JP2020061514A5 - - Google Patents
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- Publication number
- JP2020061514A5 JP2020061514A5 JP2018193312A JP2018193312A JP2020061514A5 JP 2020061514 A5 JP2020061514 A5 JP 2020061514A5 JP 2018193312 A JP2018193312 A JP 2018193312A JP 2018193312 A JP2018193312 A JP 2018193312A JP 2020061514 A5 JP2020061514 A5 JP 2020061514A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning member
- diameter portion
- cleaning
- small diameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims 49
- 239000000758 substrate Substances 0.000 claims 39
- 239000007788 liquid Substances 0.000 claims 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018193312A JP7166132B2 (ja) | 2018-10-12 | 2018-10-12 | 基板洗浄部材および基板洗浄装置 |
| TW108132505A TWI820206B (zh) | 2018-10-12 | 2019-09-10 | 基板清洗構件及基板清洗裝置 |
| KR1020190124316A KR102708935B1 (ko) | 2018-10-12 | 2019-10-08 | 기판 세정 장치 |
| US16/598,728 US11501983B2 (en) | 2018-10-12 | 2019-10-10 | Substrate cleaning member and substrate cleaning apparatus |
| SG10201909509UA SG10201909509UA (en) | 2018-10-12 | 2019-10-11 | Substrate cleaning member and substrate cleaning apparatus |
| EP19202831.4A EP3636356B1 (en) | 2018-10-12 | 2019-10-11 | Substrate cleaning member and substrate cleaning apparatus |
| CN201910964641.1A CN111048442B (zh) | 2018-10-12 | 2019-10-11 | 基板清洗部件及基板清洗装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018193312A JP7166132B2 (ja) | 2018-10-12 | 2018-10-12 | 基板洗浄部材および基板洗浄装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020061514A JP2020061514A (ja) | 2020-04-16 |
| JP2020061514A5 true JP2020061514A5 (enExample) | 2021-07-29 |
| JP7166132B2 JP7166132B2 (ja) | 2022-11-07 |
Family
ID=68280895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018193312A Active JP7166132B2 (ja) | 2018-10-12 | 2018-10-12 | 基板洗浄部材および基板洗浄装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11501983B2 (enExample) |
| EP (1) | EP3636356B1 (enExample) |
| JP (1) | JP7166132B2 (enExample) |
| KR (1) | KR102708935B1 (enExample) |
| CN (1) | CN111048442B (enExample) |
| SG (1) | SG10201909509UA (enExample) |
| TW (1) | TWI820206B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230163413A1 (en) | 2020-04-06 | 2023-05-25 | Lg Energy Solution, Ltd. | Separator for electrochemical device and method for manufacturing same |
| JP6892176B1 (ja) * | 2020-11-19 | 2021-06-23 | 不二越機械工業株式会社 | ワーク洗浄装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB772599A (en) | 1954-01-23 | 1957-04-17 | Service Eng Ltd | Improvements relating to brushing machines |
| US5375291A (en) | 1992-05-18 | 1994-12-27 | Tokyo Electron Limited | Device having brush for scrubbing substrate |
| US5937469A (en) | 1996-12-03 | 1999-08-17 | Intel Corporation | Apparatus for mechanically cleaning the edges of wafers |
| JPH11283952A (ja) * | 1998-03-30 | 1999-10-15 | Shibaura Mechatronics Corp | ブラシ洗浄装置 |
| US6299698B1 (en) * | 1998-07-10 | 2001-10-09 | Applied Materials, Inc. | Wafer edge scrubber and method |
| US6467120B1 (en) * | 1999-09-08 | 2002-10-22 | International Business Machines Corporation | Wafer cleaning brush profile modification |
| US20040040576A1 (en) | 2002-08-29 | 2004-03-04 | Yuxia Sun | Wafer cleaning brush |
| KR100562502B1 (ko) | 2003-07-02 | 2006-03-21 | 삼성전자주식회사 | 반도체 기판의 가장자리부 처리 장치 및 방법 |
| JP3933670B2 (ja) | 2005-03-29 | 2007-06-20 | 東京エレクトロン株式会社 | 基板洗浄方法及び基板洗浄装置 |
| JP4768556B2 (ja) | 2006-09-15 | 2011-09-07 | Ｎｅｃ液晶テクノロジー株式会社 | 基板洗浄装置及び基板洗浄方法 |
| JP2007272236A (ja) | 2007-04-11 | 2007-10-18 | Advanced Display Inc | 基板端面洗浄装置、基板端面洗浄方法及び半導体装置の製造方法 |
| JP2008282865A (ja) | 2007-05-08 | 2008-11-20 | Fuji Electric Device Technology Co Ltd | スクラブ洗浄装置及びそれに用いられるロールスポンジアセンブリ |
| KR101020676B1 (ko) * | 2008-11-26 | 2011-03-09 | 세메스 주식회사 | 기판 세정 장치 |
| WO2010125663A1 (ja) * | 2009-04-30 | 2010-11-04 | アイオン株式会社 | 洗浄用スポンジローラ |
| JP5535687B2 (ja) | 2010-03-01 | 2014-07-02 | 株式会社荏原製作所 | 基板洗浄方法及び基板洗浄装置 |
| JP5645752B2 (ja) * | 2011-05-25 | 2014-12-24 | 株式会社荏原製作所 | 基板洗浄方法及びロール洗浄部材 |
| US9704729B2 (en) * | 2013-06-13 | 2017-07-11 | K.C. Tech Co., Ltd. | Substrate cleaning apparatus and method and brush assembly used therein |
| JP7224128B2 (ja) * | 2018-08-09 | 2023-02-17 | 株式会社荏原製作所 | 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法 |
-
2018
- 2018-10-12 JP JP2018193312A patent/JP7166132B2/ja active Active
-
2019
- 2019-09-10 TW TW108132505A patent/TWI820206B/zh active
- 2019-10-08 KR KR1020190124316A patent/KR102708935B1/ko active Active
- 2019-10-10 US US16/598,728 patent/US11501983B2/en active Active
- 2019-10-11 EP EP19202831.4A patent/EP3636356B1/en active Active
- 2019-10-11 SG SG10201909509UA patent/SG10201909509UA/en unknown
- 2019-10-11 CN CN201910964641.1A patent/CN111048442B/zh active Active
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