JP2023083562A - カバーガラス - Google Patents
カバーガラス Download PDFInfo
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- JP2023083562A JP2023083562A JP2023071533A JP2023071533A JP2023083562A JP 2023083562 A JP2023083562 A JP 2023083562A JP 2023071533 A JP2023071533 A JP 2023071533A JP 2023071533 A JP2023071533 A JP 2023071533A JP 2023083562 A JP2023083562 A JP 2023083562A
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- 239000006059 cover glass Substances 0.000 title claims abstract description 59
- 239000011521 glass Substances 0.000 claims abstract description 49
- 239000000203 mixture Substances 0.000 claims abstract description 25
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 19
- 229910018068 Li 2 O Inorganic materials 0.000 claims abstract description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 238000005342 ion exchange Methods 0.000 description 31
- 238000000034 method Methods 0.000 description 21
- 238000004031 devitrification Methods 0.000 description 16
- 230000007423 decrease Effects 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 229910010413 TiO 2 Inorganic materials 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 238000007500 overflow downdraw method Methods 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 5
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 3
- 101100371219 Pseudomonas putida (strain DOT-T1E) ttgE gene Proteins 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000007656 fracture toughness test Methods 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- -1 B 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/004—Refining agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
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- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
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Abstract
【解決手段】本発明のカバーガラスは、ガラス組成として、モル%表示で、SiO2 20~80%、Al2O3 15~30%、B2O3 0~3.7%、Li2O 1~20%、Na2O 2.8~20%、K2O 0~20%、MgO 0.1~50%、CaO 0~20%を含有し、下記式で算出されるX値が7400以上であることを特徴とする。X=61.1×[SiO2]+174.3×[Al2O3]+11.3×[B2O3]+124.7×[Li2O]-5.2×[Na2O]+226.7×[K2O]+139.4×[MgO]+117.5×[CaO]+89.6×[BaO]+191.8×[TiO2]+226.7×[Y2O3]+157.9×[ZrO2]-42.2×[P2O5]
【選択図】図1
Description
X=61.1×[SiO2]+174.3×[Al2O3]+11.3×[B2O3]+124.7×[Li2O]-5.2×[Na2O]+226.7×[K2O]+139.4×[MgO]+117.5×[CaO]+89.6×[BaO]+191.8×[TiO2]+226.7×[Y2O3]+157.9×[ZrO2]-42.2×[P2O5]
内部の引っ張り応力値=(圧縮応力値×応力深さ)/(板厚-2×応力深さ)
本発明のカバーガラスはまた別の態様において、ガラス組成として、モル%表示で、SiO2 20~80%、Al2O3 15~30%、B2O3 0~3.7%、Li2O 1~20%、Na2O 2.8~20%、K2O 0~20%、MgO 0.1~50%、CaO 0~20%を含有し、下記式で算出されるX値が7400以上であることを特徴とする。X=61.1×[SiO2]+174.3×[Al2O3]+11.3×[B2O3]+124.7×[Li2O]-5.2×[Na2O]+226.7×[K2O]+139.4×[MgO]+117.5×[CaO]+89.6×[BaO]+191.8×[TiO2]+226.7×[Y2O3]+157.9×[ZrO2]-42.2×[P2O5]
Claims (7)
- ガラス組成として、モル%表示で、SiO2 20~80%、Al2O3 15~30%、B2O3 0~3.7%、Li2O 1~20%、Na2O 2.8~20%、K2O 0~20%、MgO 0.1~50%、CaO 0~20%を含有し、下記式で算出されるX値が7400以上であることを特徴とするカバーガラス。X=61.1×[SiO2]+174.3×[Al2O3]+11.3×[B2O3]+124.7×[Li2O]-5.2×[Na2O]+226.7×[K2O]+139.4×[MgO]+117.5×[CaO]+89.6×[BaO]+191.8×[TiO2]+226.7×[Y2O3]+157.9×[ZrO2]-42.2×[P2O5]
- ガラス組成として、モル%表示で、SiO2 20~80%、Al2O3 15~30%、B2O3 0~3.7%、Li2O 1~20%、Na2O 2.8~20%、K2O 0~20%、MgO 1~40%、CaO 0~20%、BaO 0~20%、TiO2 0~20%、Y2O3 0~20%、ZrO2 0~20%、P2O5 0~20%を含有することを特徴とする請求項1に記載のカバーガラス。
- ガラス組成中のAl2O3の含有量が16.6~20モル%であることを特徴とする請求項1又は2に記載のカバーガラス。
- ガラス組成中のNa2Oの含有量が5~20モル%であることを特徴とする請求項1~3の何れかに記載のカバーガラス。
- ガラス組成中のLi2Oの含有量が5~20モル%であることを特徴とする請求項1~4の何れかに記載のカバーガラス。
- ガラス組成中のB2O3の含有量が0.1~3.7モル%である、請求項1~3の何れかに記載のカバーガラス。
- ガラス組成中のMgOの含有量が10~40モル%である、請求項1~3の何れか記載のカバーガラス。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017248966 | 2017-12-26 | ||
JP2017248966 | 2017-12-26 | ||
PCT/JP2018/047299 WO2019131528A1 (ja) | 2017-12-26 | 2018-12-21 | カバーガラス |
JP2019561659A JP7276667B2 (ja) | 2017-12-26 | 2018-12-21 | カバーガラス |
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JP2019561659A Division JP7276667B2 (ja) | 2017-12-26 | 2018-12-21 | カバーガラス |
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JP2023083562A true JP2023083562A (ja) | 2023-06-15 |
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JP2019561659A Active JP7276667B2 (ja) | 2017-12-26 | 2018-12-21 | カバーガラス |
JP2023071533A Pending JP2023083562A (ja) | 2017-12-26 | 2023-04-25 | カバーガラス |
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JP2019561659A Active JP7276667B2 (ja) | 2017-12-26 | 2018-12-21 | カバーガラス |
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JP (2) | JP7276667B2 (ja) |
KR (1) | KR102755083B1 (ja) |
CN (2) | CN116655239A (ja) |
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EP0805785B1 (en) * | 1995-01-27 | 2002-09-25 | Sarnoff Corporation | Low dielectric loss glasses |
JP4518291B2 (ja) * | 1999-10-19 | 2010-08-04 | Hoya株式会社 | ガラス組成物ならびにそれを用いた情報記録媒体用基板、情報記録媒体および情報記録装置 |
JP3680765B2 (ja) * | 2000-07-21 | 2005-08-10 | 株式会社村田製作所 | 誘電体磁器組成物 |
JP2006083045A (ja) | 2004-09-17 | 2006-03-30 | Hitachi Ltd | ガラス部材 |
KR20090027259A (ko) * | 2006-10-10 | 2009-03-16 | 니폰 덴키 가라스 가부시키가이샤 | 강화 유리 기판 |
JP4815002B2 (ja) * | 2009-06-04 | 2011-11-16 | 株式会社オハラ | 情報記録媒体用結晶化ガラス基板およびその製造方法 |
JP2011201711A (ja) * | 2010-03-24 | 2011-10-13 | Hoya Corp | ディスプレイ用カバーガラスおよびディスプレイ |
JP2012020921A (ja) * | 2010-06-18 | 2012-02-02 | Asahi Glass Co Ltd | ディスプレイ装置用のガラスおよびガラス板 |
JP2012148909A (ja) * | 2011-01-18 | 2012-08-09 | Nippon Electric Glass Co Ltd | 強化ガラス及び強化ガラス板 |
JP2012232882A (ja) * | 2011-04-18 | 2012-11-29 | Asahi Glass Co Ltd | 化学強化ガラスの製造方法および化学強化用ガラス |
WO2013180220A1 (ja) * | 2012-05-31 | 2013-12-05 | 旭硝子株式会社 | 無アルカリガラス基板、および、無アルカリガラス基板の薄板化方法 |
JP2014205604A (ja) * | 2012-06-25 | 2014-10-30 | 日本電気硝子株式会社 | 強化ガラス基板及びその製造方法 |
KR101785819B1 (ko) * | 2013-02-07 | 2017-10-16 | 니혼 이타가라스 가부시키가이샤 | 유리 조성물, 화학 강화용 유리 조성물, 강화 유리 물품, 및 디스플레이용 커버 유리 |
US9371248B2 (en) * | 2013-04-10 | 2016-06-21 | Schott Ag | Glass element with high scratch tolerance |
US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
TWI647194B (zh) * | 2013-06-14 | 2019-01-11 | 美商.康寧公司 | 具抗刮損表面之積層玻璃製品 |
JP6256744B2 (ja) * | 2013-10-17 | 2018-01-10 | 日本電気硝子株式会社 | 無アルカリガラス板 |
US20170174556A1 (en) * | 2014-04-24 | 2017-06-22 | Nippon Sheet Glass Company, Limited | Glass composition, glass sheet for chemical strengthening, strengthened glass sheet, and strengthened glass substrate for display |
JP6765748B2 (ja) * | 2015-06-04 | 2020-10-07 | 株式会社オハラ | 結晶化ガラス及び結晶化ガラス基板 |
KR102650166B1 (ko) * | 2016-01-08 | 2024-03-21 | 코닝 인코포레이티드 | 고유 내손상성을 갖는 화학적으로 강화가능한 리튬 알루미노실리케이트 유리 |
CN113024108B (zh) * | 2016-01-21 | 2023-08-18 | Agc株式会社 | 化学强化玻璃以及化学强化用玻璃 |
CN106746605A (zh) * | 2017-03-17 | 2017-05-31 | 四川旭虹光电科技有限公司 | 一种化学强化用玻璃以及由其制备的抗断裂玻璃板 |
TWI794344B (zh) * | 2017-11-28 | 2023-03-01 | 美商康寧公司 | 經化學強化之生物活性玻璃陶瓷 |
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2018
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- 2018-12-21 CN CN201880060360.7A patent/CN111132942A/zh active Pending
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JPWO2019131528A1 (ja) | 2020-11-19 |
US20200317558A1 (en) | 2020-10-08 |
JP7276667B2 (ja) | 2023-05-18 |
CN116655239A (zh) | 2023-08-29 |
US20230049035A1 (en) | 2023-02-16 |
TW202419415A (zh) | 2024-05-16 |
CN111132942A (zh) | 2020-05-08 |
KR102755083B1 (ko) | 2025-01-21 |
TWI835766B (zh) | 2024-03-21 |
WO2019131528A1 (ja) | 2019-07-04 |
KR20200102979A (ko) | 2020-09-01 |
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