JP2021503482A5 - - Google Patents
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- JP2021503482A5 JP2021503482A5 JP2020527805A JP2020527805A JP2021503482A5 JP 2021503482 A5 JP2021503482 A5 JP 2021503482A5 JP 2020527805 A JP2020527805 A JP 2020527805A JP 2020527805 A JP2020527805 A JP 2020527805A JP 2021503482 A5 JP2021503482 A5 JP 2021503482A5
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- JP
- Japan
- Prior art keywords
- carbon atoms
- combination
- butyl
- group
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000000217 alkyl group Chemical group 0.000 claims 12
- 125000004432 carbon atom Chemical group C* 0.000 claims 12
- 239000000203 mixture Substances 0.000 claims 10
- 238000000034 method Methods 0.000 claims 9
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 239000003960 organic solvent Substances 0.000 claims 5
- 230000005855 radiation Effects 0.000 claims 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- UOCJDOLVGGIYIQ-PBFPGSCMSA-N cefatrizine Chemical group S([C@@H]1[C@@H](C(N1C=1C(O)=O)=O)NC(=O)[C@H](N)C=2C=CC(O)=CC=2)CC=1CSC=1C=NNN=1 UOCJDOLVGGIYIQ-PBFPGSCMSA-N 0.000 claims 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 3
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 claims 3
- 125000000962 organic group Chemical group 0.000 claims 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 2
- 239000003446 ligand Substances 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 125000002524 organometallic group Chemical group 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024075585A JP2024122972A (ja) | 2017-11-20 | 2024-05-08 | 有機スズクラスター、有機スズクラスターの溶液、及び高解像度パターン形成への適用 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762588546P | 2017-11-20 | 2017-11-20 | |
| US62/588,546 | 2017-11-20 | ||
| PCT/US2018/061769 WO2019099981A2 (en) | 2017-11-20 | 2018-11-19 | Organotin clusters, solutions of organotin clusters, and application to high resolution patterning |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024075585A Division JP2024122972A (ja) | 2017-11-20 | 2024-05-08 | 有機スズクラスター、有機スズクラスターの溶液、及び高解像度パターン形成への適用 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021503482A JP2021503482A (ja) | 2021-02-12 |
| JP2021503482A5 true JP2021503482A5 (https=) | 2021-07-29 |
| JP7487103B2 JP7487103B2 (ja) | 2024-05-20 |
Family
ID=66534919
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020527805A Active JP7487103B2 (ja) | 2017-11-20 | 2018-11-19 | 有機スズクラスター、有機スズクラスターの溶液、及び高解像度パターン形成への適用 |
| JP2024075585A Pending JP2024122972A (ja) | 2017-11-20 | 2024-05-08 | 有機スズクラスター、有機スズクラスターの溶液、及び高解像度パターン形成への適用 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024075585A Pending JP2024122972A (ja) | 2017-11-20 | 2024-05-08 | 有機スズクラスター、有機スズクラスターの溶液、及び高解像度パターン形成への適用 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US11098070B2 (https=) |
| JP (2) | JP7487103B2 (https=) |
| KR (3) | KR102918243B1 (https=) |
| TW (2) | TWI719360B (https=) |
| WO (1) | WO2019099981A2 (https=) |
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| TWI814552B (zh) * | 2018-04-05 | 2023-09-01 | 美商英培雅股份有限公司 | 錫十二聚物及具有強ｅｕｖ吸收的輻射可圖案化塗層 |
| US10787466B2 (en) * | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| JP2023539735A (ja) * | 2020-08-25 | 2023-09-19 | インプリア・コーポレイション | 反応物の供給に好都合な配位子を持つ有機スズ組成物の製造方法 |
| EP4430053A4 (en) * | 2021-11-08 | 2026-01-07 | Inpria Corp | ORGANOSTANNIC PHOTORESIN COMPOSITIONS WITH IMPROVED STABILITY |
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2018
- 2018-11-19 KR KR1020247003859A patent/KR102918243B1/ko active Active
- 2018-11-19 JP JP2020527805A patent/JP7487103B2/ja active Active
- 2018-11-19 WO PCT/US2018/061769 patent/WO2019099981A2/en not_active Ceased
- 2018-11-19 KR KR1020267002014A patent/KR20260027285A/ko active Pending
- 2018-11-19 TW TW107141012A patent/TWI719360B/zh active
- 2018-11-19 US US16/194,491 patent/US11098070B2/en active Active
- 2018-11-19 KR KR1020207012752A patent/KR102634520B1/ko active Active
- 2018-11-19 TW TW110101710A patent/TWI803806B/zh active
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2021
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2024
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