JP2021506131A5 - - Google Patents
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- Publication number
- JP2021506131A5 JP2021506131A5 JP2020531513A JP2020531513A JP2021506131A5 JP 2021506131 A5 JP2021506131 A5 JP 2021506131A5 JP 2020531513 A JP2020531513 A JP 2020531513A JP 2020531513 A JP2020531513 A JP 2020531513A JP 2021506131 A5 JP2021506131 A5 JP 2021506131A5
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- ammonium
- acid
- mass
- fluorosilicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 4
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 claims 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims 2
- 239000012459 cleaning agent Substances 0.000 claims 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 claims 2
- -1 Ammonium Fluorosilicate Chemical compound 0.000 claims 1
- SRLUQXUPKGPNMZ-UHFFFAOYSA-N CCN(CC)CC.F.F.F.Cl Chemical compound CCN(CC)CC.F.F.F.Cl SRLUQXUPKGPNMZ-UHFFFAOYSA-N 0.000 claims 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims 1
- QNZDVGURVWUWIY-UHFFFAOYSA-N azanium;2-fluoroacetate Chemical compound [NH4+].[O-]C(=O)CF QNZDVGURVWUWIY-UHFFFAOYSA-N 0.000 claims 1
- HQABUPZFAYXKJW-UHFFFAOYSA-O butylazanium Chemical compound CCCC[NH3+] HQABUPZFAYXKJW-UHFFFAOYSA-O 0.000 claims 1
- 229940104869 fluorosilicate Drugs 0.000 claims 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17206097.2 | 2017-12-08 | ||
| EP17206097 | 2017-12-08 | ||
| PCT/EP2018/083684 WO2019110681A1 (en) | 2017-12-08 | 2018-12-05 | Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021506131A JP2021506131A (ja) | 2021-02-18 |
| JP2021506131A5 true JP2021506131A5 (https=) | 2021-12-16 |
| JP7330972B2 JP7330972B2 (ja) | 2023-08-22 |
Family
ID=60654767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020531513A Active JP7330972B2 (ja) | 2017-12-08 | 2018-12-05 | 半導体基板からエッチング後または灰化後の残留物を除去するための洗浄剤組成物、およびそれに対応する製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11377624B2 (https=) |
| EP (1) | EP3720938A1 (https=) |
| JP (1) | JP7330972B2 (https=) |
| KR (1) | KR102786662B1 (https=) |
| CN (1) | CN111465679A (https=) |
| IL (1) | IL274877B2 (https=) |
| TW (1) | TWI799476B (https=) |
| WO (1) | WO2019110681A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI808161B (zh) | 2018-04-27 | 2023-07-11 | 日商三菱瓦斯化學股份有限公司 | 水性組成物及使用此組成物之清洗方法 |
| KR20220058069A (ko) * | 2020-10-30 | 2022-05-09 | 주식회사 이엔에프테크놀로지 | 세정제 조성물 및 이를 이용한 세정방법 |
| KR102944353B1 (ko) | 2020-11-06 | 2026-03-27 | 주식회사 케이씨텍 | 연마 입자 용해용 조성물 및 이를 이용한 세정 방법 |
| US12599937B2 (en) * | 2024-01-23 | 2026-04-14 | Applied Materials, Inc. | Water-based, high-efficiency chemical reagent for substrate surface particle removal |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6696222B2 (en) | 2001-07-24 | 2004-02-24 | Silicon Integrated Systems Corp. | Dual damascene process using metal hard mask |
| WO2004094581A1 (en) * | 2003-04-18 | 2004-11-04 | Ekc Technology, Inc. | Aqueous fluoride compositions for cleaning semiconductor devices |
| CN100442449C (zh) | 2003-05-02 | 2008-12-10 | Ekc技术公司 | 半导体工艺中后蚀刻残留物的去除 |
| JP4390616B2 (ja) * | 2004-04-27 | 2009-12-24 | Ｎｅｃエレクトロニクス株式会社 | 洗浄液及び半導体装置の製造方法 |
| US7888302B2 (en) * | 2005-02-03 | 2011-02-15 | Air Products And Chemicals, Inc. | Aqueous based residue removers comprising fluoride |
| TWI611047B (zh) | 2006-12-21 | 2018-01-11 | 恩特葛瑞斯股份有限公司 | 用以移除蝕刻後殘餘物之液體清洗劑 |
| JP2011503899A (ja) * | 2007-11-16 | 2011-01-27 | イー．ケー．シー．テクノロジー．インコーポレーテッド | 半導体基板から金属ハードマスクエッチング残留物を除去するための組成物 |
| TWI435932B (zh) * | 2007-11-23 | 2014-05-01 | Anji Microelectronics Co Ltd | 用以清洗等離子蝕刻殘留物之清洗液 |
| US9074170B2 (en) | 2008-10-21 | 2015-07-07 | Advanced Technology Materials, Inc. | Copper cleaning and protection formulations |
| US8114773B2 (en) | 2010-07-06 | 2012-02-14 | United Microelectronics Corp. | Cleaning solution, cleaning method and damascene process using the same |
| US9063431B2 (en) * | 2010-07-16 | 2015-06-23 | Advanced Technology Materials, Inc. | Aqueous cleaner for the removal of post-etch residues |
| US9223221B2 (en) * | 2012-03-16 | 2015-12-29 | Basf Se | Photoresist stripping and cleaning composition, method of its preparation and its use |
| CN104395989A (zh) * | 2012-05-18 | 2015-03-04 | 高级技术材料公司 | 用于改进有机残余物去除的具有低铜蚀刻速率的水性清洁溶液 |
| US9536730B2 (en) * | 2012-10-23 | 2017-01-03 | Air Products And Chemicals, Inc. | Cleaning formulations |
| KR102338550B1 (ko) | 2013-06-06 | 2021-12-14 | 엔테그리스, 아이엔씨. | 질화 티타늄의 선택적인 에칭을 위한 조성물 및 방법 |
| KR102375342B1 (ko) | 2014-05-13 | 2022-03-16 | 바스프 에스이 | Tin 풀-백 및 클리닝 조성물 |
| US10647950B2 (en) * | 2015-03-31 | 2020-05-12 | Versum Materials Us, Llc | Cleaning formulations |
| WO2018061582A1 (ja) * | 2016-09-29 | 2018-04-05 | 富士フイルム株式会社 | 処理液および積層体の処理方法 |
| CN111465716B (zh) * | 2017-12-08 | 2025-11-14 | 巴斯夫欧洲公司 | 用于在低-k材料、铜和/或钴的层的存在下选择性蚀刻包含铝化合物的层的组合物及方法 |
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2018
- 2018-12-05 CN CN201880079173.3A patent/CN111465679A/zh active Pending
- 2018-12-05 US US16/767,336 patent/US11377624B2/en active Active
- 2018-12-05 IL IL274877A patent/IL274877B2/en unknown
- 2018-12-05 EP EP18811283.3A patent/EP3720938A1/en active Pending
- 2018-12-05 WO PCT/EP2018/083684 patent/WO2019110681A1/en not_active Ceased
- 2018-12-05 JP JP2020531513A patent/JP7330972B2/ja active Active
- 2018-12-05 KR KR1020207014948A patent/KR102786662B1/ko active Active
- 2018-12-07 TW TW107144121A patent/TWI799476B/zh active