JP2019515141A5 - - Google Patents

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Publication number
JP2019515141A5
JP2019515141A5 JP2018557825A JP2018557825A JP2019515141A5 JP 2019515141 A5 JP2019515141 A5 JP 2019515141A5 JP 2018557825 A JP2018557825 A JP 2018557825A JP 2018557825 A JP2018557825 A JP 2018557825A JP 2019515141 A5 JP2019515141 A5 JP 2019515141A5
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JP
Japan
Prior art keywords
electromagnetic pump
container
interposed
vacuum
supply pipe
Prior art date
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Granted
Application number
JP2018557825A
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English (en)
Japanese (ja)
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JP7069039B2 (ja
JP2019515141A (ja
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Priority claimed from PCT/EP2017/060316 external-priority patent/WO2017191082A1/en
Publication of JP2019515141A publication Critical patent/JP2019515141A/ja
Publication of JP2019515141A5 publication Critical patent/JP2019515141A5/ja
Application granted granted Critical
Publication of JP7069039B2 publication Critical patent/JP7069039B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2018557825A 2016-05-03 2017-05-01 蒸発装置に液体材料を供給するための装置 Active JP7069039B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168167.1 2016-05-03
EP16168167 2016-05-03
PCT/EP2017/060316 WO2017191082A1 (en) 2016-05-03 2017-05-01 Apparatus for feeding a liquid material to an evaporator device

Publications (3)

Publication Number Publication Date
JP2019515141A JP2019515141A (ja) 2019-06-06
JP2019515141A5 true JP2019515141A5 (enExample) 2021-08-12
JP7069039B2 JP7069039B2 (ja) 2022-05-17

Family

ID=56083902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018557825A Active JP7069039B2 (ja) 2016-05-03 2017-05-01 蒸発装置に液体材料を供給するための装置

Country Status (8)

Country Link
US (1) US11220739B2 (enExample)
EP (1) EP3452633B1 (enExample)
JP (1) JP7069039B2 (enExample)
KR (1) KR102357447B1 (enExample)
CN (1) CN109072414B (enExample)
AU (1) AU2017260147B2 (enExample)
ES (1) ES2787924T3 (enExample)
WO (1) WO2017191082A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
US11414744B2 (en) 2016-05-03 2022-08-16 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
JP7315218B2 (ja) * 2019-12-24 2023-07-26 株式会社ヂーマグ 金属溶湯駆動装置および金属溶湯駆動方法
US20240397663A1 (en) * 2023-05-23 2024-11-28 Microsoft Technology Licensing, Llc Systems and methods for magnetic pumping in thermal management devices

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US847395A (en) 1906-04-30 1907-03-19 Ernest Boehm Light-transmitting and light-diffusing object.
US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
IT1130947B (it) * 1980-03-10 1986-06-18 De Dionigi Manlio Perfezionamenti alle pompe elettromagnetiche alternative in particolare per fluidi non viscosi
US4392786A (en) 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
FR2562099B1 (fr) * 1984-03-30 1986-06-20 Commissariat Energie Atomique Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US6362098B1 (en) * 2001-02-28 2002-03-26 Motorola, Inc. Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
US20100124022A1 (en) * 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
US8920566B2 (en) * 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system
CA2824248C (en) * 2011-01-14 2019-11-05 Arcelormittal Investigacion Y Desarrollo Automatic supply device for an industrial metal vapor generator
CN103188912A (zh) * 2011-12-27 2013-07-03 刘源 使用液态金属工质的藕状规则多孔金属微通道热沉
AU2013242397B2 (en) * 2012-03-30 2017-06-15 Posco Method and apparatus for feeding liquid metal to an evaporator device
CN105793464B (zh) 2013-11-05 2018-01-02 塔塔钢铁荷兰科技有限责任公司 用于控制蒸发器装置中的液体金属的组成的方法和设备
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
US11414744B2 (en) 2016-05-03 2022-08-16 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device

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