JP2020513392A5 - - Google Patents
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- JP2020513392A5 JP2020513392A5 JP2019528733A JP2019528733A JP2020513392A5 JP 2020513392 A5 JP2020513392 A5 JP 2020513392A5 JP 2019528733 A JP2019528733 A JP 2019528733A JP 2019528733 A JP2019528733 A JP 2019528733A JP 2020513392 A5 JP2020513392 A5 JP 2020513392A5
- Authority
- JP
- Japan
- Prior art keywords
- sih
- free
- containing film
- composition
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000203 mixture Substances 0.000 claims description 81
- 239000002904 solvent Substances 0.000 claims description 32
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 8
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000008096 xylene Substances 0.000 claims description 5
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 claims description 4
- SFAMKDPMPDEXGH-UHFFFAOYSA-N 2-hydroxyethyl propanoate Chemical compound CCC(=O)OCCO SFAMKDPMPDEXGH-UHFFFAOYSA-N 0.000 claims description 4
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 150000002148 esters Chemical class 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 2
- -1 mesitylenne Natural products 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000003618 dip coating Methods 0.000 claims 1
- 238000004528 spin coating Methods 0.000 claims 1
- 238000001039 wet etching Methods 0.000 claims 1
- LGCMKPRGGJRYGM-UHFFFAOYSA-N Osalmid Chemical compound C1=CC(O)=CC=C1NC(=O)C1=CC=CC=C1O LGCMKPRGGJRYGM-UHFFFAOYSA-N 0.000 description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000007806 chemical reaction intermediate Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- YSCFTYILLCWAFW-UHFFFAOYSA-N [SiH3]N([SiH3])[SiH2]N([SiH3])[SiH3] Chemical compound [SiH3]N([SiH3])[SiH2]N([SiH3])[SiH3] YSCFTYILLCWAFW-UHFFFAOYSA-N 0.000 description 1
- VOSJXMPCFODQAR-UHFFFAOYSA-N ac1l3fa4 Chemical compound [SiH3]N([SiH3])[SiH3] VOSJXMPCFODQAR-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022039332A JP7390421B2 (ja) | 2016-12-11 | 2022-03-14 | コーティング組成物、および基板上へのＳｉ含有膜の形成方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662432592P | 2016-12-11 | 2016-12-11 | |
| US62/432,592 | 2016-12-11 | ||
| US15/661,412 | 2017-07-27 | ||
| US15/661,412 US10647578B2 (en) | 2016-12-11 | 2017-07-27 | N—H free and SI-rich per-hydridopolysilzane compositions, their synthesis, and applications |
| PCT/US2017/065581 WO2018107155A1 (en) | 2016-12-11 | 2017-12-11 | N-h free and si-rich perhydridopolysilzane compositions, their synthesis, and applications |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022039332A Division JP7390421B2 (ja) | 2016-12-11 | 2022-03-14 | コーティング組成物、および基板上へのＳｉ含有膜の形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020513392A JP2020513392A (ja) | 2020-05-14 |
| JP2020513392A5 true JP2020513392A5 (https=) | 2021-01-14 |
| JP7198751B2 JP7198751B2 (ja) | 2023-01-04 |
Family
ID=61559420
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019528733A Active JP7198751B2 (ja) | 2016-12-11 | 2017-12-11 | Ｎ－Ｈを含まず、Ｃを含まず、かつＳｉを多く含むペルヒドロポリシラザン、その合成、および利用 |
| JP2022039332A Active JP7390421B2 (ja) | 2016-12-11 | 2022-03-14 | コーティング組成物、および基板上へのＳｉ含有膜の形成方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022039332A Active JP7390421B2 (ja) | 2016-12-11 | 2022-03-14 | コーティング組成物、および基板上へのＳｉ含有膜の形成方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US10647578B2 (https=) |
| EP (2) | EP4293085A3 (https=) |
| JP (2) | JP7198751B2 (https=) |
| KR (1) | KR102571297B1 (https=) |
| CN (1) | CN110023235A (https=) |
| FI (1) | FI3551579T3 (https=) |
| SG (1) | SG10202105785RA (https=) |
| TW (2) | TWI783956B (https=) |
| WO (1) | WO2018107155A1 (https=) |
Families Citing this family (16)
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| US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
| US11124876B2 (en) | 2015-03-30 | 2021-09-21 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
| WO2017106632A1 (en) * | 2015-12-18 | 2017-06-22 | Dow Corning Corporation | Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane |
| US10654070B2 (en) * | 2016-03-31 | 2020-05-19 | Lg Chem, Ltd. | Method for preparing a barrier film |
| US11739220B2 (en) | 2018-02-21 | 2023-08-29 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Perhydropolysilazane compositions and methods for forming oxide films using same |
| TWI793262B (zh) * | 2018-02-21 | 2023-02-21 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 全氫聚矽氮烷組成物和用於使用其形成氮化物膜之方法 |
| US11450526B2 (en) | 2018-05-30 | 2022-09-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Cyclic spin-on coating process for forming dielectric material |
| CN109470793A (zh) * | 2018-12-21 | 2019-03-15 | 中国兵器工业第五九研究所 | 电子元器件灌封胶贮存环境损伤机理分析方法 |
| TW202225282A (zh) * | 2020-10-02 | 2022-07-01 | 德商默克專利有限公司 | 聚矽氮烷、包含其之矽質膜形成組成物及使用其製造矽質膜的方法 |
| KR20240110961A (ko) * | 2021-11-15 | 2024-07-16 | 버슘머트리얼즈 유에스, 엘엘씨 | 다층 질화규소 필름 |
| CN118239694B (zh) * | 2022-12-22 | 2025-04-29 | 江苏菲沃泰纳米科技股份有限公司 | 一种亲水涂层、制备方法及器件 |
| KR20260013998A (ko) * | 2023-05-25 | 2026-01-29 | 메르크 파텐트 게엠베하 | 실리콘 함유 컨포멀 경화막을 제조하는 방법 |
| CN116854920A (zh) * | 2023-08-16 | 2023-10-10 | 库贝化学（上海）有限公司 | 全氢聚硅氮烷树脂及其制备方法 |
| KR102907433B1 (ko) * | 2023-09-27 | 2026-01-06 | (주)세경하이테크 | 반사 방지용 코팅 조성물 및 이의 제조방법 |
| CN119661856A (zh) * | 2025-02-21 | 2025-03-21 | 库贝化学（上海）有限公司 | 甲酰氧基聚硅氮烷、其制备方法及应用 |
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| KR102326396B1 (ko) | 2013-09-27 | 2021-11-12 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 아민 치환된 트리실릴아민 및 트리디실릴아민 화합물 |
| US10186698B2 (en) | 2013-12-04 | 2019-01-22 | Cornell University | Ceramic-polymer hybrid nanostructures, methods for producing and applications thereof |
| JP6104785B2 (ja) | 2013-12-09 | 2017-03-29 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | ペルヒドロポリシラザン、およびそれを含む組成物、ならびにそれを用いたシリカ質膜の形成方法 |
| EP3135711B1 (en) | 2014-04-24 | 2021-07-07 | Merck Patent GmbH | Copolymerized polysilazane, manufacturing method therefor, composition comprising same, and method for forming siliceous film using same |
| WO2016065239A1 (en) | 2014-10-23 | 2016-04-28 | Massachusetts Institute Of Technology | Purification of ultra-high saline and contaminated water by multi-stage ion concentration polarization (icp) desalination |
| SG11201703195QA (en) * | 2014-10-24 | 2017-05-30 | Versum Materials Us Llc | Compositions and methods using same for deposition of silicon-containing film |
| KR101837971B1 (ko) | 2014-12-19 | 2018-03-13 | 삼성에스디아이 주식회사 | 실리카계 막 형성용 조성물, 실리카계 막, 및 전자 디바이스 |
| JP2016159561A (ja) | 2015-03-04 | 2016-09-05 | 三菱瓦斯化学株式会社 | ガスバリア用フィルム |
| US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
| US10192734B2 (en) | 2016-12-11 | 2019-01-29 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploration des Procédés Georges Claude | Short inorganic trisilylamine-based polysilazanes for thin film deposition |
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2017
- 2017-07-27 US US15/661,412 patent/US10647578B2/en active Active
- 2017-12-08 TW TW106143177A patent/TWI783956B/zh active
- 2017-12-08 TW TW110130157A patent/TWI792496B/zh active
- 2017-12-11 FI FIEP17878389.0T patent/FI3551579T3/fi active
- 2017-12-11 SG SG10202105785RA patent/SG10202105785RA/en unknown
- 2017-12-11 WO PCT/US2017/065581 patent/WO2018107155A1/en not_active Ceased
- 2017-12-11 EP EP23200460.6A patent/EP4293085A3/en active Pending
- 2017-12-11 EP EP17878389.0A patent/EP3551579B1/en active Active
- 2017-12-11 JP JP2019528733A patent/JP7198751B2/ja active Active
- 2017-12-11 CN CN201780073849.3A patent/CN110023235A/zh active Pending
- 2017-12-11 KR KR1020197018639A patent/KR102571297B1/ko active Active
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2020
- 2020-03-11 US US16/815,646 patent/US11203528B2/en active Active
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2022
- 2022-03-14 JP JP2022039332A patent/JP7390421B2/ja active Active
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