JP2009052142A5 - - Google Patents

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Publication number
JP2009052142A5
JP2009052142A5 JP2008212533A JP2008212533A JP2009052142A5 JP 2009052142 A5 JP2009052142 A5 JP 2009052142A5 JP 2008212533 A JP2008212533 A JP 2008212533A JP 2008212533 A JP2008212533 A JP 2008212533A JP 2009052142 A5 JP2009052142 A5 JP 2009052142A5
Authority
JP
Japan
Prior art keywords
anodized surface
liquid solvent
anodized
aluminum member
wet scrubbing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008212533A
Other languages
English (en)
Japanese (ja)
Other versions
JP5324160B2 (ja
JP2009052142A (ja
Filing date
Publication date
Priority claimed from US11/845,620 external-priority patent/US8231736B2/en
Application filed filed Critical
Publication of JP2009052142A publication Critical patent/JP2009052142A/ja
Publication of JP2009052142A5 publication Critical patent/JP2009052142A5/ja
Application granted granted Critical
Publication of JP5324160B2 publication Critical patent/JP5324160B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008212533A 2007-08-27 2008-08-21 陽極酸化チャンバパーツ再生のためのウェットクリーンプロセス Expired - Fee Related JP5324160B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/845,620 US8231736B2 (en) 2007-08-27 2007-08-27 Wet clean process for recovery of anodized chamber parts
US11/845,620 2007-08-27

Publications (3)

Publication Number Publication Date
JP2009052142A JP2009052142A (ja) 2009-03-12
JP2009052142A5 true JP2009052142A5 (https=) 2012-12-13
JP5324160B2 JP5324160B2 (ja) 2013-10-23

Family

ID=40070779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008212533A Expired - Fee Related JP5324160B2 (ja) 2007-08-27 2008-08-21 陽極酸化チャンバパーツ再生のためのウェットクリーンプロセス

Country Status (6)

Country Link
US (1) US8231736B2 (https=)
EP (1) EP2031088A3 (https=)
JP (1) JP5324160B2 (https=)
KR (1) KR101037530B1 (https=)
CN (1) CN101380636B (https=)
TW (1) TWI397612B (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101698941B (zh) * 2009-10-29 2012-03-21 西北锆管有限责任公司 一种降低锆合金管酸洗表面氟残留的工艺方法
KR20120137650A (ko) * 2011-06-13 2012-12-24 삼성디스플레이 주식회사 증착용 챔버의 초기화 방법, 챔버 내의 오염물 제거방법 및 챔버의 제조방법
US8545639B2 (en) * 2011-10-31 2013-10-01 Lam Research Corporation Method of cleaning aluminum plasma chamber parts
CN103794458B (zh) * 2012-10-29 2016-12-21 中微半导体设备(上海)有限公司 用于等离子体处理腔室内部的部件及制造方法
US9387521B2 (en) * 2012-12-05 2016-07-12 Lam Research Corporation Method of wet cleaning aluminum chamber parts
TWI484549B (zh) * 2013-02-08 2015-05-11 Sj High Technology Company 用於清潔半導體設備的零件之濕式清潔方法
US9624593B2 (en) * 2013-08-29 2017-04-18 Applied Materials, Inc. Anodization architecture for electro-plate adhesion
US9472416B2 (en) * 2013-10-21 2016-10-18 Applied Materials, Inc. Methods of surface interface engineering
CN106140660B (zh) * 2015-03-31 2019-01-22 北大方正集团有限公司 陶瓷件上聚合物的清洗方法及装置
US20170056935A1 (en) * 2015-08-28 2017-03-02 Applied Materials, Inc. Method for removing aluminum fluoride contamination from semiconductor processing equipment
CN105350053B (zh) * 2015-11-09 2017-08-11 广东长盈精密技术有限公司 金属外壳表面预处理方法
US20170213705A1 (en) * 2016-01-27 2017-07-27 Applied Materials, Inc. Slit valve gate coating and methods for cleaning slit valve gates
US9999907B2 (en) 2016-04-01 2018-06-19 Applied Materials, Inc. Cleaning process that precipitates yttrium oxy-flouride
US20180061617A1 (en) * 2016-08-23 2018-03-01 Applied Materials, Inc. Method to deposit aluminum oxy-fluoride layer for fast recovery of etch amount in etch chamber
CN107706089B (zh) * 2017-09-19 2020-08-11 上海华虹宏力半导体制造有限公司 铝线干法刻蚀后湿法清洗方法
JP7218201B2 (ja) * 2019-02-13 2023-02-06 アルバックテクノ株式会社 アルミニウム製部品の酸化皮膜の再生方法
CN111804674A (zh) * 2020-04-27 2020-10-23 安徽富乐德科技发展股份有限公司 一种etch设备中阳极氧化部件面污染物的洗净方法
US12100576B2 (en) * 2020-04-30 2024-09-24 Applied Materials, Inc. Metal oxide preclean chamber with improved selectivity and flow conductance
CN114395784A (zh) * 2021-11-19 2022-04-26 昆明理工大学 一种双通大面积三氧化二铝、二氧化钛或二氧化锆纳米管阵列膜及其制备方法
CN115799172B (zh) * 2023-02-08 2023-04-28 粤芯半导体技术股份有限公司 金属互连线及其制造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2431595A (en) * 1942-08-06 1947-11-25 Aluminum Co Of America Method for cleaning aluminum
US3016293A (en) * 1957-07-29 1962-01-09 Reynolds Metals Co Method of multi-coloring sealed anodized aluminum
US3652429A (en) 1967-09-08 1972-03-28 Frye Ind Inc Sealing of colored anodized aluminum
LU54741A1 (https=) * 1967-10-26 1969-06-27
US3961111A (en) * 1975-03-18 1976-06-01 Pennwalt Corporation Method of increasing corrosion resistance of anodized aluminum
US5538600A (en) * 1994-07-27 1996-07-23 Aluminum Company Of America Method for desmutting aluminum alloys having a highly-reflective surface
JPH08245986A (ja) * 1995-03-08 1996-09-24 Senken:Kk 外装材表面の洗浄方法及びそれに使用される洗浄液
US6030932A (en) 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US6140243A (en) * 1996-12-12 2000-10-31 Texas Instruments Incorporated Low temperature process for post-etch defluoridation of metals
JPH10251900A (ja) * 1997-03-12 1998-09-22 Fuji Photo Film Co Ltd アルミニウム板の粗面化方法
WO1998056726A1 (en) * 1997-06-13 1998-12-17 Cfmt, Inc. Methods for treating semiconductor wafers
US6841008B1 (en) * 2000-07-17 2005-01-11 Cypress Semiconductor Corporation Method for cleaning plasma etch chamber structures
US6450117B1 (en) * 2000-08-07 2002-09-17 Applied Materials, Inc. Directing a flow of gas in a substrate processing chamber
TW495863B (en) * 2000-08-11 2002-07-21 Chem Trace Inc System and method for cleaning semiconductor fabrication equipment
US6811615B2 (en) * 2001-05-24 2004-11-02 Applied Materials, Inc. Photo-assisted chemical cleaning and laser ablation cleaning of process chamber
JP3582502B2 (ja) * 2001-06-14 2004-10-27 松下電器産業株式会社 ドライエッチング装置のメンテナンス方法
US20030062064A1 (en) * 2001-09-28 2003-04-03 Infineon Technologies North America Corp. Method of removing PECVD residues of fluorinated plasma using in-situ H2 plasma
US20030190870A1 (en) * 2002-04-03 2003-10-09 Applied Materials, Inc. Cleaning ceramic surfaces
TW558789B (en) * 2002-05-02 2003-10-21 Hitachi High Tech Corp Semiconductor processing device and diagnostic method of semiconductor processing device
US7252718B2 (en) * 2002-05-31 2007-08-07 Ekc Technology, Inc. Forming a passivating aluminum fluoride layer and removing same for use in semiconductor manufacture
US6902628B2 (en) * 2002-11-25 2005-06-07 Applied Materials, Inc. Method of cleaning a coated process chamber component
JP2004225113A (ja) * 2003-01-23 2004-08-12 Kobe Steel Ltd 耐腐食性及び耐プラズマ性に優れたＡｌ合金部材
JP2005167087A (ja) * 2003-12-04 2005-06-23 Tokyo Electron Ltd クリーニング方法及び半導体製造装置

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