JP2022506591A - マイクロ電子ダイ上のインダクタ - Google Patents
マイクロ電子ダイ上のインダクタ Download PDFInfo
- Publication number
- JP2022506591A JP2022506591A JP2021524026A JP2021524026A JP2022506591A JP 2022506591 A JP2022506591 A JP 2022506591A JP 2021524026 A JP2021524026 A JP 2021524026A JP 2021524026 A JP2021524026 A JP 2021524026A JP 2022506591 A JP2022506591 A JP 2022506591A
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- Prior art keywords
- conductor
- column
- seed layer
- transverse
- plating mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004377 microelectronic Methods 0.000 title claims description 115
- 239000004020 conductor Substances 0.000 claims abstract description 384
- 238000000034 method Methods 0.000 claims description 115
- 238000007747 plating Methods 0.000 claims description 115
- 230000008569 process Effects 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 54
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 36
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 28
- 229910052802 copper Inorganic materials 0.000 claims description 28
- 239000010949 copper Substances 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 229910052759 nickel Inorganic materials 0.000 claims description 18
- 229910000679 solder Inorganic materials 0.000 claims description 16
- 239000000696 magnetic material Substances 0.000 claims description 15
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 229910052804 chromium Inorganic materials 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- 238000005538 encapsulation Methods 0.000 claims description 9
- 230000035699 permeability Effects 0.000 claims description 9
- 239000000853 adhesive Substances 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 239000006249 magnetic particle Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 115
- 239000012790 adhesive layer Substances 0.000 description 19
- 239000000203 mixture Substances 0.000 description 14
- 150000002739 metals Chemical class 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000009713 electroplating Methods 0.000 description 8
- 238000007772 electroless plating Methods 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
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Abstract
Description
Claims (20)
- マイクロ電子デバイスであって、
ダイであって、前記ダイの端子表面まで延在する端子を有する前記ダイ、
前記端子表面に沿って延在する第1の横方向導体であって、前記第1の横方向導体の少なくとも一部が前記端子の少なくとも一部に電気的に結合される、前記第1の横方向導体、
前記端子表面から離れて垂直に延在する、前記第1の横方向導体上の導電性カラム、及び、
前記第1の横方向導体とは反対側に位置し、前記端子表面と平行の面において横方向に延在する、前記導電性カラム上の第2の横方向導体、
を含み、
前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体の第1のセットが、前記マイクロ電子デバイスのバンプボンドを提供し、
前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体の第2のセットが、前記マイクロ電子デバイスのインダクタを形成するために直列に電気的に結合される、
マイクロ電子デバイス。 - 請求項1に記載のマイクロ電子デバイスであって、前記第1の横方向導体が銅を含む、マイクロ電子デバイス。
- 請求項2に記載のマイクロ電子デバイスであって、前記第1の横方向導体の各々が、前記端子表面上に第1の導体シード層を含み、前記第1の導体シード層が、チタン、タングステン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、前記第1の横方向導体が3ミクロンから30ミクロンの厚さを有する、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、前記導電性カラムが銅を含み、前記導電性カラムが、前記端子表面に対して平行に測定した場合に25ミクロンから50ミクロンの幅を有し、同じく前記端子表面に対して平行に測定した場合に25ミクロンから300ミクロンの長さを有し、前記端子表面に対して垂直に測定した場合に30ミクロンから100ミクロンの高さを有する、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、前記導電性カラムの各々が、前記第1の横方向導体上にカラムシード層を含み、前記カラムシード層が、チタン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、
前記第2の横方向導体が銅を含み、
前記第2の横方向導体の各々が前記導電性カラム上に第2の導体シード層を含み、前記第2の導体シード層が、チタン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、
マイクロ電子デバイス。 - 請求項1に記載のマイクロ電子デバイスであって、前記第2の横方向導体が3ミクロンから30ミクロンの厚さを有する、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、前記第2の横方向導体の少なくとも一部上にダイ取り付け材料を含み、前記ダイ取り付け材料が、はんだ及び接着剤から成るグループから選択される、マイクロ電子デバイス。
- 請求項1に記載のマイクロ電子デバイスであって、前記インダクタに位置する磁性材料を含み、前記磁性材料が1より大きい平均比透磁率を有し、ここで、真空の比透磁率が1である、マイクロ電子デバイス。
- 請求項10に記載のマイクロ電子デバイスであって、前記磁性材料が、前記ダイ上に位置する磁性粒子を備える封入材料を含む、マイクロ電子デバイス。
- 請求項10に記載のマイクロ電子デバイスであって、前記インダクタが線形構成を有し、前記線形構成において、前記インダクタの前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体が線形アレイ状に配される、マイクロ電子デバイス。
- 請求項10に記載のマイクロ電子デバイスであって、前記インダクタが環状構成を有し、前記環状構成において、前記インダクタの前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体が閉ループアレイ状に配される、マイクロ電子デバイス。
- マイクロ電子デバイスを形成する方法であって、
ダイであって、前記ダイの端子表面まで延在する端子を有する前記ダイを得ること、
前記端子表面に沿って延在する第1の横方向導体を、前記第1の横方向導体の少なくとも一部が前記端子の少なくとも一部に接するように形成すること、
前記第1の横方向導体上に導電性カラムを、前記端子表面から離れて垂直に延在するように形成すること、及び、
前記導電性カラム上に、前記第1の横方向導体とは反対側に位置する第2の横方向導体を、前記端子表面と平行の面において横方向に延在するように形成すること、
を含み、
前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体の第1のセットが、前記マイクロ電子デバイスのバンプボンドを提供し、
前記第1の横方向導体、前記導電性カラム、及び前記第2の横方向導体の第2のセットが、前記マイクロ電子デバイスのインダクタを形成するために直列に電気的に結合される、
方法。 - 請求項14に記載の方法であって、前記第1の横方向導体を形成することが、
前記端子表面上に第1の導体シード層を、前記第1の導体シード層が前記端子に接するように形成すること、
前記第1の導体シード層の上に第1の導体めっきマスクを、前記第1の導体めっきマスクが、前記第1の横方向導体のためのエリアにおける前記第1の導体シード層を露出させるように形成すること、
前記第1の導体めっきマスクによって露出された箇所の前記第1の導体シード層上に、めっきプロセスを用いて第1のメイン導体を形成すること、
前記第1の導体めっきマスクを除去すること、及び、
前記第1のメイン導体と、前記第1のメイン導体及び前記端子表面間の前記第1の導体シード層とが、前記第1の横方向導体を提供するように、前記第1のメイン導体によって露出された箇所の前記第1の導体シード層を除去すること、
を含み、
前記第1の導体シード層が、チタン、タングステン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、
方法。 - 請求項14に記載の方法であって、前記導電性カラムを形成することが、
前記第1の横方向導体に接するカラムシード層を形成すること、
前記カラムシード層の上にカラムめっきマスクを、前記カラムめっきマスクが、前記導電性カラムのためのエリアにおける前記カラムシード層を露出させるように形成すること、
前記カラムめっきマスクによって露出された箇所の前記カラムシード層上に、めっきプロセスを用いてメインカラムを形成すること、
前記カラムめっきマスクを除去すること、及び、
前記メインカラムと、前記メインカラム及び前記第1の横方向導体間の前記カラムシード層とが、前記導電性カラムを提供するように、前記メインカラムによって露出された箇所の前記カラムシード層を除去すること、
を含み、
前記カラムシード層が、チタン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、
方法。 - 請求項14に記載の方法であって、前記第2の横方向導体を形成することが、
前記導電性カラムに接する第2の導体シード層を形成すること、
前記第2の導体シード層の上に第2の導体めっきマスクを、前記第2の導体めっきマスクが前記第2の横方向導体のためのエリアにおける前記第2の導体シード層を露出させるように形成すること、
前記第2の導体めっきマスクによって露出された箇所の前記第2の導体シード層上に、めっきプロセスを用いて第2のメイン導体を形成すること、
前記第2の導体めっきマスクを除去すること、及び、
前記第2のメイン導体と、前記第2のメイン導体及び前記導電性カラム間の前記第2の導体シード層とが、前記第2の横方向導体を提供するように、前記第2のメイン導体によって露出された箇所の前記第2の導体シード層を除去すること、
を含み、
前記第2の導体シード層が、チタン、タングステン、クロム、及びニッケルから成るグループから選択される少なくとも一つの金属を含む、
方法。 - 請求項14に記載の方法であって、前記導電性カラムを形成すること及び前記第2の横方向導体を形成することが、
前記第1の横方向導体の上にカラムめっきマスクを、前記カラムめっきマスクが前記導電性カラムのためのエリアにおける前記第1の横方向導体を露出するように形成すること、
前記カラムめっきマスク上に第2の導体シード層を、前記第2の導体シード層が、前記カラムめっきマスクによって露出された箇所の前記第1の横方向導体に接するように形成すること、
前記第2の導体シード層の上に第2の導体めっきマスクを、前記第2の導体めっきマスクが前記第2の横方向導体のためのエリアにおける前記第2の導体シード層を露出させるように形成すること、
前記第2の導体めっきマスクによって露出された箇所の前記第2の導体シード層上に、めっきプロセスを用いて第2のメイン導体を形成することであって、そのため、
前記カラムめっきマスクによって横方向に囲まれた前記第2の導体シード層の一部が、前記カラムめっきマスクによって横方向に囲まれた前記第2のメイン導体の一部と組み合わされて、前記導電性カラムを提供し、
前記第2の導体めっきマスクによって横方向に囲まれた前記第2の導体シード層の一部が、前記第2の導体めっきマスクによって横方向に囲まれた前記第2のメイン導体の一部と組み合わされて、前記第2の横方向導体を提供するようにする、前記第2のメイン導体を形成すること、
前記第2の導体めっきマスクを除去すること、
前記第2のメイン導体によって露出された箇所の前記第2の導体シード層を除去すること、及び、
前記カラムめっきマスクを除去すること、
を含む、方法。 - 請求項14に記載の方法であって、前記インダクタにおいて磁性材料を形成することを含み、前記磁性材料が1より大きい平均比透磁率を有し、ここで、真空の比透磁率が1である、方法。
- 請求項14に記載の方法であって、
前記第2の横方向導体の少なくとも一部上にダイ取り付け材料を形成すること、及び、
前記バンプボンドを、前記ダイ取り付け材料を介して外部リードに電気的に結合すること、
を含み、
前記ダイ取り付け材料が、はんだ及び接着剤から成るグループから選択される、
方法。
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Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110544679B (zh) * | 2019-08-30 | 2021-05-18 | 颀中科技(苏州)有限公司 | 芯片重布线结构及其制备方法 |
US11616013B2 (en) | 2020-06-12 | 2023-03-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extended via semiconductor structure and device |
US20220216295A1 (en) * | 2021-01-07 | 2022-07-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Inductor, semiconductor device including the same, and manufacturing method thereof |
WO2023075847A1 (en) * | 2021-10-27 | 2023-05-04 | Microchip Technology Incorporated | Integrated inductor including multi-component via layer inductor element |
WO2023075846A1 (en) * | 2021-10-27 | 2023-05-04 | Microchip Technology Incorporated | Integrated inductor with inductor wire formed in an integrated circuit layer stack |
US20240006392A1 (en) * | 2022-06-29 | 2024-01-04 | Texas Instruments Incorporated | Integrated circuit with inductor in magnetic package |
Family Cites Families (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6013571A (en) | 1997-06-16 | 2000-01-11 | Motorola, Inc. | Microelectronic assembly including columnar interconnections and method for forming same |
FR2771843B1 (fr) * | 1997-11-28 | 2000-02-11 | Sgs Thomson Microelectronics | Transformateur en circuit integre |
US6008102A (en) * | 1998-04-09 | 1999-12-28 | Motorola, Inc. | Method of forming a three-dimensional integrated inductor |
US6531945B1 (en) * | 2000-03-10 | 2003-03-11 | Micron Technology, Inc. | Integrated circuit inductor with a magnetic core |
US7109838B2 (en) * | 2000-09-08 | 2006-09-19 | Texas Instruments Incorporated | System for integrating a toroidal inductor in a semiconductor device |
JP2002289436A (ja) * | 2001-03-28 | 2002-10-04 | Niigata Seimitsu Kk | インダクタンス素子 |
TW594959B (en) | 2003-05-02 | 2004-06-21 | Yu-Nung Shen | Semiconductor chip package structure and method |
US7208758B2 (en) * | 2003-09-16 | 2007-04-24 | Micron Technology, Inc. | Dynamic integrated circuit clusters, modules including same and methods of fabricating |
KR100596779B1 (ko) * | 2004-04-16 | 2006-07-04 | 주식회사 하이닉스반도체 | 반도체 인덕터와 그의 제조 방법 |
US7229908B1 (en) | 2004-06-04 | 2007-06-12 | National Semiconductor Corporation | System and method for manufacturing an out of plane integrated circuit inductor |
US7531893B2 (en) | 2006-07-19 | 2009-05-12 | Texas Instruments Incorporated | Power semiconductor devices having integrated inductor |
JP2008066672A (ja) | 2006-09-11 | 2008-03-21 | Fuji Electric Device Technology Co Ltd | 薄型磁気部品内蔵基板及びそれを用いたスイッチング電源モジュール |
US8212155B1 (en) | 2007-06-26 | 2012-07-03 | Wright Peter V | Integrated passive device |
US20090085704A1 (en) | 2007-10-01 | 2009-04-02 | Infineon Technologies Austria Ag | Chip inductor |
US7666688B2 (en) * | 2008-01-25 | 2010-02-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing a coil inductor |
US20090309687A1 (en) | 2008-06-11 | 2009-12-17 | Aleksandar Aleksov | Method of manufacturing an inductor for a microelectronic device, method of manufacturing a substrate containing such an inductor, and substrate manufactured thereby, |
EP2370981B1 (en) * | 2008-12-03 | 2012-10-10 | Planarmag, Inc. | An integrated planar variable transformer with embedded magnetic core |
TWI438696B (zh) | 2009-08-21 | 2014-05-21 | Univ Nat Chiao Tung | Chip inductor structure and manufacturing method thereof |
US8358193B2 (en) * | 2010-05-26 | 2013-01-22 | Tyco Electronics Corporation | Planar inductor devices |
US8466769B2 (en) * | 2010-05-26 | 2013-06-18 | Tyco Electronics Corporation | Planar inductor devices |
US8432017B2 (en) * | 2011-09-28 | 2013-04-30 | Chipbond Technology Corporation | Method for fabricating a three-dimensional inductor carrier with metal core and structure thereof |
US9673268B2 (en) * | 2011-12-29 | 2017-06-06 | Intel Corporation | Integrated inductor for integrated circuit devices |
US20130307117A1 (en) | 2012-05-18 | 2013-11-21 | Texas Instruments Incorporated | Structure and Method for Inductors Integrated into Semiconductor Device Packages |
US8809996B2 (en) | 2012-06-29 | 2014-08-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package with passive devices and method of forming the same |
US20140104284A1 (en) | 2012-10-16 | 2014-04-17 | Qualcomm Mems Technologies, Inc. | Through substrate via inductors |
US10157876B2 (en) * | 2012-10-19 | 2018-12-18 | Taiwan Semiconductor Manufacturing Company Limited | Method of forming inductor with conductive trace |
US9761553B2 (en) | 2012-10-19 | 2017-09-12 | Taiwan Semiconductor Manufacturing Company Limited | Inductor with conductive trace |
US8941212B2 (en) | 2013-02-06 | 2015-01-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Helical spiral inductor between stacking die |
US9748324B2 (en) | 2013-05-21 | 2017-08-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of fabricating magnetic core inductors for an integrated voltage regulator |
US20150137342A1 (en) * | 2013-11-20 | 2015-05-21 | Marvell World Trade Ltd. | Inductor/transformer outside of silicon wafer |
US9368564B2 (en) | 2014-03-28 | 2016-06-14 | Qualcomm Incorporated | 3D pillar inductor |
US10008316B2 (en) | 2014-03-28 | 2018-06-26 | Qualcomm Incorporated | Inductor embedded in a package substrate |
US9496213B2 (en) | 2015-02-05 | 2016-11-15 | Qualcomm Incorporated | Integrated device package comprising a magnetic core inductor with protective ring embedded in a package substrate |
US9780052B2 (en) | 2015-09-14 | 2017-10-03 | Micron Technology, Inc. | Collars for under-bump metal structures and associated systems and methods |
FR3045940B1 (fr) * | 2015-12-16 | 2018-02-09 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif d'inductance et son procede de fabrication |
US20170373032A1 (en) * | 2016-06-24 | 2017-12-28 | Qualcomm Incorporated | Redistribution layer (rdl) fan-out wafer level packaging (fowlp) structure |
US10777478B2 (en) | 2016-07-15 | 2020-09-15 | Advanced Semiconductor Engineering, Inc. | Semiconductor package device for power device |
US10256036B2 (en) | 2016-09-08 | 2019-04-09 | Apple Inc. | Magnetic field containment inductors |
US20180233484A1 (en) * | 2017-02-14 | 2018-08-16 | Nanya Technology Corporation | Semiconductor structure and manufacturing method thereof |
-
2018
- 2018-11-06 US US16/182,111 patent/US11640968B2/en active Active
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