JP2021028945A - 樹脂シートの剥離方法 - Google Patents
樹脂シートの剥離方法 Download PDFInfo
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- JP2021028945A JP2021028945A JP2019147654A JP2019147654A JP2021028945A JP 2021028945 A JP2021028945 A JP 2021028945A JP 2019147654 A JP2019147654 A JP 2019147654A JP 2019147654 A JP2019147654 A JP 2019147654A JP 2021028945 A JP2021028945 A JP 2021028945A
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- resin sheet
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- 229920005989 resin Polymers 0.000 title claims abstract description 175
- 239000011347 resin Substances 0.000 title claims abstract description 175
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000010438 heat treatment Methods 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims description 23
- 239000012790 adhesive layer Substances 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
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- 239000003292 glue Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 210000000078 claw Anatomy 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1153—Temperature change for delamination [e.g., heating during delaminating, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1911—Heating or cooling delaminating means [e.g., melting means, freezing means, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Abstract
Description
実施形態に係る樹脂シート18の剥離方法を図面に基づいて説明する。まず、実施形態に係る樹脂シート18の剥離方法で用いられるシート付き板状物20の構成について説明する。図1は、実施形態に係る樹脂シート18の剥離方法で用いられるシート付き板状物20の分解斜視図である。図2は、図1に示されたシート付き板状物20の斜視図である。図3は、図2の一部を拡大して示す断面図である。シート付き板状物20は、板状物10と樹脂シート18とを備える。
12 表面
15 裏面
18 樹脂シート
19 貼着面
20 シート付き板状物
21 剥離起点
50 ヒートテーブル
55 テーブル
57 温風ドライヤー
60 除去ユニット
65 エア噴射ユニット
70 剥離用テープ
72 除去ユニット
ST1 樹脂シート加熱ステップ
ST2 樹脂シート除去ステップ
Claims (4)
- 樹脂シートが貼着した板状物から樹脂シートを剥離する樹脂シートの剥離方法であって、
樹脂シートが貼着した板状物の該樹脂シートの端部を加熱して、該樹脂シートを端部から捲り上がらせて剥離起点を形成する樹脂シート加熱ステップと、
該剥離起点から該樹脂シートを剥離して板状物から該樹脂シートを除去する樹脂シート除去ステップと、
を備える樹脂シートの剥離方法。 - 該樹脂シートは、粘着材層の無い樹脂シートである請求項1に記載の樹脂シートの剥離方法。
- 該樹脂シートは、板状物に貼着した領域に粘着材層の無い領域を有する請求項1に記載の樹脂シートの剥離方法。
- 該樹脂シート加熱ステップでは、板状物を介して樹脂シートを加熱する請求項1乃至3のいずれか1項に記載の樹脂シートの剥離方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019147654A JP7382171B2 (ja) | 2019-08-09 | 2019-08-09 | 樹脂シートの剥離方法 |
KR1020200086501A KR20210018047A (ko) | 2019-08-09 | 2020-07-14 | 수지 시트의 박리 방법 |
TW109124982A TWI846913B (zh) | 2019-08-09 | 2020-07-23 | 樹脂片材之剝離方法 |
SG10202007175UA SG10202007175UA (en) | 2019-08-09 | 2020-07-27 | Peeling method of resin sheet |
MYPI2020003900A MY195569A (en) | 2019-08-09 | 2020-07-28 | Peeling Method of Resin Sheet |
CN202010772205.7A CN112349647A (zh) | 2019-08-09 | 2020-08-04 | 树脂片的剥离方法 |
US16/984,350 US11090921B2 (en) | 2019-08-09 | 2020-08-04 | Peeling method of resin sheet |
DE102020209953.7A DE102020209953A1 (de) | 2019-08-09 | 2020-08-06 | Ablöseverfahren für eine kunststofffolie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019147654A JP7382171B2 (ja) | 2019-08-09 | 2019-08-09 | 樹脂シートの剥離方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021028945A true JP2021028945A (ja) | 2021-02-25 |
JP7382171B2 JP7382171B2 (ja) | 2023-11-16 |
Family
ID=74188661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019147654A Active JP7382171B2 (ja) | 2019-08-09 | 2019-08-09 | 樹脂シートの剥離方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US11090921B2 (ja) |
JP (1) | JP7382171B2 (ja) |
KR (1) | KR20210018047A (ja) |
CN (1) | CN112349647A (ja) |
DE (1) | DE102020209953A1 (ja) |
MY (1) | MY195569A (ja) |
SG (1) | SG10202007175UA (ja) |
TW (1) | TWI846913B (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009125941A (ja) * | 2007-11-19 | 2009-06-11 | Nitto Denko Corp | 樹脂積層体、粘着シート、該粘着シートを用いた被着体の加工方法、及びその剥離装置 |
JP2016039260A (ja) * | 2014-08-07 | 2016-03-22 | リンテック株式会社 | シート剥離装置および剥離方法並びに剥離開始部形成装置 |
JP2018190937A (ja) * | 2017-05-11 | 2018-11-29 | 株式会社ディスコ | ウェーハの加工方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4565804B2 (ja) * | 2002-06-03 | 2010-10-20 | スリーエム イノベイティブ プロパティズ カンパニー | 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置 |
JP2011054641A (ja) * | 2009-08-31 | 2011-03-17 | Nitto Denko Corp | 被切断体からのダイシング表面保護テープの剥離除去方法 |
JP5558244B2 (ja) | 2010-07-22 | 2014-07-23 | 株式会社ディスコ | テープ剥離装置 |
US9778618B2 (en) * | 2014-04-18 | 2017-10-03 | Dupont Authentication Inc. | Multilayer film and authentication label |
-
2019
- 2019-08-09 JP JP2019147654A patent/JP7382171B2/ja active Active
-
2020
- 2020-07-14 KR KR1020200086501A patent/KR20210018047A/ko active Search and Examination
- 2020-07-23 TW TW109124982A patent/TWI846913B/zh active
- 2020-07-27 SG SG10202007175UA patent/SG10202007175UA/en unknown
- 2020-07-28 MY MYPI2020003900A patent/MY195569A/en unknown
- 2020-08-04 US US16/984,350 patent/US11090921B2/en active Active
- 2020-08-04 CN CN202010772205.7A patent/CN112349647A/zh active Pending
- 2020-08-06 DE DE102020209953.7A patent/DE102020209953A1/de active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009125941A (ja) * | 2007-11-19 | 2009-06-11 | Nitto Denko Corp | 樹脂積層体、粘着シート、該粘着シートを用いた被着体の加工方法、及びその剥離装置 |
JP2016039260A (ja) * | 2014-08-07 | 2016-03-22 | リンテック株式会社 | シート剥離装置および剥離方法並びに剥離開始部形成装置 |
JP2018190937A (ja) * | 2017-05-11 | 2018-11-29 | 株式会社ディスコ | ウェーハの加工方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102020209953A1 (de) | 2021-02-11 |
MY195569A (en) | 2023-02-02 |
TWI846913B (zh) | 2024-07-01 |
TW202107557A (zh) | 2021-02-16 |
KR20210018047A (ko) | 2021-02-17 |
SG10202007175UA (en) | 2021-03-30 |
US20210039377A1 (en) | 2021-02-11 |
CN112349647A (zh) | 2021-02-09 |
JP7382171B2 (ja) | 2023-11-16 |
US11090921B2 (en) | 2021-08-17 |
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