JP2022529066A5 - - Google Patents
Info
- Publication number
- JP2022529066A5 JP2022529066A5 JP2021561950A JP2021561950A JP2022529066A5 JP 2022529066 A5 JP2022529066 A5 JP 2022529066A5 JP 2021561950 A JP2021561950 A JP 2021561950A JP 2021561950 A JP2021561950 A JP 2021561950A JP 2022529066 A5 JP2022529066 A5 JP 2022529066A5
- Authority
- JP
- Japan
- Prior art keywords
- material layer
- organic solvent
- patterned
- use according
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19169513.9 | 2019-04-16 | ||
| EP19169513 | 2019-04-16 | ||
| PCT/EP2020/059580 WO2020212173A1 (en) | 2019-04-16 | 2020-04-03 | Composition for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below comprising a boron-type additive |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022529066A JP2022529066A (ja) | 2022-06-16 |
| JP2022529066A5 true JP2022529066A5 (https=) | 2023-04-14 |
Family
ID=66217771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021561950A Pending JP2022529066A (ja) | 2019-04-16 | 2020-04-03 | ホウ素タイプの添加剤を含む、５０ｎｍ以下のライン間寸法を有するパターン化材料を処理する際のパターンの崩壊を回避するための組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20220187712A1 (https=) |
| EP (1) | EP3956729A1 (https=) |
| JP (1) | JP2022529066A (https=) |
| KR (1) | KR20210154971A (https=) |
| CN (1) | CN113574460A (https=) |
| IL (1) | IL287201A (https=) |
| TW (1) | TW202104572A (https=) |
| WO (1) | WO2020212173A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021525388A (ja) * | 2018-05-25 | 2021-09-24 | ビーエイエスエフ・ソシエタス・エウロパエアＢａｓｆ Ｓｅ | ５０ｎｍ以下のライン間寸法を有するパターン化材料を処理したときのパターン倒壊を回避するための溶媒混合物を含む組成物を使用する方法 |
| US12518960B2 (en) * | 2020-07-09 | 2026-01-06 | Basf Se | Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 NM or below |
| KR20250109768A (ko) * | 2023-01-10 | 2025-07-17 | 후지필름 가부시키가이샤 | 약액, 약액 수용체 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2434118A1 (fr) * | 1978-06-19 | 1980-03-21 | Charbonnages Ste Chimique | Solutions d'anhydride borique et leur utilisation comme durcisseurs de resols |
| KR20080110984A (ko) * | 2005-12-30 | 2008-12-22 | 아나코르 파마슈티칼스 인코포레이티드 | 보론함유 소분자 |
| US20080299487A1 (en) | 2007-05-31 | 2008-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography material and lithography process |
| WO2012027667A2 (en) | 2010-08-27 | 2012-03-01 | Advanced Technology Materials, Inc. | Method for preventing the collapse of high aspect ratio structures during drying |
| US8828144B2 (en) * | 2010-12-28 | 2014-09-09 | Central Grass Company, Limited | Process for cleaning wafers |
| MY161218A (en) * | 2011-01-25 | 2017-04-14 | Basf Se | Use of surfactants having at least three short-chain perfluorinated groups rf for manufacturing integrated circuits having patterns with line-space dimensions below 50nm |
| JP5681560B2 (ja) * | 2011-05-17 | 2015-03-11 | 東京エレクトロン株式会社 | 基板乾燥方法及び基板処理装置 |
| JP5806645B2 (ja) * | 2012-06-12 | 2015-11-10 | 株式会社東芝 | 基板の乾燥方法、電子装置の製造方法及び基板の乾燥装置 |
| EP3341352A4 (en) * | 2015-09-24 | 2019-08-28 | Board of Trustees of Michigan State University | BOR-BASED CYCLOADDITION CATALYSTS AND PROCESS FOR PREPARING BIOBASED TEREPHTHALIC ACID, ISOPHTHALIC ACID AND POLY (ETHYLENE TEREPHTHALATE) |
| WO2019086374A1 (en) | 2017-11-03 | 2019-05-09 | Basf Se | Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below |
| CN108565124B (zh) * | 2018-03-27 | 2019-12-31 | 天津理工大学 | 一种基于掺硼石墨烯/掺硼金刚石复合电极的钠离子超级电容器的制备方法 |
| JP7077184B2 (ja) * | 2018-08-30 | 2022-05-30 | キオクシア株式会社 | 基板処理方法及び半導体装置の製造方法 |
-
2020
- 2020-04-03 WO PCT/EP2020/059580 patent/WO2020212173A1/en not_active Ceased
- 2020-04-03 KR KR1020217032642A patent/KR20210154971A/ko not_active Withdrawn
- 2020-04-03 JP JP2021561950A patent/JP2022529066A/ja active Pending
- 2020-04-03 CN CN202080020797.5A patent/CN113574460A/zh active Pending
- 2020-04-03 EP EP20715884.1A patent/EP3956729A1/en not_active Withdrawn
- 2020-04-03 US US17/603,250 patent/US20220187712A1/en not_active Abandoned
- 2020-04-14 TW TW109112484A patent/TW202104572A/zh unknown
-
2021
- 2021-10-12 IL IL287201A patent/IL287201A/en unknown
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