending JP2024512805A (ja) | 2021-04-01 | 2022-03-30 | 集積回路アセンブリ埋め込み用に使用されるアセンブリ並びにその用途及び製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220319829A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP4315414A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2024512805A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20230164117A (cg-RX-API-DMAC7.html) |
| CN (1) | CN117242568A (cg-RX-API-DMAC7.html) |
| TW (1) | TW202249543A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2022212492A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12596306B2 (en) * | 2021-11-11 | 2026-04-07 | Terecircuits Corporation | Photochemical and thermal release layer processes and uses in device manufacturing |
| US12611840B1 (en) * | 2022-09-14 | 2026-04-28 | Apple Inc. | Electronic devices with modified covers |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070134849A1 (en) * | 2005-11-23 | 2007-06-14 | Jan Vanfleteren | Method for embedding dies |
| US20180130760A1 (en) * | 2016-11-07 | 2018-05-10 | Industrial Technology Research Institute | Chip package and chip packaging method |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5053195A (en) | 1989-07-19 | 1991-10-01 | Microelectronics And Computer Technology Corp. | Bonding amalgam and method of making |
| US6132676A (en) | 1997-06-30 | 2000-10-17 | Massachusetts Institute Of Technology | Minimal thermal expansion, high thermal conductivity metal-ceramic matrix composite |
| US6358567B2 (en) | 1998-12-23 | 2002-03-19 | The Regents Of The University Of California | Colloidal spray method for low cost thin coating deposition |
| US7141348B2 (en) | 2003-05-23 | 2006-11-28 | Intelleflex Corporation | Lamination and delamination technique for thin film processing |
| US6946178B2 (en) | 2003-05-23 | 2005-09-20 | James Sheats | Lamination and delamination technique for thin film processing |
| US7300824B2 (en) | 2005-08-18 | 2007-11-27 | James Sheats | Method of packaging and interconnection of integrated circuits |
| US20100078496A1 (en) | 2008-09-29 | 2010-04-01 | Sono-Tek Corporation | Methods and systems for ultrasonic spray shaping |
| US8922021B2 (en) | 2011-12-30 | 2014-12-30 | Deca Technologies Inc. | Die up fully molded fan-out wafer level packaging |
| US9455160B2 (en) * | 2013-01-14 | 2016-09-27 | Infineon Technologies Ag | Method for fabricating a semiconductor chip panel |
| US11024608B2 (en) * | 2017-03-28 | 2021-06-01 | X Display Company Technology Limited | Structures and methods for electrical connection of micro-devices and substrates |
| TWI734175B (zh) * | 2019-08-21 | 2021-07-21 | 矽品精密工業股份有限公司 | 電子封裝件及其製法與電子封裝模組 |
-
2022
- 2022-03-30 KR KR1020237036968A patent/KR20230164117A/ko active Pending
- 2022-03-30 EP EP22721930.0A patent/EP4315414A2/en active Pending
- 2022-03-30 US US17/657,247 patent/US20220319829A1/en active Pending
- 2022-03-30 WO PCT/US2022/022532 patent/WO2022212492A2/en not_active Ceased
- 2022-03-30 CN CN202280031069.3A patent/CN117242568A/zh active Pending
- 2022-03-30 JP JP2023561117A patent/JP2024512805A/ja active Pending
- 2022-04-01 TW TW111112787A patent/TW202249543A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070134849A1 (en) * | 2005-11-23 | 2007-06-14 | Jan Vanfleteren | Method for embedding dies |
| US20180130760A1 (en) * | 2016-11-07 | 2018-05-10 | Industrial Technology Research Institute | Chip package and chip packaging method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022212492A3 (en) | 2022-11-10 |
| TW202249543A (zh) | 2022-12-16 |
| CN117242568A (zh) | 2023-12-15 |
| WO2022212492A2 (en) | 2022-10-06 |
| EP4315414A2 (en) | 2024-02-07 |
| US20220319829A1 (en) | 2022-10-06 |
| KR20230164117A (ko) | 2023-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101870169B1 (ko) | 재배선층을 가지는 반도체 패키지 및 이의 제조방법 | |
| US5746868A (en) | Method of manufacturing multilayer circuit substrate | |
| US9013037B2 (en) | Semiconductor package with improved pillar bump process and structure | |
| KR101161572B1 (ko) | 양면 전극 구조의 반도체 장치 및 그 제조 방법 | |
| US9048225B2 (en) | Semiconductor device and method for manufacturing semiconductor device | |
| TWI426542B (zh) | 三維積層構造之半導體裝置及其製造方法 | |
| CN103515305B (zh) | 3d ic堆叠器件及制造方法 | |
| US9564364B2 (en) | Semiconductor device, semiconductor package, method for manufacturing semiconductor device, and method for manufacturing semiconductor package | |
| US7910403B2 (en) | Metal particles-dispersed composition and flip chip mounting process and bump-forming process using the same | |
| US8193040B2 (en) | Manufacturing of a device including a semiconductor chip | |
| US11955460B2 (en) | Advanced info POP and method of forming thereof | |
| JP2024512805A (ja) | 集積回路アセンブリ埋め込み用に使用されるアセンブリ並びにその用途及び製造方法 | |
| JP5385471B2 (ja) | 半導体装置の製造方法 | |
| CN112930588A (zh) | 半导体装置与烧结纳米粒子的连接 | |
| CN102656677A (zh) | 半导体装置和该半导体装置的制造方法 | |
| US7851342B2 (en) | In-situ formation of conductive filling material in through-silicon via | |
| US7763977B2 (en) | Semiconductor device and manufacturing method therefor | |
| CN100527373C (zh) | 半导体器件及其制造方法 | |
| US20240234229A1 (en) | Method for making a semiconductor device using a double side molding technology | |
| TW202520381A (zh) | 半導體裝置及用強脈衝光照射製造重分佈層的方法 | |
| JP4440494B2 (ja) | 半導体装置の製造方法 | |
| JP6788344B2 (ja) | 電子部品及び電子部品の製造方法 | |
| US20260123503A1 (en) | Method of manufacturing a semiconductor device | |
| JP2017069257A (ja) | 半導体装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250328 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250328 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260407 |