JP2021511532A5 - - Google Patents

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Publication number
JP2021511532A5
JP2021511532A5 JP2020538551A JP2020538551A JP2021511532A5 JP 2021511532 A5 JP2021511532 A5 JP 2021511532A5 JP 2020538551 A JP2020538551 A JP 2020538551A JP 2020538551 A JP2020538551 A JP 2020538551A JP 2021511532 A5 JP2021511532 A5 JP 2021511532A5
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JP
Japan
Prior art keywords
periodic structure
periodic
measurement target
structures
target
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Pending
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JP2020538551A
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English (en)
Japanese (ja)
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JP2021511532A (ja
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Priority claimed from PCT/US2018/062931 external-priority patent/WO2019139685A1/en
Publication of JP2021511532A publication Critical patent/JP2021511532A/ja
Publication of JP2021511532A5 publication Critical patent/JP2021511532A5/ja
Priority to JP2022160693A priority Critical patent/JP7544781B2/ja
Pending legal-status Critical Current

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JP2020538551A 2018-01-12 2018-11-29 傾斜周期構造を有する計測ターゲット及び方法 Pending JP2021511532A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022160693A JP7544781B2 (ja) 2018-01-12 2022-10-05 傾斜周期構造を有する計測ターゲット及び方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862617086P 2018-01-12 2018-01-12
US62/617,086 2018-01-12
PCT/US2018/062931 WO2019139685A1 (en) 2018-01-12 2018-11-29 Metrology targets and methods with oblique periodic structures

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022160693A Division JP7544781B2 (ja) 2018-01-12 2022-10-05 傾斜周期構造を有する計測ターゲット及び方法

Publications (2)

Publication Number Publication Date
JP2021511532A JP2021511532A (ja) 2021-05-06
JP2021511532A5 true JP2021511532A5 (https=) 2022-01-06

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ID=67218346

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JP2020538551A Pending JP2021511532A (ja) 2018-01-12 2018-11-29 傾斜周期構造を有する計測ターゲット及び方法
JP2022160693A Active JP7544781B2 (ja) 2018-01-12 2022-10-05 傾斜周期構造を有する計測ターゲット及び方法

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JP2022160693A Active JP7544781B2 (ja) 2018-01-12 2022-10-05 傾斜周期構造を有する計測ターゲット及び方法

Country Status (7)

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US (1) US11137692B2 (https=)
JP (2) JP2021511532A (https=)
KR (1) KR102408316B1 (https=)
CN (1) CN111542784B (https=)
SG (1) SG11201913459RA (https=)
TW (1) TWI780291B (https=)
WO (1) WO2019139685A1 (https=)

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US10795268B2 (en) * 2017-09-29 2020-10-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for measuring overlay errors using overlay measurement patterns
US11256177B2 (en) * 2019-09-11 2022-02-22 Kla Corporation Imaging overlay targets using Moiré elements and rotational symmetry arrangements
WO2021054928A1 (en) * 2019-09-16 2021-03-25 Kla Corporation Periodic semiconductor device misregistration metrology system and method
CN112731778B (zh) * 2019-10-28 2022-08-02 长鑫存储技术有限公司 一种半导体套刻精度的控制方法及叠层标记
DE102019220174B4 (de) 2019-12-19 2026-03-12 Carl Zeiss Industrielle Messtechnik Gmbh Verfahren und Vorrichtung zur Bestimmung eines Drehwinkels einer Drehachse
KR102857305B1 (ko) * 2020-02-07 2025-09-08 케이엘에이 코포레이션 반도체 디바이스의 오정합 측정에서의 비직교 타겟 및 이를 사용하기 위한 방법
CN113539867A (zh) * 2020-04-14 2021-10-22 中国科学院微电子研究所 半导体器件套刻精度的测量方法
CN115428139B (zh) * 2020-04-15 2024-04-12 科磊股份有限公司 可用于测量半导体装置偏移的具有装置级特征的偏移目标
US11604149B2 (en) 2020-04-23 2023-03-14 Kla Corporation Metrology methods and optical schemes for measurement of misregistration by using hatched target designs
CN111508932B (zh) * 2020-04-27 2021-12-14 深圳中科飞测科技股份有限公司 套刻标记及套刻误差的测量方法
US11355375B2 (en) * 2020-07-09 2022-06-07 Kla Corporation Device-like overlay metrology targets displaying Moiré effects
WO2022253526A1 (en) * 2021-05-31 2022-12-08 Asml Netherlands B.V. Metrology measurement method and apparatus
EP4137889A1 (en) * 2021-08-20 2023-02-22 ASML Netherlands B.V. Metrology measurement method and apparatus
US11703767B2 (en) * 2021-06-28 2023-07-18 Kla Corporation Overlay mark design for electron beam overlay
WO2023066657A1 (en) * 2021-10-19 2023-04-27 Asml Netherlands B.V. Pattern matching method
US12242202B2 (en) 2022-01-04 2025-03-04 Nanya Technology Corporation Method for overlay error correction
US20230213872A1 (en) * 2022-01-04 2023-07-06 Nanya Technology Corporation Mark for overlay measurement

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JPH0547634A (ja) * 1991-08-13 1993-02-26 Nikon Corp 位置検出装置
JP2870461B2 (ja) * 1995-12-18 1999-03-17 日本電気株式会社 フォトマスクの目合わせマーク及び半導体装置
JP2000012445A (ja) * 1998-06-25 2000-01-14 Nikon Corp 位置検出方法及び装置、並びに前記装置を備えた露光装置
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