JP2021505959A5 - - Google Patents

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JP2021505959A5
JP2021505959A5 JP2020531119A JP2020531119A JP2021505959A5 JP 2021505959 A5 JP2021505959 A5 JP 2021505959A5 JP 2020531119 A JP2020531119 A JP 2020531119A JP 2020531119 A JP2020531119 A JP 2020531119A JP 2021505959 A5 JP2021505959 A5 JP 2021505959A5
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JP
Japan
Prior art keywords
layer
pattern
features
measurement system
overlay
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JP2020531119A
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English (en)
Japanese (ja)
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JP2021505959A (ja
JP7118152B2 (ja
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Priority claimed from US16/009,939 external-priority patent/US10474040B2/en
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JP2020531119A 2017-12-07 2018-12-06 デバイスに関連付けられたオーバーレイの計測のためのシステムおよび方法 Active JP7118152B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762595987P 2017-12-07 2017-12-07
US62/595,987 2017-12-07
US16/009,939 2018-06-15
US16/009,939 US10474040B2 (en) 2017-12-07 2018-06-15 Systems and methods for device-correlated overlay metrology
PCT/US2018/064145 WO2019113262A1 (en) 2017-12-07 2018-12-06 Systems and methods for device-correlated overlay metrology

Publications (3)

Publication Number Publication Date
JP2021505959A JP2021505959A (ja) 2021-02-18
JP2021505959A5 true JP2021505959A5 (https=) 2022-01-11
JP7118152B2 JP7118152B2 (ja) 2022-08-15

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Family Applications (1)

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JP2020531119A Active JP7118152B2 (ja) 2017-12-07 2018-12-06 デバイスに関連付けられたオーバーレイの計測のためのシステムおよび方法

Country Status (8)

Country Link
US (1) US10474040B2 (https=)
EP (1) EP3721294B1 (https=)
JP (1) JP7118152B2 (https=)
KR (1) KR102435141B1 (https=)
CN (1) CN111433676B (https=)
SG (1) SG11202002413UA (https=)
TW (1) TWI781259B (https=)
WO (1) WO2019113262A1 (https=)

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