JP2006515933A5 - - Google Patents
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- Publication number
- JP2006515933A5 JP2006515933A5 JP2005510014A JP2005510014A JP2006515933A5 JP 2006515933 A5 JP2006515933 A5 JP 2006515933A5 JP 2005510014 A JP2005510014 A JP 2005510014A JP 2005510014 A JP2005510014 A JP 2005510014A JP 2006515933 A5 JP2006515933 A5 JP 2006515933A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning solution
- solution
- substituted
- oxidizing agent
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims 33
- 239000007800 oxidant agent Substances 0.000 claims 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 12
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 229920002120 photoresistant polymer Polymers 0.000 claims 11
- 238000000034 method Methods 0.000 claims 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 8
- 239000004065 semiconductor Substances 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 6
- -1 perborate Chemical compound 0.000 claims 6
- 239000002798 polar solvent Substances 0.000 claims 5
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims 4
- 239000002738 chelating agent Substances 0.000 claims 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 4
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims 4
- MWNQXXOSWHCCOZ-UHFFFAOYSA-L sodium;oxido carbonate Chemical compound [Na+].[O-]OC([O-])=O MWNQXXOSWHCCOZ-UHFFFAOYSA-L 0.000 claims 4
- 239000004094 surface-active agent Substances 0.000 claims 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 3
- 150000001408 amides Chemical class 0.000 claims 3
- 239000006184 cosolvent Substances 0.000 claims 3
- 230000001590 oxidative effect Effects 0.000 claims 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 2
- LFTLOKWAGJYHHR-UHFFFAOYSA-N N-methylmorpholine N-oxide Chemical compound CN1(=O)CCOCC1 LFTLOKWAGJYHHR-UHFFFAOYSA-N 0.000 claims 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims 2
- 125000005210 alkyl ammonium group Chemical group 0.000 claims 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims 2
- 125000003107 substituted aryl group Chemical group 0.000 claims 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 claims 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims 1
- 150000003973 alkyl amines Chemical class 0.000 claims 1
- 150000001413 amino acids Chemical class 0.000 claims 1
- 239000000908 ammonium hydroxide Substances 0.000 claims 1
- 150000007942 carboxylates Chemical class 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- 150000002009 diols Chemical class 0.000 claims 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 claims 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 claims 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 229920005573 silicon-containing polymer Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 150000003536 tetrazoles Chemical class 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
- 150000003852 triazoles Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43497102P | 2002-12-20 | 2002-12-20 | |
| US10/389,214 US8236485B2 (en) | 2002-12-20 | 2003-03-14 | Photoresist removal |
| PCT/US2003/040439 WO2004059700A2 (en) | 2002-12-20 | 2003-12-17 | Photoresist removal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006515933A JP2006515933A (ja) | 2006-06-08 |
| JP2006515933A5 true JP2006515933A5 (https=) | 2007-02-08 |
Family
ID=32684764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005510014A Pending JP2006515933A (ja) | 2002-12-20 | 2003-12-17 | フォトレジスト除去 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US8236485B2 (https=) |
| EP (1) | EP1583997A4 (https=) |
| JP (1) | JP2006515933A (https=) |
| KR (1) | KR101174911B1 (https=) |
| AU (1) | AU2003297347A1 (https=) |
| CA (1) | CA2550522A1 (https=) |
| WO (1) | WO2004059700A2 (https=) |
Families Citing this family (83)
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| EP1510861A1 (en) * | 2003-08-26 | 2005-03-02 | Sony International (Europe) GmbH | Method for patterning organic materials or combinations of organic and inorganic materials |
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| DE602005000732T2 (de) * | 2004-06-25 | 2007-12-06 | Jsr Corp. | Reinigungszusammensetzung für Halbleiterkomponente und Verfahren zur Herstellung eines Halbleitergeräts |
| US9217929B2 (en) * | 2004-07-22 | 2015-12-22 | Air Products And Chemicals, Inc. | Composition for removing photoresist and/or etching residue from a substrate and use thereof |
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-
2003
- 2003-03-14 US US10/389,214 patent/US8236485B2/en not_active Expired - Lifetime
- 2003-12-17 WO PCT/US2003/040439 patent/WO2004059700A2/en not_active Ceased
- 2003-12-17 JP JP2005510014A patent/JP2006515933A/ja active Pending
- 2003-12-17 CA CA002550522A patent/CA2550522A1/en not_active Abandoned
- 2003-12-17 AU AU2003297347A patent/AU2003297347A1/en not_active Abandoned
- 2003-12-17 EP EP03814181A patent/EP1583997A4/en not_active Withdrawn
- 2003-12-17 KR KR1020057011621A patent/KR101174911B1/ko not_active Expired - Fee Related
-
2012
- 2012-08-07 US US13/568,790 patent/US8679734B2/en not_active Expired - Fee Related
-
2014
- 2014-03-25 US US14/224,656 patent/US9256134B2/en not_active Expired - Fee Related
-
2016
- 2016-02-08 US US15/018,113 patent/US20160152926A1/en not_active Abandoned
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