JP2019515140A5 - - Google Patents

Download PDF

Info

Publication number
JP2019515140A5
JP2019515140A5 JP2018557815A JP2018557815A JP2019515140A5 JP 2019515140 A5 JP2019515140 A5 JP 2019515140A5 JP 2018557815 A JP2018557815 A JP 2018557815A JP 2018557815 A JP2018557815 A JP 2018557815A JP 2019515140 A5 JP2019515140 A5 JP 2019515140A5
Authority
JP
Japan
Prior art keywords
pressure
electromagnetic pump
liquid metal
supply pipe
evaporator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018557815A
Other languages
English (en)
Japanese (ja)
Other versions
JP7182466B2 (ja
JP2019515140A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2017/060317 external-priority patent/WO2017191083A1/en
Publication of JP2019515140A publication Critical patent/JP2019515140A/ja
Publication of JP2019515140A5 publication Critical patent/JP2019515140A5/ja
Application granted granted Critical
Publication of JP7182466B2 publication Critical patent/JP7182466B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018557815A 2016-05-03 2017-05-01 液体金属を蒸発装置に供給するための装置を操作するための方法 Active JP7182466B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168162 2016-05-03
EP16168162.2 2016-05-03
PCT/EP2017/060317 WO2017191083A1 (en) 2016-05-03 2017-05-01 Method to operate an apparatus for feeding liquid metal to an evaporator device

Publications (3)

Publication Number Publication Date
JP2019515140A JP2019515140A (ja) 2019-06-06
JP2019515140A5 true JP2019515140A5 (enExample) 2021-08-12
JP7182466B2 JP7182466B2 (ja) 2022-12-02

Family

ID=56083901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018557815A Active JP7182466B2 (ja) 2016-05-03 2017-05-01 液体金属を蒸発装置に供給するための装置を操作するための方法

Country Status (8)

Country Link
US (1) US11414744B2 (enExample)
EP (1) EP3452631B1 (enExample)
JP (1) JP7182466B2 (enExample)
KR (1) KR102360308B1 (enExample)
CN (1) CN109072410B (enExample)
AU (1) AU2017260148B2 (enExample)
ES (1) ES2786975T3 (enExample)
WO (1) WO2017191083A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador
CN107761058B (zh) * 2017-11-14 2018-11-13 中国科学院光电研究院 多元合金薄膜的制备装置及其制备方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN115094385A (zh) * 2022-07-21 2022-09-23 浙江艾微普科技有限公司 一种含有液体供给系统的镀膜设备和镀膜方法
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
JPS5938379B2 (ja) 1979-09-14 1984-09-17 松下電工株式会社 屋根材
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US7339139B2 (en) 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) * 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
JP5259452B2 (ja) * 2008-06-19 2013-08-07 一般財団法人電力中央研究所 電磁ポンプ吐出量測定方法
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
KR101639811B1 (ko) 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
AU2013242397B2 (en) 2012-03-30 2017-06-15 Posco Method and apparatus for feeding liquid metal to an evaporator device
CN105793464B (zh) 2013-11-05 2018-01-02 塔塔钢铁荷兰科技有限责任公司 用于控制蒸发器装置中的液体金属的组成的方法和设备
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador

Similar Documents

Publication Publication Date Title
JP2019515140A5 (enExample)
JP7182466B2 (ja) 液体金属を蒸発装置に供給するための装置を操作するための方法
JPS6011417B2 (ja) ホロ−カソ−ド放電装置
US11261860B2 (en) Method to control the temperature of an electromagnetic pump
JP2023505325A (ja) プラズマ発生器
TW541617B (en) Plasma processing apparatus and method of processing
JP2019515141A5 (enExample)
JP7069039B2 (ja) 蒸発装置に液体材料を供給するための装置
KR101226520B1 (ko) 멸균 장치
CN105570857A (zh) 一种微波蒸汽产生装置及微波加湿装置
JP2013089538A (ja) 荷電粒子線装置、及び脱ガス方法
CN208355805U (zh) 一种低温等离子灭菌装置
CN105327375A (zh) 等离子体液滴双态杀菌消毒装置
EP2443644A2 (en) Cooled charged particle systems and methods
JP5344232B2 (ja) 樹脂充填方法、および樹脂充填装置
KR20170084505A (ko) 대형 항온수조
CN104368813A (zh) 一种钨合金材料垂熔烧结的氢气流量调节装置
JPH11244359A (ja) 蒸気滅菌装置およびその運転方法
JP2016207409A5 (enExample)
ES2758080T3 (es) Instalación y proceso para el tratamiento de piezas de metal mediante un reactor de plasma
JPS6034775B2 (ja) 電界放射型電子銃
JP2002150958A (ja) 負イオン源用セシウムオーブン
GB2554414A (en) Liquid preparation for use in dialysis
JPH0373582A (ja) 金属蒸気レーザ装置