JP2020501375A - 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム - Google Patents
導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム Download PDFInfo
- Publication number
- JP2020501375A JP2020501375A JP2019531090A JP2019531090A JP2020501375A JP 2020501375 A JP2020501375 A JP 2020501375A JP 2019531090 A JP2019531090 A JP 2019531090A JP 2019531090 A JP2019531090 A JP 2019531090A JP 2020501375 A JP2020501375 A JP 2020501375A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- material layer
- conductive
- etching
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/068—Apparatus for etching printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1163—Chemical reaction, e.g. heating solder by exothermic reaction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1184—Underetching, e.g. etching of substrate under conductors or etching of conductor under dielectrics; Means for allowing or controlling underetching
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023111882A JP2023139049A (ja) | 2016-12-12 | 2023-07-07 | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662432710P | 2016-12-12 | 2016-12-12 | |
| US62/432,710 | 2016-12-12 | ||
| US15/835,116 | 2017-12-07 | ||
| US15/835,116 US10398034B2 (en) | 2016-12-12 | 2017-12-07 | Methods of etching conductive features, and related devices and systems |
| PCT/IL2017/051338 WO2018109762A1 (en) | 2016-12-12 | 2017-12-11 | Methods of etching conductive features, and related devices and systems |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023111882A Division JP2023139049A (ja) | 2016-12-12 | 2023-07-07 | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020501375A true JP2020501375A (ja) | 2020-01-16 |
| JP2020501375A5 JP2020501375A5 (https=) | 2021-01-28 |
Family
ID=62558108
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019531090A Pending JP2020501375A (ja) | 2016-12-12 | 2017-12-11 | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
| JP2023111882A Pending JP2023139049A (ja) | 2016-12-12 | 2023-07-07 | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023111882A Pending JP2023139049A (ja) | 2016-12-12 | 2023-07-07 | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10398034B2 (https=) |
| EP (1) | EP3551781B1 (https=) |
| JP (2) | JP2020501375A (https=) |
| KR (1) | KR20190093576A (https=) |
| CN (1) | CN110249075A (https=) |
| WO (1) | WO2018109762A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023059886A (ja) * | 2019-02-14 | 2023-04-27 | オルボテック リミテッド | 高密度導体を有するpcb製品を調製するための装置及び感光性インク |
| JP2023139049A (ja) * | 2016-12-12 | 2023-10-03 | カティーバ, インコーポレイテッド | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
| US12270111B2 (en) | 2015-08-13 | 2025-04-08 | Kateeva, Inc. | Methods for producing an etch resist pattern on a metallic surface |
| US12414239B2 (en) | 2015-06-04 | 2025-09-09 | Kateeva, Inc. | Methods for producing an etch resist pattern on a metallic surface |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220127272A (ko) * | 2020-01-13 | 2022-09-19 | 카티바, 인크. | 잉크젯 인쇄 회로 기판 |
| US11963300B2 (en) | 2020-08-14 | 2024-04-16 | Au Optronics Corporation | Panel device and manufacturing method of panel device |
| DE102021122646A1 (de) * | 2021-09-01 | 2023-03-02 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Komponententräger-Ätzsystem mit physisch getrennten Äzmodulen und Komponententräger |
| TWI849785B (zh) | 2023-03-08 | 2024-07-21 | 友達光電股份有限公司 | 電路裝置 |
| CN118612936B (zh) * | 2024-06-21 | 2024-12-06 | 南华大学 | 一种可拉伸的金属基电/热导件 |
| CN119603888B (zh) * | 2024-12-18 | 2025-09-23 | 西安电子科技大学 | 一种面向曲面电路三维打印的基材表面改性与附着力增强方法 |
| CN120512823B (zh) * | 2025-05-29 | 2026-04-07 | 都看(江苏)数码科技有限公司 | 基于喷墨掩模的陶瓷电路板高精度蚀刻方法及设备 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009272609A (ja) * | 2008-05-09 | 2009-11-19 | Samsung Electro Mech Co Ltd | インクジェット吐出装置 |
| JP2011243256A (ja) * | 2010-05-19 | 2011-12-01 | Dainippon Printing Co Ltd | サスペンション用フレキシャー基板、サスペンション、ヘッド付サスペンション、およびハードディスクドライブ |
| JP2015129342A (ja) * | 2013-12-06 | 2015-07-16 | メック株式会社 | エッチング液、補給液及び銅配線の形成方法 |
| JP2015227499A (ja) * | 2014-06-03 | 2015-12-17 | 四国化成工業株式会社 | エッチングレジスト材およびプリント配線板の製造方法 |
| WO2016193978A2 (en) * | 2015-06-04 | 2016-12-08 | Jet Cu Pcb Ltd. | Methods for producing an etch resist pattern on a metallic surface |
Family Cites Families (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4015706A (en) | 1971-11-15 | 1977-04-05 | Chemcut Corporation | Connecting modules for an etching system |
| US4127438A (en) | 1977-11-07 | 1978-11-28 | International Business Machines Corporation | Adhesion promoter for additively plated printed circuit boards |
| DE3402883A1 (de) | 1984-01-27 | 1985-08-01 | Siemens AG, 1000 Berlin und 8000 München | Leiterplatten aus schichtpressstoffen |
| DE3683194D1 (de) * | 1985-06-07 | 1992-02-13 | Sekisui Chemical Co Ltd | Photovernetzbare zusammensetzung. |
| US4946711A (en) | 1987-10-14 | 1990-08-07 | Desoto, Inc. | Masking compositions and method for applying the same |
| JP2585070B2 (ja) | 1988-08-02 | 1997-02-26 | 日本ペイント株式会社 | 画像形成方法 |
| EP0563251A1 (en) | 1990-12-20 | 1993-10-06 | Exxon Chemical Patents Inc. | Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications |
| GB9425031D0 (en) | 1994-12-09 | 1995-02-08 | Alpha Metals Ltd | Printed circuit board manufacture |
| EP0753989B1 (en) | 1995-07-11 | 2005-09-21 | Delphi Technologies, Inc. | Coatings and methods, especially for circuit boards |
| DE69800652T2 (de) | 1997-02-25 | 2001-08-23 | E.I. Du Pont De Nemours And Co., Wilmington | Flexible, flammhemmende fotopolymerisierbare Zusammensetzung zur Beschichtung von Leiterplatten |
| US6222136B1 (en) | 1997-11-12 | 2001-04-24 | International Business Machines Corporation | Printed circuit board with continuous connective bumps |
| IL129307A0 (en) | 1999-04-04 | 2000-02-17 | Scitex Corp Ltd | Process for direct digital printing of circuit boards |
| GB9916060D0 (en) | 1999-07-08 | 1999-09-08 | Isis Innovation | Printed circuit fabrication |
| ATE326354T1 (de) | 1999-07-30 | 2006-06-15 | Seiko Epson Corp | Aufzeichnungsverfahren mit der verwendung eines aufzeichnungsmediums und eines druckverfahrens mit zwei flüssigkomponenten darauf |
| US6399273B1 (en) | 1999-08-13 | 2002-06-04 | Board Of Regents, University Of Texas System | Water-processable photoresist compositions |
| DE60103529T2 (de) | 2000-03-29 | 2005-06-02 | Kanagawa University, Yokohama | Durch licht und wärme aushärtbare harzzusammensetzung, aus dieser hergestellte lichtempfindliche trockenfolie und verfahren zur bildung eines musters damit |
| DE10066028C2 (de) | 2000-07-07 | 2003-04-24 | Atotech Deutschland Gmbh | Kupfersubstrat mit aufgerauhten Oberflächen |
| JP3754303B2 (ja) | 2001-02-16 | 2006-03-08 | 株式会社日立インフォメーションテクノロジー | Sdramリフレッシュ回路 |
| JP2006517004A (ja) | 2001-08-31 | 2006-07-13 | セミトゥール・インコーポレイテッド | 電気泳動エマルジョン付着装置及び方法 |
| US6709962B2 (en) | 2002-03-19 | 2004-03-23 | N. Edward Berg | Process for manufacturing printed circuit boards |
| US20030177639A1 (en) | 2002-03-19 | 2003-09-25 | Berg N. Edward | Process and apparatus for manufacturing printed circuit boards |
| GB0221891D0 (en) | 2002-09-20 | 2002-10-30 | Avecia Ltd | Process |
| TWI291726B (en) | 2002-10-25 | 2007-12-21 | Nanya Technology Corp | Process for etching metal layer |
| US7005241B2 (en) * | 2003-06-09 | 2006-02-28 | Shinko Electric Industries Co., Ltd. | Process for making circuit board or lead frame |
| US7477627B2 (en) | 2003-09-10 | 2009-01-13 | Intel Corporation | Method and device of adaptive control of data rate, fragmentation and request to send protection in wireless networks |
| US7445697B2 (en) | 2003-10-22 | 2008-11-04 | Nexx Systems, Inc. | Method and apparatus for fluid processing a workpiece |
| GB0324947D0 (en) | 2003-10-25 | 2003-11-26 | Avecia Ltd | Process |
| US20060207888A1 (en) * | 2003-12-29 | 2006-09-21 | Taylor E J | Electrochemical etching of circuitry for high density interconnect electronic modules |
| EP1643817A4 (en) * | 2004-03-03 | 2010-04-21 | Ibiden Co Ltd | RESIN SOLUTION, PAINT PROCESSING AND PCB |
| KR100585138B1 (ko) | 2004-04-08 | 2006-05-30 | 삼성전자주식회사 | 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴을 가지는 반도체 소자의 제조 방법 |
| US20050250052A1 (en) | 2004-05-10 | 2005-11-10 | Nguyen Khe C | Maskless lithography using UV absorbing nano particle |
| JP4731135B2 (ja) * | 2004-07-02 | 2011-07-20 | ルネサスエレクトロニクス株式会社 | 微細パターン形成材料を用いた電子デバイス装置の製造方法 |
| GB0414840D0 (en) | 2004-07-02 | 2004-08-04 | Ncr Int Inc | Self-service terminal |
| KR100733920B1 (ko) | 2004-09-17 | 2007-07-02 | 주식회사 엘지화학 | 에칭 레지스트용 잉크 조성물, 이를 이용한 에칭 레지스트패턴 형성 방법 및 미세 유로 형성 방법 |
| JP2009506187A (ja) | 2005-08-31 | 2009-02-12 | プリンター リミテッド | Uv硬化可能なハイブリッド硬化インクジェットインク組成物およびそれを使用するソルダマスク |
| US20070237899A1 (en) | 2006-04-05 | 2007-10-11 | David Sawoska | Process for creating a pattern on a copper surface |
| US20080308003A1 (en) | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5454834B2 (ja) | 2007-08-30 | 2014-03-26 | 日立化成株式会社 | 粗化処理装置 |
| JP2009158593A (ja) | 2007-12-25 | 2009-07-16 | Tessera Interconnect Materials Inc | バンプ構造およびその製造方法 |
| WO2009116401A1 (ja) | 2008-03-17 | 2009-09-24 | 日立化成工業株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、ソルダーレジスト及びプリント配線板 |
| EP2562599B1 (en) | 2009-01-29 | 2014-12-10 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
| KR20140130234A (ko) | 2010-11-17 | 2014-11-07 | 히타치가세이가부시끼가이샤 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
| US20120288683A1 (en) | 2011-05-10 | 2012-11-15 | Chin-Te Kuo | Protuberant structure and method for making the same |
| EP2729595B1 (en) | 2011-07-07 | 2017-02-01 | ATOTECH Deutschland GmbH | Method for providing organic resist adhesion to a copper or copper alloy surface |
| US9352544B2 (en) | 2011-08-24 | 2016-05-31 | Digiflex Ltd. | Process for dry-coating flexographic surfaces |
| WO2013030931A1 (ja) | 2011-08-29 | 2013-03-07 | 日本碍子株式会社 | 積層焼結セラミック配線基板、及び当該配線基板を含む半導体パッケージ |
| JP2013112882A (ja) * | 2011-11-30 | 2013-06-10 | Kanto Chem Co Inc | TiおよびTi合金層を有する金属積層膜一括エッチング液組成物 |
| BR112014016337A8 (pt) | 2012-01-31 | 2017-07-04 | Agfa Gevaert | impressão com tinta a jato de tinta curável por radiação e resistente ao ataque químico |
| KR20140049358A (ko) * | 2012-10-17 | 2014-04-25 | 삼성전기주식회사 | 드라이필름 레지스트 시트 및 제조방법 |
| US20140252571A1 (en) | 2013-03-06 | 2014-09-11 | Maxim Integrated Products, Inc. | Wafer-level package mitigated undercut |
| EP3104398B1 (en) | 2013-12-06 | 2020-03-11 | Fujifilm Electronic Materials USA, Inc. | Cleaning formulation and method for removing residues on surfaces |
| TWI500806B (zh) | 2014-03-10 | 2015-09-21 | Nat Univ Tsing Hua | 碳化矽薄膜的製造方法 |
| KR20150109932A (ko) | 2014-03-21 | 2015-10-02 | 삼성전기주식회사 | 에칭액 조성물 및 이를 이용한 회로 패턴의 제조방법 |
| BR112017002878A2 (pt) | 2014-08-15 | 2017-12-05 | Pneumrx Inc | distribuição coordenada de tratamento de copd |
| WO2016039259A1 (ja) | 2014-09-08 | 2016-03-17 | 国立大学法人九州大学 | 有機マイクロディスク構造体の製造方法 |
| US9324669B2 (en) * | 2014-09-12 | 2016-04-26 | International Business Machines Corporation | Use of electrolytic plating to control solder wetting |
| GB2538522B (en) | 2015-05-19 | 2019-03-06 | Dst Innovations Ltd | Electronic circuit and component construction |
| WO2017025949A1 (en) | 2015-08-13 | 2017-02-16 | Jet Cu Pcb Ltd. | Methods for producing an etch resist pattern on a metallic surface |
| US10398034B2 (en) * | 2016-12-12 | 2019-08-27 | Kateeva, Inc. | Methods of etching conductive features, and related devices and systems |
-
2017
- 2017-12-07 US US15/835,116 patent/US10398034B2/en active Active
- 2017-12-11 JP JP2019531090A patent/JP2020501375A/ja active Pending
- 2017-12-11 EP EP17880261.7A patent/EP3551781B1/en active Active
- 2017-12-11 CN CN201780086295.0A patent/CN110249075A/zh active Pending
- 2017-12-11 KR KR1020197016384A patent/KR20190093576A/ko not_active Ceased
- 2017-12-11 WO PCT/IL2017/051338 patent/WO2018109762A1/en not_active Ceased
-
2019
- 2019-07-10 US US16/507,358 patent/US11006528B2/en active Active
-
2021
- 2021-04-02 US US17/301,459 patent/US11425822B2/en active Active
-
2023
- 2023-07-07 JP JP2023111882A patent/JP2023139049A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009272609A (ja) * | 2008-05-09 | 2009-11-19 | Samsung Electro Mech Co Ltd | インクジェット吐出装置 |
| JP2011243256A (ja) * | 2010-05-19 | 2011-12-01 | Dainippon Printing Co Ltd | サスペンション用フレキシャー基板、サスペンション、ヘッド付サスペンション、およびハードディスクドライブ |
| JP2015129342A (ja) * | 2013-12-06 | 2015-07-16 | メック株式会社 | エッチング液、補給液及び銅配線の形成方法 |
| JP2015227499A (ja) * | 2014-06-03 | 2015-12-17 | 四国化成工業株式会社 | エッチングレジスト材およびプリント配線板の製造方法 |
| WO2016193978A2 (en) * | 2015-06-04 | 2016-12-08 | Jet Cu Pcb Ltd. | Methods for producing an etch resist pattern on a metallic surface |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12414239B2 (en) | 2015-06-04 | 2025-09-09 | Kateeva, Inc. | Methods for producing an etch resist pattern on a metallic surface |
| US12270111B2 (en) | 2015-08-13 | 2025-04-08 | Kateeva, Inc. | Methods for producing an etch resist pattern on a metallic surface |
| JP2023139049A (ja) * | 2016-12-12 | 2023-10-03 | カティーバ, インコーポレイテッド | 導電性特徴をエッチングする方法、ならびに関連するデバイスおよびシステム |
| JP2023059886A (ja) * | 2019-02-14 | 2023-04-27 | オルボテック リミテッド | 高密度導体を有するpcb製品を調製するための装置及び感光性インク |
| JP7624021B2 (ja) | 2019-02-14 | 2025-01-29 | オルボテック リミテッド | 高密度導体を有するpcb製品を調製するための装置及び感光性インク |
Also Published As
| Publication number | Publication date |
|---|---|
| US20180192521A1 (en) | 2018-07-05 |
| EP3551781A4 (en) | 2020-09-02 |
| US20190335589A1 (en) | 2019-10-31 |
| CN110249075A (zh) | 2019-09-17 |
| EP3551781A1 (en) | 2019-10-16 |
| EP3551781B1 (en) | 2025-09-24 |
| US10398034B2 (en) | 2019-08-27 |
| US11006528B2 (en) | 2021-05-11 |
| US11425822B2 (en) | 2022-08-23 |
| US20210227696A1 (en) | 2021-07-22 |
| KR20190093576A (ko) | 2019-08-09 |
| WO2018109762A1 (en) | 2018-06-21 |
| JP2023139049A (ja) | 2023-10-03 |
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