JP2019526711A - ポリマー物品表面に導電性トレースを形成する方法 - Google Patents
ポリマー物品表面に導電性トレースを形成する方法 Download PDFInfo
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
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- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/034—Organic insulating material consisting of one material containing halogen
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- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
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- H05K2201/0141—Liquid crystal polymer [LCP]
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Abstract
Description
熱可塑性樹脂、熱硬化性樹脂及びこれらの混合物から選択されるポリマーから作られたポリマー物品の、金属を堆積する予定の領域を照射することにより、前記ポリマー物品の表面をレーザー処理して、レーザー励起領域を形成する工程、
前記ポリマー物品を活性化溶液中に浸漬することによって前記レーザー励起領域を化学的に活性化し、ここで金属イオンが前記励起領域に付着することによって活性化領域が得られる工程、
前記ポリマー物品をリンスする工程、及び
前記ポリマー物品を化学的メタライゼーション浴中に浸漬することによって、前記活性化されたポリマー表面領域を金属めっきする工程
を含み、
めっきする予定の前記表面領域の前記レーザー処理は、環境空気中で行われ、
短パルス時間幅、照射量、及びレーザービームスキャンパラメータは、照射後に還元性基が前記ポリマー物品の前記表面上に形成されるように実験に基づいて選択され、
前記還元剤は、前記活性化溶液からの金属イオンを還元して中性金属原子とするか又はイオン化度をゼロ度として無電解触媒めっきプロセスを可能とするものであり、
ここで、前記レーザー照射された領域の表面上に負の静電荷(3)が発生して、前記ポリマーの表面劣化が回避され、
化学的活性化に用いられる前記活性化溶液は、塩のリスト:銀(Ag)塩、銅(Cu)塩、ニッケル(Ni)塩、コバルト(Co)塩、亜鉛(Zn)塩、クロム(Cr)塩、スズ(Sn)塩、から選択される1種の金属塩の水溶液である。
材料:ポリマー物品は、PC/ABS bayblend T65マスターバッチを用いて作製した。マスターバッチを加熱し、チャンバー中、270〜280℃の温度で4〜5分間混合した。続いて、混合物を、射出成形機を用いて金型に射出した。275〜285℃へのプレス加熱を用い、前記混合物を約20バールで充填した。
材料:ポリマー物品は、PP Hostacom CR1171 G1の顆粒を用いて作製した。マスターバッチを加熱し、チャンバー中、170〜180℃の温度で4〜5分間混合した。続いて、混合物を、射出成形機を用いて金型に射出した。前記混合物を、175〜195℃に加熱し、約20バールで充填した。
2:レーザービーム
3:表面静電荷
4:還元剤
5:金属塩の水溶液
6:活性化溶液中の金属イオン
7:蒸留水
8:ポリマー1の表面上の金属イオン
9:ポリマー表面から脱着したイオン
10:無電解自己触媒めっき浴
11:めっき浴10中の還元剤
12:電子
Claims (11)
- 熱可塑性樹脂、熱硬化性樹脂及びこれらの混合物から選択されるポリマーから作られたポリマー物品の、金属を堆積する予定の領域を照射することにより、前記ポリマー物品の表面をレーザー処理して、レーザー励起領域を形成する工程、
前記ポリマー物品を活性化溶液中に浸漬することによって前記レーザー励起領域を化学的に活性化し、ここで金属イオンが前記励起領域に付着することによって活性化領域が得られる工程、
前記ポリマー物品をリンスする工程、及び
前記ポリマー物品を化学的メタライゼーション浴中に浸漬することによって、前記活性化されたポリマー表面領域を金属めっきする工程
を含み、
めっきする予定の前記表面領域の前記レーザー処理は、環境空気中で行われ、
短パルス時間幅、照射量、及びレーザービームスキャンパラメータは、照射後に還元性基が前記ポリマー物品の表面上に形成されるように実験に基づいて選択され、
前記還元剤は、前記活性化溶液からの金属イオンを還元して中性金属原子とするか又はイオン化度をゼロ度として無電解触媒めっきプロセスを可能とするものであり、
ここで、前記レーザー照射された領域の表面上に負の静電荷(3)が発生して、前記ポリマーの表面劣化が回避され、
化学的活性化に用いられる前記活性化溶液は、塩のリスト:銀(Ag)塩、銅(Cu)塩、ニッケル(Ni)塩、コバルト(Co)塩、亜鉛(Zn)塩、クロム(Cr)塩、スズ(Sn)塩、から選択される1種の金属塩の水溶液である、
ポリマー物品表面上で導電性トレースを形成する方法。 - 前記ポリマー物品のポリマー材料は、ポリプロピレン(PP)、アクリロニトリルブタジエンスチレン(ABS)、ポリカーボネート(PC)、ポリスチレン(PS)、ポリエチレン(PE)、ポリブチレンテレフタレート(PBT)、液晶ポリマー(LCP)、シクロオレフィンコポリマー(COC)、ポリメチル−メタクリレート(PMMA)、ポリテトラフルオロエチレン(PTFE)、ポリフェニレンエーテル(PPE)、ポリエーテルエーテルケトン(PEEK)、ポリエチレンテレフタレート(PET)、ポリアミド(PA)、及びこれらの混合物からなる群より選択される、請求項1に記載の方法。
- 前記ポリマー物品は、ポリカーボネートとアクリロニトリルブタジエンスチレンとのポリマーブレンド(PC−ABS)から作製される、請求項2に記載の方法。
- パルス又は連続波レーザーが、前記レーザー表面処理に用いられ、
前記レーザー源の波長は、赤外領域、可視領域、及び紫外領域を含み、
前記照射量は、0.1J/cm2〜50J/cm2の範囲内にあり、レーザーのスキャン速度は、0.1〜5m/sの範囲内にあり、
前記照射量及びスキャン速度は、前記照射され帯電された領域が前記塩水溶液からの金属イオンの吸着及び還元に対して活性となるように、実験に基づいて選択される、
請求項1に記載の方法。 - 環境空気中におけるレーザー処理の過程で、前記ポリマー物品の表面酸化が回避されるように、0.1ps〜900psのパルス時間幅、10kHz〜200kHzのパルス繰り返し周波数、及び1J/cm2〜10J/cm2の範囲内の照射量のレーザーが、メタライゼーションのための前記選択された領域の照射に用いられる、請求項4に記載の方法。
- 前記化学的活性化溶液は、0.0000001M〜1Mの濃度の、硝酸銀AgNO3又は銀ジアミン錯体Ag(NH3)2の水溶液から成る、請求項1〜請求項5のいずれか一項に記載の方法。
- レーザーによって処理され且つ化学的に活性化された前記領域に浴からの金属が堆積されるように、前記活性化工程及びリンス工程の後、前記ポリマー物品が、金属イオン、金属イオンの錯体形成のためのリガンド、金属イオン還元のための還元剤、及び溶液のpH値を一定に維持するための緩衝剤を含有する化学的メタライゼーション浴中に浸漬される、請求項1〜請求項6のいずれか一項に記載の方法。
- 化学的活性化は、20℃の温度で15分間にわたって行われる、請求項6に記載の方法。
- 前記化学的メタライゼーション浴は、0.05M〜0.25Mの濃度の硫酸銅CuSO4(銅(II)源)と、0.0015M〜6Mの濃度のホルムアルデヒド(還元剤)と、グリセロール、クエン酸、酒石酸の異性体、EDTA、DTPA、CDTA、Quadrolを含む、ポリオール、ヒドロキシ−ポリカルボン酸、ポリアミン−ポリカルボン酸、ポリアミン−ポリヒドロキシ化合物からなる群より選択される0.15M〜0.75Mの濃度のリガンドと、から成る銅めっき浴であり、
前記無電解銅めっき浴中において、0.05M〜0.6Mの濃度の炭酸ナトリウムNa2CO3及び0.1M〜2Mの濃度の水酸化ナトリウムNaOHが、12〜13.5のpH値における緩衝環境として用いられ、
前記無電解銅めっき浴の温度は、前記めっきプロセスの間、5℃〜90℃の範囲内に維持される、請求項1〜請求項8のいずれか一項に記載の方法。 - 前記銅めっき浴は、pH=12.7及びめっき温度30℃の、0.12Mの硫酸銅(II)(CuSO4)、0.25MのQuadrol([CH3CH(OH)CH2]2NCH2CH2N[CH2CH(OH)CH3]2)、1.25Mの水酸化ナトリウム(NaOH)、0.3Mの炭酸ナトリウム(Na2CO3)、及び0.34Mのホルマリン(CH2(OH)2)の水溶液を含有する、請求項9に記載の方法。
- 前記化学めっき浴は、0.001〜0.1MのAgNO3−銀(I)イオン源、0.001〜0.8MのCoSO4−還元剤、並びにリガンドとしての0.1〜1Mの(NH4)2SO4及び0.1〜5MのNH4OHを含有する銀めっき浴であり、前記無電解銀めっきは、前記めっき浴のpH値が12〜13.5であり、めっき温度30℃において行われる、請求項1〜請求項10のいずれか一項に記載の方法。
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