ES2787924T3 - Aparato para alimentar un metal líquido a un dispositivo evaporador - Google Patents
Aparato para alimentar un metal líquido a un dispositivo evaporador Download PDFInfo
- Publication number
- ES2787924T3 ES2787924T3 ES17720142T ES17720142T ES2787924T3 ES 2787924 T3 ES2787924 T3 ES 2787924T3 ES 17720142 T ES17720142 T ES 17720142T ES 17720142 T ES17720142 T ES 17720142T ES 2787924 T3 ES2787924 T3 ES 2787924T3
- Authority
- ES
- Spain
- Prior art keywords
- electromagnetic pump
- liquid metal
- container
- feed tube
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910001338 liquidmetal Inorganic materials 0.000 title claims abstract description 79
- 238000001704 evaporation Methods 0.000 title description 23
- 230000005291 magnetic effect Effects 0.000 claims description 32
- 239000004020 conductor Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 description 16
- 239000007788 liquid Substances 0.000 description 12
- 230000008020 evaporation Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
- H02K44/02—Electrodynamic pumps
- H02K44/04—Conduction pumps
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Physical Vapour Deposition (AREA)
- Jet Pumps And Other Pumps (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16168167 | 2016-05-03 | ||
| PCT/EP2017/060316 WO2017191082A1 (en) | 2016-05-03 | 2017-05-01 | Apparatus for feeding a liquid material to an evaporator device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2787924T3 true ES2787924T3 (es) | 2020-10-19 |
Family
ID=56083902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES17720142T Active ES2787924T3 (es) | 2016-05-03 | 2017-05-01 | Aparato para alimentar un metal líquido a un dispositivo evaporador |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11220739B2 (enExample) |
| EP (1) | EP3452633B1 (enExample) |
| JP (1) | JP7069039B2 (enExample) |
| KR (1) | KR102357447B1 (enExample) |
| CN (1) | CN109072414B (enExample) |
| AU (1) | AU2017260147B2 (enExample) |
| ES (1) | ES2787924T3 (enExample) |
| WO (1) | WO2017191082A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2017260148B2 (en) | 2016-05-03 | 2022-08-25 | Tata Steel Nederland Technology B.V. | Method to operate an apparatus for feeding liquid metal to an evaporator device |
| WO2017191081A1 (en) | 2016-05-03 | 2017-11-09 | Tata Steel Nederland Technology B.V. | Method to control the temperature of an electromagnetic pump |
| JP7315218B2 (ja) * | 2019-12-24 | 2023-07-26 | 株式会社ヂーマグ | 金属溶湯駆動装置および金属溶湯駆動方法 |
| US20240397663A1 (en) * | 2023-05-23 | 2024-11-28 | Microsoft Technology Licensing, Llc | Systems and methods for magnetic pumping in thermal management devices |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US847395A (en) | 1906-04-30 | 1907-03-19 | Ernest Boehm | Light-transmitting and light-diffusing object. |
| US2664852A (en) | 1950-04-27 | 1954-01-05 | Nat Res Corp | Vapor coating apparatus |
| US3059612A (en) | 1959-10-19 | 1962-10-23 | Wean Engineering Co Inc | Vacuum coating apparatus |
| US3408224A (en) | 1964-06-25 | 1968-10-29 | Pennsalt Chemicals Corp | Vapor coating employing degassing of coating metal |
| US3581766A (en) | 1968-08-02 | 1971-06-01 | Jones & Laughlin Steel Corp | Supplying liquid to a vacuum chamber |
| US3550924A (en) | 1968-12-06 | 1970-12-29 | United States Steel Corp | Mechanism for controlling flow of liquid to a vacuum-treating vessel |
| IT1130947B (it) * | 1980-03-10 | 1986-06-18 | De Dionigi Manlio | Perfezionamenti alle pompe elettromagnetiche alternative in particolare per fluidi non viscosi |
| US4392786A (en) | 1980-10-16 | 1983-07-12 | Merenkov Jury F | Electromagnetic induction pump |
| JPS5938379A (ja) | 1982-08-26 | 1984-03-02 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置のスタ−トアツプ法 |
| FR2562099B1 (fr) * | 1984-03-30 | 1986-06-20 | Commissariat Energie Atomique | Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires |
| JP3452617B2 (ja) * | 1993-12-10 | 2003-09-29 | 真空冶金株式会社 | ガスデポジション装置 |
| US6362098B1 (en) * | 2001-02-28 | 2002-03-26 | Motorola, Inc. | Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate |
| US6749906B2 (en) * | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
| US7339139B2 (en) * | 2003-10-03 | 2008-03-04 | Darly Custom Technology, Inc. | Multi-layered radiant thermal evaporator and method of use |
| DE102004041855B4 (de) | 2004-04-27 | 2007-09-13 | Von Ardenne Anlagentechnik Gmbh | Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung |
| US20100124022A1 (en) * | 2008-11-14 | 2010-05-20 | Suad Causevic | Thermoelectric cooling apparatus and method for cooling an integrated circuit |
| EP2652167B1 (en) | 2010-12-13 | 2015-04-08 | Posco | Continuous coating apparatus |
| US8920566B2 (en) * | 2010-12-30 | 2014-12-30 | United Technologies Corporation | Wire feed pressure lock system |
| RU2584369C2 (ru) * | 2011-01-14 | 2016-05-20 | Арселормитталь Инвестигасион И Десаррольо | Устройство автоматического питания промышленного генератора пара металла |
| CN103188912A (zh) * | 2011-12-27 | 2013-07-03 | 刘源 | 使用液态金属工质的藕状规则多孔金属微通道热沉 |
| ES2566607T3 (es) | 2012-03-30 | 2016-04-14 | Tata Steel Nederland Technology B.V. | Método y aparato para cargar metal líquido en un dispositivo evaporador |
| WO2015067662A1 (en) * | 2013-11-05 | 2015-05-14 | Tata Steel Nederland Technology B.V. | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
| CN204805055U (zh) | 2015-04-29 | 2015-11-25 | 周小林 | 电磁泵 |
| WO2017191081A1 (en) | 2016-05-03 | 2017-11-09 | Tata Steel Nederland Technology B.V. | Method to control the temperature of an electromagnetic pump |
| AU2017260148B2 (en) | 2016-05-03 | 2022-08-25 | Tata Steel Nederland Technology B.V. | Method to operate an apparatus for feeding liquid metal to an evaporator device |
-
2017
- 2017-05-01 EP EP17720142.3A patent/EP3452633B1/en active Active
- 2017-05-01 CN CN201780027343.9A patent/CN109072414B/zh not_active Expired - Fee Related
- 2017-05-01 ES ES17720142T patent/ES2787924T3/es active Active
- 2017-05-01 JP JP2018557825A patent/JP7069039B2/ja active Active
- 2017-05-01 KR KR1020187033590A patent/KR102357447B1/ko not_active Expired - Fee Related
- 2017-05-01 AU AU2017260147A patent/AU2017260147B2/en not_active Ceased
- 2017-05-01 US US16/098,523 patent/US11220739B2/en active Active
- 2017-05-01 WO PCT/EP2017/060316 patent/WO2017191082A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017191082A1 (en) | 2017-11-09 |
| EP3452633B1 (en) | 2020-03-25 |
| CN109072414A (zh) | 2018-12-21 |
| AU2017260147A1 (en) | 2018-11-15 |
| CN109072414B (zh) | 2022-02-22 |
| JP2019515141A (ja) | 2019-06-06 |
| KR102357447B1 (ko) | 2022-01-28 |
| JP7069039B2 (ja) | 2022-05-17 |
| KR20190003587A (ko) | 2019-01-09 |
| US11220739B2 (en) | 2022-01-11 |
| US20190153587A1 (en) | 2019-05-23 |
| EP3452633A1 (en) | 2019-03-13 |
| AU2017260147B2 (en) | 2022-08-25 |
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