SG10202105785RA - N-h free and si-rich perhydropolysilazane compositions, their synthesis, and applications - Google Patents

N-h free and si-rich perhydropolysilazane compositions, their synthesis, and applications

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Publication number
SG10202105785RA
SG10202105785RA SG10202105785RA SG10202105785RA SG10202105785RA SG 10202105785R A SG10202105785R A SG 10202105785RA SG 10202105785R A SG10202105785R A SG 10202105785RA SG 10202105785R A SG10202105785R A SG 10202105785RA SG 10202105785R A SG10202105785R A SG 10202105785RA
Authority
SG
Singapore
Prior art keywords
synthesis
applications
free
rich perhydropolysilazane
compositions
Prior art date
Application number
SG10202105785RA
Other languages
English (en)
Inventor
Antonio Sanchez
Gennadiy Itov
Manish Khandelwal
Cole Ritter
Peng Zhang
Jean-Marc Girard
Zhiwen Wan
Glenn Kuchenbeiser
David Orban
Sean Kerrigan
Reno Pesaresi
Matthew Damien Stephens
Yang Wang
Guillaume Husson
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of SG10202105785RA publication Critical patent/SG10202105785RA/en

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    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
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    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
    • H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
    • H10P14/6687—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and nitrogen
    • H10P14/6689—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and nitrogen the compound being a silazane
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H10P14/6927—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being a silicon oxynitride, e.g. SiON or SiON:H

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SG10202105785RA 2016-12-11 2017-12-11 N-h free and si-rich perhydropolysilazane compositions, their synthesis, and applications SG10202105785RA (en)

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EP3551579A4 (en) 2020-07-29
JP7198751B2 (ja) 2023-01-04
EP3551579A1 (en) 2019-10-16
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US10647578B2 (en) 2020-05-12
US20180072571A1 (en) 2018-03-15
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