JP2021530670A - 第二高調波発生（ｓｈｇ）光学的検査システムの設計 - Google Patents

第二高調波発生（ｓｈｇ）光学的検査システムの設計 Download PDF

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JP2021530670A
JP2021530670A JP2020564135A JP2020564135A JP2021530670A JP 2021530670 A JP2021530670 A JP 2021530670A JP 2020564135 A JP2020564135 A JP 2020564135A JP 2020564135 A JP2020564135 A JP 2020564135A JP 2021530670 A JP2021530670 A JP 2021530670A
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sample
shg
light
beam splitter
detectors
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JP2021530670A5 (enExample
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ミン レイ，
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フェムトメトリクス， インク．
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/636—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited using an arrangement of pump beam and probe beam; using the measurement of optical non-linear properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N2021/218—Measuring properties of electrooptical or magnetooptical media
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8845—Multiple wavelengths of illumination or detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2020564135A 2018-05-15 2019-05-14 第二高調波発生（ｓｈｇ）光学的検査システムの設計 Pending JP2021530670A (ja)

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JP2024025066A JP7806112B2 (ja) 2018-05-15 2024-02-22 第二高調波発生（ｓｈｇ）光学的検査システムの設計

Applications Claiming Priority (5)

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US201862671616P 2018-05-15 2018-05-15
US201862671611P 2018-05-15 2018-05-15
US62/671,616 2018-05-15
US62/671,611 2018-05-15
PCT/US2019/032282 WO2019222260A1 (en) 2018-05-15 2019-05-14 Second harmonic generation (shg) optical inspection system designs

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JP2024025066A Active JP7806112B2 (ja) 2018-05-15 2024-02-22 第二高調波発生（ｓｈｇ）光学的検査システムの設計

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US (1) US11946863B2 (enExample)
EP (1) EP3794335B1 (enExample)
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KR (1) KR20210021308A (enExample)
CN (1) CN113167741A (enExample)
WO (1) WO2019222260A1 (enExample)

Cited By (3)

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JP2023018477A (ja) * 2021-07-27 2023-02-08 国立大学法人埼玉大学 電界計測方法及び電界センサ
JP2024519241A (ja) * 2022-03-31 2024-05-10 上海微崇半導体設備有限公司 第二次高調波に基づいて半導体多層構成を測量する方法と装置
KR20240083805A (ko) 2022-12-05 2024-06-12 삼성전자주식회사 대상물의 표면을 검사하는 장치

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JP7072805B2 (ja) * 2017-02-28 2022-05-23 国立大学法人東京工業大学 時間分解光電子顕微鏡装置および当該装置によるキャリアダイナミクス画像の取得方法
CN113056814B (zh) 2018-04-27 2025-05-27 菲拓梅里克斯公司 确定半导体器件特性的系统和方法
EP3785022A4 (en) 2018-04-27 2022-02-23 SK Hynix Inc. FIELD DISTORTED NONLINEAR OPTICAL METROLOGY WITH A CORONA DISCHARGE SOURCE
EP3794335B1 (en) 2018-05-15 2025-02-19 Femtometrix, Inc. Second harmonic generation (shg) optical inspection system designs
US11042019B2 (en) * 2018-12-17 2021-06-22 Purdue Research Foundation Systems and methods for imaging a sample
JP2020204579A (ja) * 2019-06-18 2020-12-24 住友電工デバイス・イノベーション株式会社 ウェハの表面検査方法、表面検査装置、および電子部品の製造方法
CN111426700B (zh) * 2020-05-11 2024-05-17 中国科学院上海光学精密机械研究所 吸收性缺陷单光束光热测量装置和测量方法
WO2022191958A1 (en) 2021-03-12 2022-09-15 Battelle Memorial Institute Systems and methods for backside optical carrier injection into microelectronic devices
US12553708B2 (en) * 2021-05-12 2026-02-17 Femtometrix, Inc. Second-harmonic generation for critical dimensional metrology
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CN114397279B (zh) * 2022-01-19 2023-07-18 天津大学 任意应变状态下二维材料和应变物体的应变状态检测方法
TWI816446B (zh) * 2022-06-21 2023-09-21 米雷迪恩飛秒光源股份有限公司 一種雷射應用處理系統及其方法
TW202419849A (zh) 2022-07-12 2024-05-16 美商芬托邁萃克斯公司 用於非侵入、非干擾、不接地之同步電暈沉積及二次諧波產生之量測的方法及設備
WO2024054802A1 (en) * 2022-09-07 2024-03-14 Femtometrix, Inc. Method and apparatus for separation of the second harmonic generation components, through variation in the input probing laser polarization
WO2024054856A1 (en) * 2022-09-08 2024-03-14 Femtometrix, Inc. Method and apparatus for main detector synchronization of optically based second harmonic generation measurements
US20240221149A1 (en) * 2022-12-30 2024-07-04 Kla Corporation Interface-based defect inspection using second harmonic generation
CN116840257A (zh) * 2023-07-04 2023-10-03 哈尔滨工业大学 一种多偏振分解谐波显微成像装置及方法
CN117491384B (zh) * 2023-12-11 2024-06-14 上海微崇半导体设备有限公司 晶圆检测系统及检测方法
FR3164289A1 (fr) * 2024-07-05 2026-01-09 Universite de Bordeaux Appareil optique d’analyse de surfaces à l’aide de lumières réfléchies par processus optiques linéaire et non linéaire
CN119470352B (zh) * 2024-11-11 2025-12-26 湘潭大学 一种原位交流电压shg系统及其表征本征铁电翻转的方法
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