CN113167741A - 二次谐波产生(shg)光学检查系统设计 - Google Patents

二次谐波产生(shg)光学检查系统设计 Download PDF

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Publication number
CN113167741A
CN113167741A CN201980047563.7A CN201980047563A CN113167741A CN 113167741 A CN113167741 A CN 113167741A CN 201980047563 A CN201980047563 A CN 201980047563A CN 113167741 A CN113167741 A CN 113167741A
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CN
China
Prior art keywords
sample
light
shg
beam splitter
detector
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Pending
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CN201980047563.7A
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Chinese (zh)
Inventor
雷鸣
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Femtometrics Inc
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Femtometrics Inc
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Publication of CN113167741A publication Critical patent/CN113167741A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/636—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited using an arrangement of pump beam and probe beam; using the measurement of optical non-linear properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N2021/218—Measuring properties of electrooptical or magnetooptical media
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8845—Multiple wavelengths of illumination or detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201980047563.7A 2018-05-15 2019-05-14 二次谐波产生(shg)光学检查系统设计 Pending CN113167741A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862671616P 2018-05-15 2018-05-15
US201862671611P 2018-05-15 2018-05-15
US62/671,616 2018-05-15
US62/671,611 2018-05-15
PCT/US2019/032282 WO2019222260A1 (en) 2018-05-15 2019-05-14 Second harmonic generation (shg) optical inspection system designs

Publications (1)

Publication Number Publication Date
CN113167741A true CN113167741A (zh) 2021-07-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980047563.7A Pending CN113167741A (zh) 2018-05-15 2019-05-14 二次谐波产生(shg)光学检查系统设计

Country Status (6)

Country Link
US (1) US11946863B2 (enExample)
EP (1) EP3794335B1 (enExample)
JP (2) JP2021530670A (enExample)
KR (1) KR20210021308A (enExample)
CN (1) CN113167741A (enExample)
WO (1) WO2019222260A1 (enExample)

Cited By (4)

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TWI816446B (zh) * 2022-06-21 2023-09-21 米雷迪恩飛秒光源股份有限公司 一種雷射應用處理系統及其方法
CN116840257A (zh) * 2023-07-04 2023-10-03 哈尔滨工业大学 一种多偏振分解谐波显微成像装置及方法
CN117491384A (zh) * 2023-12-11 2024-02-02 上海微崇半导体设备有限公司 晶圆检测系统及检测方法
CN119470352A (zh) * 2024-11-11 2025-02-18 湘潭大学 一种原位交流电压shg系统及其表征本征铁电翻转的方法

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KR102609862B1 (ko) 2014-04-17 2023-12-04 펨토매트릭스, 인코포레이티드. 웨이퍼 계측 기술들
WO2016077617A1 (en) 2014-11-12 2016-05-19 Femtometrix, Inc. Systems for parsing material properties from within shg signals
EP3344972B1 (en) 2015-09-03 2022-12-14 California Institute of Technology Optical systems and methods of characterizing high-k dielectrics
JP7072805B2 (ja) * 2017-02-28 2022-05-23 国立大学法人東京工業大学 時間分解光電子顕微鏡装置および当該装置によるキャリアダイナミクス画像の取得方法
CN113056814B (zh) 2018-04-27 2025-05-27 菲拓梅里克斯公司 确定半导体器件特性的系统和方法
EP3785022A4 (en) 2018-04-27 2022-02-23 SK Hynix Inc. FIELD DISTORTED NONLINEAR OPTICAL METROLOGY WITH A CORONA DISCHARGE SOURCE
EP3794335B1 (en) 2018-05-15 2025-02-19 Femtometrix, Inc. Second harmonic generation (shg) optical inspection system designs
US11042019B2 (en) * 2018-12-17 2021-06-22 Purdue Research Foundation Systems and methods for imaging a sample
JP2020204579A (ja) * 2019-06-18 2020-12-24 住友電工デバイス・イノベーション株式会社 ウェハの表面検査方法、表面検査装置、および電子部品の製造方法
CN111426700B (zh) * 2020-05-11 2024-05-17 中国科学院上海光学精密机械研究所 吸收性缺陷单光束光热测量装置和测量方法
WO2022191958A1 (en) 2021-03-12 2022-09-15 Battelle Memorial Institute Systems and methods for backside optical carrier injection into microelectronic devices
US12553708B2 (en) * 2021-05-12 2026-02-17 Femtometrix, Inc. Second-harmonic generation for critical dimensional metrology
US12315105B2 (en) 2021-06-08 2025-05-27 Battelle Memorial Institute High resolution imaging of microelectronic devices
JP7791563B2 (ja) * 2021-07-27 2025-12-24 国立大学法人埼玉大学 電界計測方法及び電界センサ
CN114397279B (zh) * 2022-01-19 2023-07-18 天津大学 任意应变状态下二维材料和应变物体的应变状态检测方法
CN114823406B (zh) * 2022-03-31 2023-03-24 上海微崇半导体设备有限公司 一种基于二次谐波测量半导体多层结构的方法和装置
TW202419849A (zh) 2022-07-12 2024-05-16 美商芬托邁萃克斯公司 用於非侵入、非干擾、不接地之同步電暈沉積及二次諧波產生之量測的方法及設備
WO2024054802A1 (en) * 2022-09-07 2024-03-14 Femtometrix, Inc. Method and apparatus for separation of the second harmonic generation components, through variation in the input probing laser polarization
WO2024054856A1 (en) * 2022-09-08 2024-03-14 Femtometrix, Inc. Method and apparatus for main detector synchronization of optically based second harmonic generation measurements
JP2024080718A (ja) 2022-12-05 2024-06-17 三星電子株式会社 対象物の表面を検査する装置
US20240221149A1 (en) * 2022-12-30 2024-07-04 Kla Corporation Interface-based defect inspection using second harmonic generation
FR3164289A1 (fr) * 2024-07-05 2026-01-09 Universite de Bordeaux Appareil optique d’analyse de surfaces à l’aide de lumières réfléchies par processus optiques linéaire et non linéaire
CN120445996B (zh) * 2025-07-10 2025-09-30 杭州创锐光测技术有限公司 晶体缺陷检测系统、控制方法、介质和程序产品

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