KR102357447B1 - 증발 장치에 액체 금속을 공급하기 위한 장치 - Google Patents

증발 장치에 액체 금속을 공급하기 위한 장치 Download PDF

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Publication number
KR102357447B1
KR102357447B1 KR1020187033590A KR20187033590A KR102357447B1 KR 102357447 B1 KR102357447 B1 KR 102357447B1 KR 1020187033590 A KR1020187033590 A KR 1020187033590A KR 20187033590 A KR20187033590 A KR 20187033590A KR 102357447 B1 KR102357447 B1 KR 102357447B1
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KR
South Korea
Prior art keywords
electromagnetic pump
liquid metal
container
vacuum
vacuum chamber
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020187033590A
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English (en)
Korean (ko)
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KR20190003587A (ko
Inventor
에드조 조에스트버겐
콜린 코망되르
롤란드 얀 스니즈더스
에두아르드 폴 매튜스 배커
피터 윌리엄 헤이즐럿
더글라스 알렉산 해밀톤
스티븐 제임스 위디스
티모시 딘 카이저
Original Assignee
타타 스틸 네덜란드 테크날러지 베.뷔.
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Publication of KR20190003587A publication Critical patent/KR20190003587A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H02K44/04—Conduction pumps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
KR1020187033590A 2016-05-03 2017-05-01 증발 장치에 액체 금속을 공급하기 위한 장치 Expired - Fee Related KR102357447B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168167.1 2016-05-03
EP16168167 2016-05-03
PCT/EP2017/060316 WO2017191082A1 (en) 2016-05-03 2017-05-01 Apparatus for feeding a liquid material to an evaporator device

Publications (2)

Publication Number Publication Date
KR20190003587A KR20190003587A (ko) 2019-01-09
KR102357447B1 true KR102357447B1 (ko) 2022-01-28

Family

ID=56083902

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187033590A Expired - Fee Related KR102357447B1 (ko) 2016-05-03 2017-05-01 증발 장치에 액체 금속을 공급하기 위한 장치

Country Status (8)

Country Link
US (1) US11220739B2 (enExample)
EP (1) EP3452633B1 (enExample)
JP (1) JP7069039B2 (enExample)
KR (1) KR102357447B1 (enExample)
CN (1) CN109072414B (enExample)
AU (1) AU2017260147B2 (enExample)
ES (1) ES2787924T3 (enExample)
WO (1) WO2017191082A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2017260148B2 (en) 2016-05-03 2022-08-25 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
JP7315218B2 (ja) * 2019-12-24 2023-07-26 株式会社ヂーマグ 金属溶湯駆動装置および金属溶湯駆動方法
US20240397663A1 (en) * 2023-05-23 2024-11-28 Microsoft Technology Licensing, Llc Systems and methods for magnetic pumping in thermal management devices

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit

Family Cites Families (24)

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US847395A (en) 1906-04-30 1907-03-19 Ernest Boehm Light-transmitting and light-diffusing object.
US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
IT1130947B (it) * 1980-03-10 1986-06-18 De Dionigi Manlio Perfezionamenti alle pompe elettromagnetiche alternative in particolare per fluidi non viscosi
US4392786A (en) 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
FR2562099B1 (fr) * 1984-03-30 1986-06-20 Commissariat Energie Atomique Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US6362098B1 (en) * 2001-02-28 2002-03-26 Motorola, Inc. Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
US8920566B2 (en) * 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system
RU2584369C2 (ru) * 2011-01-14 2016-05-20 Арселормитталь Инвестигасион И Десаррольо Устройство автоматического питания промышленного генератора пара металла
CN103188912A (zh) * 2011-12-27 2013-07-03 刘源 使用液态金属工质的藕状规则多孔金属微通道热沉
ES2566607T3 (es) 2012-03-30 2016-04-14 Tata Steel Nederland Technology B.V. Método y aparato para cargar metal líquido en un dispositivo evaporador
WO2015067662A1 (en) * 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
AU2017260148B2 (en) 2016-05-03 2022-08-25 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit

Also Published As

Publication number Publication date
WO2017191082A1 (en) 2017-11-09
EP3452633B1 (en) 2020-03-25
CN109072414A (zh) 2018-12-21
AU2017260147A1 (en) 2018-11-15
CN109072414B (zh) 2022-02-22
JP2019515141A (ja) 2019-06-06
JP7069039B2 (ja) 2022-05-17
KR20190003587A (ko) 2019-01-09
US11220739B2 (en) 2022-01-11
US20190153587A1 (en) 2019-05-23
EP3452633A1 (en) 2019-03-13
AU2017260147B2 (en) 2022-08-25
ES2787924T3 (es) 2020-10-19

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